Numerical Study of Data Retention Due to Direct Tunneling for Nonvolatile Memory Cell

2005 ◽  
Vol 52 (5) ◽  
pp. 955-961 ◽  
Author(s):  
H. Watanabe ◽  
T. Ishihara ◽  
Y. Matsunaga ◽  
K. Matsuzawa ◽  
D. Matsushita ◽  
...  
2012 ◽  
Vol 52 (8) ◽  
pp. 1627-1631 ◽  
Author(s):  
Jer-Chyi Wang ◽  
Chih-Ting Lin ◽  
Chi-Hsien Huang ◽  
Chao-Sung Lai ◽  
Chin-Hsiang Liao

Author(s):  
Somnath Mondal ◽  
Fa-Hsyang Chen ◽  
Tung-Ming Pan

Resistive switching in Ni/Yb2O3/TaN programmable memory cells was investigated. We proposed a rearrangement of oxygen vacancies under electric field plays role in resistive switching. Under negative bias, oxygen vacancies or other metallic defects migrate through Yb2O3 oxide and SET occurs. A reproducible resistance switching behavior was observed with high resistance ratio of about 105 with excellent data retention, and good immunity to read disturbance, are also revealed. In particular, the simple sandwich structure and excellent electrical performance of the memory cell making them ideal for the basis for highspeed, high-density, nonvolatile memory applications.


Author(s):  
Sharon Cui ◽  
Dongseog Eun ◽  
Bozidar Marinkovic ◽  
Cheng-Yi Peng ◽  
Xiao Pan ◽  
...  

2013 ◽  
Vol 14 (5) ◽  
pp. 1231-1236 ◽  
Author(s):  
Min-Hoi Kim ◽  
Gyu Jeong Lee ◽  
Chang-Min Keum ◽  
Sin-Doo Lee

2007 ◽  
Vol 28 (5) ◽  
pp. 440-442 ◽  
Author(s):  
Russell Duane ◽  
Quentin Rafhay ◽  
M. Florian Beug ◽  
Michiel van Duuren

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