Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess

Author(s):  
Yen-Ku Lin ◽  
Shuichi Noda ◽  
Ruey-Bor Lee ◽  
Chia-Ching Huang ◽  
Quang Ho Luc ◽  
...  
2021 ◽  
Vol 14 (1) ◽  
pp. 014003
Author(s):  
Shahab Mollah ◽  
Kamal Hussain ◽  
Abdullah Mamun ◽  
Mikhail Gaevski ◽  
Grigory Simin ◽  
...  

Author(s):  
A. Razavieh ◽  
Y. Chen ◽  
T. Ethirajan ◽  
M. Gu ◽  
S. Cimino ◽  
...  

Author(s):  
Benjamin King ◽  
Andrew J. Daszczynski ◽  
Nicole A. Rice ◽  
Alexander J. Peltekoff ◽  
Nathan J. Yutronkie ◽  
...  

2018 ◽  
Vol 59 (4) ◽  
pp. 745-751 ◽  
Author(s):  
Yanping Zhang ◽  
Liyan Zhang ◽  
Lisheng Cheng ◽  
Yongxin Qin ◽  
Yi Li ◽  
...  

2019 ◽  
Vol 7 (29) ◽  
pp. 8855-8860 ◽  
Author(s):  
Janghyuk Kim ◽  
Marko J. Tadjer ◽  
Michael A. Mastro ◽  
Jihyun Kim

The threshold voltage of β-Ga2O3 metal–insulator–semiconductor field-effect transistors is controlled via remote fluorine plasma treatment, enabling an enhancement-mode operation under double gate condition.


NANO ◽  
2019 ◽  
Vol 14 (10) ◽  
pp. 1950128 ◽  
Author(s):  
Biswajit Jena ◽  
Sidhartha Dash ◽  
Soumya Ranjan Routray ◽  
Guru Prasad Mishra

Gate-all-around (GAA) MOSFETs are the best multi-gate MOSFET structure due to their strong electrostatic control over the channel. The electrostatic controllability can be enhanced further by applying some gate engineering technique to the existing GAA structure. This paper investigates the effect of inner gate (core gate) on the electrostatic performance of conventional GAA MOSFET. The inner gate engineering increases both the electrostatic control and packing density of GAA MOSFET. In this paper, we have presented an inner-gate-engineered (IGE) GAA MOSFET and inspected its advantages over conventional counterparts. The proposed structure exhibits higher [Formula: see text] ratio, low threshold voltage and improved RF performances as compared to the conventional structure. Analytic simulation has been carried out for numerous figures of merit (FOMs) for different technology nodes.


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