On the Correct Extraction of Interface Trap Density of MOS Devices With High-Mobility Semiconductor Substrates

2008 ◽  
Vol 55 (2) ◽  
pp. 547-556 ◽  
Author(s):  
Koen Martens ◽  
Chi On Chui ◽  
Guy Brammertz ◽  
Brice De Jaeger ◽  
Duygu Kuzum ◽  
...  
Keyword(s):  
High Mobility ◽  
Trap Density ◽  
Interface Trap Density ◽  
Interface Trap ◽  
Mos Devices ◽  
Semiconductor Substrates

Single transistor technique for interface trap density measurement in irradiated MOS devices

1999 ◽  
Vol 39 (4) ◽  
pp. 497-505 ◽  
Author(s):  
V.S Pershenkov ◽  
S.V Cherepko ◽  
R.E Ivanov ◽  
A.V Shalnov ◽  
V.V Abramov
Keyword(s):  
Density Measurement ◽  
Trap Density ◽  
Interface Trap Density ◽  
Interface Trap ◽  
Mos Devices

The effect of nitrogen plasma anneals on interface trap density and channel mobility for 4H–SiC MOS devices

2011 ◽  
Vol 57 (1) ◽  
pp. 76-79 ◽  
Author(s):  
Xingguang Zhu ◽  
Ayayi C. Ahyi ◽  
Mingyu Li ◽  
Zengjun Chen ◽  
John Rozen ◽  
...  
Keyword(s):  
Nitrogen Plasma ◽  
Trap Density ◽  
Interface Trap Density ◽  
Interface Trap ◽  
Channel Mobility ◽  
Mos Devices

Analyzing the interface trap density in SiGe capacitors using an abnormal flat band voltage shift at low temperature

2020 ◽  
Vol 13 (11) ◽  
pp. 111006
Author(s):  
Li-Chuan Sun ◽  
Chih-Yang Lin ◽  
Po-Hsun Chen ◽  
Tsung-Ming Tsai ◽  
Kuan-Ju Zhou ◽  
...  
Keyword(s):  
Low Temperature ◽  
Trap Density ◽  
Flat Band ◽  
Interface Trap Density ◽  
Interface Trap ◽  
Flat Band Voltage ◽  
Voltage Shift

Direct Measurement of Top and Sidewall Interface Trap Density in SOI FinFETs

2007 ◽  
Vol 28 (3) ◽  
pp. 232-234 ◽  
Author(s):  
G. Kapila ◽  
B. Kaczer ◽  
A. Nackaerts ◽  
N. Collaert ◽  
G. V. Groeseneken
Keyword(s):  
Direct Measurement ◽  
Trap Density ◽  
Interface Trap Density ◽  
Interface Trap

scholarly journals Interface trap density and mobility extraction in InGaAs buried quantum well metal-oxide-semiconductor field-effect-transistors by gated Hall method

2014 ◽  
Vol 104 (13) ◽  
pp. 131605 ◽  
Author(s):  
Thenappan Chidambaram ◽  
Dmitry Veksler ◽  
Shailesh Madisetti ◽  
Andrew Greene ◽  
Michael Yakimov ◽  
...  
Keyword(s):  
Quantum Well ◽  
Metal Oxide ◽  
Field Effect ◽  
Field Effect Transistors ◽  
Metal Oxide Semiconductor ◽  
Trap Density ◽  
Oxide Semiconductor ◽  
Interface Trap Density ◽  
Interface Trap ◽  
Hall Method

Interface trap density in amorphous La2Hf2O7/SiO2 high-κ gate stacks on Si

2005 ◽  
Vol 80 (2) ◽  
pp. 253-257 ◽  
Author(s):  
B. Mereu ◽  
A. Dimoulas ◽  
G. Vellianitis ◽  
G. Apostolopoulos ◽  
R. Scholz ◽  
...  
Keyword(s):  
Trap Density ◽  
Interface Trap Density ◽  
Interface Trap ◽  
Gate Stacks
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