scholarly journals Comparative Study of Al Metallization Degradation in Power Diodes Under Passive and Active Thermal Cycling

Author(s):  
Mads Brincker ◽  
Kristian Bonderup Pedersen ◽  
Peter Kjar Kristensen ◽  
Vladimir N. Popok
Author(s):  
Cher Ming Tan ◽  
Nagarajan Raghavan ◽  
Lina Sun ◽  
Chuck Hsu ◽  
Chase Wang

2000 ◽  
Vol 612 ◽  
Author(s):  
Yuxiao Zeng ◽  
Linghui Chen ◽  
T. L. Alford

AbstractFor the benefit of reducing capacitance in multilevel interconnect technology, low-k dielectric HSQ (hydrogen silsesquioxane) has been used as a gapfill material in Al-metallization- based non-etchback embedded scheme. The vias are consequently fabricated through the HSQ layer followed by W plug deposition. In order to reduce the extent of via poisoning and achieve good W/Al contact, thin Ti/TiN stack films are typically deposited before via plug deposition. In this case, HSQ makes direct contact with the Ti layer. The reliability of the Ti/HSQ structures at elevated temperatures has been systematically studied in this work by using a variety of techniques. These results are also compared with those from Ti/TEOS (Tetraethylorthosilicate) structure, where TEOS is a conventional intra-metal dielectric. When the temperature is below 550 °C, a significant number of oxygen atoms are observed to diffuse into the titanium layer. The primary source of oxygen is believed to come from the HSQ film. When the temperature is above 550 °C, HSQ starts to react with Ti. At 700 °C, a TiO/Ti5Si3/HSQ stack structure forms. The Ti/HSQ system exhibits a higher reactivity than that of the Ti/TEOS system.


2015 ◽  
Vol 55 (9-10) ◽  
pp. 1988-1991 ◽  
Author(s):  
M. Brincker ◽  
K.B. Pedersen ◽  
P.K. Kristensen ◽  
V.N. Popok

2008 ◽  
Vol 595-598 ◽  
pp. 213-221 ◽  
Author(s):  
Aurélie Vande Put ◽  
Djar Oquab ◽  
Daniel Monceau

During service, TBC can suffer degradation by CMAS, FOD, erosion or spallation. Whereas the first three are due to foreign particles, the last one is related to thermal cycling. When subjected to high temperature exposures followed by rapid coolings under oxidizing conditions, a TBC system undergoes morphological changes and stress development. This will initiate cracks which propagate and finally lead to failure by spallation. Consequently, the aim of the present study is to understand better the mechanisms responsible for such spallation events. Two kinds of TBC systems with different bond coatings (NiCoCrAlYTa or Pt-modified nickel aluminide bond coatings) are thermally cycled. Subsequently, SEM investigations on TBC systems after spallation concentrate on failure path, defect, morphological and microstructural changes to propose way for improving TBC system lifetime.


2020 ◽  
Vol 31 (7) ◽  
pp. 5731-5737 ◽  
Author(s):  
Jianhao Wang ◽  
Songbai Xue ◽  
Jianxin Wang ◽  
Peng Zhang ◽  
Yu Tao ◽  
...  

2007 ◽  
Vol 336-338 ◽  
pp. 1770-1772
Author(s):  
He Fei Li ◽  
Zhao Hui Zhou ◽  
Hesnawi A ◽  
Kuo Jiang ◽  
Sheng Kai Gong

Thermal barrier coatings with one-layered/ two-layered NiAl bond coat were produced by electron beam physical vapor deposition (EB-PVD). Compared to the TBC with one-layered bond coat, the TBC with two-layered bond coat improved the thermal cycling resistance significantly. The failure mechanism of the two-layer NiAl bond coat TBC was investigated in this paper.


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