Effects of Particle Size on Soft Lithography Process, the Green and Sintered Micro Alumina Parts

We create an elastic porous polydimethylsiloxane highly stretchable conductive substrate. The surface is fabricated by a simple soft lithography process that replicates the 3D corrugated porous microstructures from a low-cost commercially available abrasive paper.

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Simple ultraviolet-based soft-lithography process for fabrication of low-loss polymer polysiloxanes-based waveguides

IET Optoelectronics ◽

10.1049/iet-opt.2010.0110 ◽

2011 ◽

Vol 5 (6) ◽

pp. 265 ◽

Cited By ~ 2

Author(s):

J. Teng ◽

H. Yan ◽

L. Li ◽

M. Zhao ◽

H. Zhang ◽

...

Keyword(s):

Soft Lithography ◽

Low Loss ◽

Lithography Process

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A Cascade Microfluidic Device for High Quality Mitochondria Extraction

Volume 4: 20th Design for Manufacturing and the Life Cycle Conference; 9th International Conference on Micro- and Nanosystems ◽

10.1115/detc2015-46117 ◽

2015 ◽

Cited By ~ 1

Author(s):

Ching-Wen Li ◽

Pao-Hsin Yen ◽

Gou-Jen Wang

Keyword(s):

Microfluidic Device ◽

Complex I ◽

Soft Lithography ◽

Cell Damage ◽

High Quality ◽

Protein Assay ◽

Lithography Process ◽

Disease Therapy ◽

Sds Page ◽

Total Protein Assay

Recent researches have demonstrated that cells ingest mitochondrial by endocytosis to repair cell damage. This new mitochondrial therapy approach can be used for curing particular disease of neuropathy related diseases. Hence the obtainment of high quality and healthy mitochondria play an important role in mitochondrial based disease therapy. In this study, we propose a cascade microfluidic device for green extraction of healthy mitochondria. The geometry of the device was designed using the commercially available COMSOL package. Soft lithography process was than conducted to realize the device of PDMS. We used C2-GFP cells to demonstrate the efficiency of the proposed cascade microfluidic device. The total protein assay kit (complex I-V) was conducted to examine the extractive protein and the SDS page (Tom 20) was used for measuring the activity of the extracted mitochondria. Experimental results illustrate that the complex I-V expression of the extracted mitochondria by the proposed device is much higher than that of the extracted mitochondria by conventional kit. Furthermore, the results of the Tom 20 expression also demonstrate that our device is able to extract more amounts of mitochondria than the conventional kit.

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Fabrication Techniques for PDMS Dome-Shaped Membrane Using Soft Lithography Process

Applied Mechanics and Materials ◽

10.4028/www.scientific.net/amm.660.899 ◽

2014 ◽

Vol 660 ◽

pp. 899-903

Author(s):

Mohd Norzaidi Mat Nawi ◽

Asrulnizam Abd Manaf ◽

Mohd Rizal Arshad ◽

Othman Sidek

Keyword(s):

Electron Microscope ◽

Scanning Electron Microscope ◽

Temperature Effect ◽

Soft Lithography ◽

Substrate Material ◽

Pattern Transfer ◽

Uniform Thickness ◽

Lithography Process ◽

Suitable Temperature ◽

Scanning Electron

The dome-shaped membrane is very important part of the micro/nano devices. The dome-shaped with the thickness of 150 μm and a radius of 3.2 mm was fabricated using the soft lithography process. The Polydimethylsiloxane (PDMS) was selected as a material because it deformable and suitable to implement as a membrane. Soft lithography is based on pattern transfer using a mold that is patterning the substrate material. In this paper, two techniques were suggested to fabricate the dome-shaped membrane which are reflow technique and stamping technique. The comparison was made for both techniques using a Scanning Electron Microscope (SEM) and it seems the stamping technique has an advantage where the uniform thickness of the dome-shaped membrane can be achieved. The discussion on the temperature effect of a stamping technique shows that the suitable temperature to harden the PDMS is in temperature room where the bubbles can be eliminated under this temperature.

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Simple Preparation of Polydimethylsiloxane and Polyurethane Blend Film for Marine Antibiofouling Application

Polymers ◽

10.3390/polym13142242 ◽

2021 ◽

Vol 13 (14) ◽

pp. 2242

Author(s):

Jirasuta Chungprempree ◽

Sutep Charoenpongpool ◽

Jitima Preechawong ◽

Nithi Atthi ◽

Manit Nithitanakul

Keyword(s):

Contact Angle ◽

Polymer Film ◽

Water Contact Angle ◽

Bonding Strength ◽

Soft Lithography ◽

Water Contact ◽

Pdms Film ◽

Lithography Process ◽

Micro Patterning ◽

Marine Industry

A key way to prevent undesirable fouling of any structure in the marine environment, without harming any microorganisms, is to use a polymer film with high hydrophobicity. The polymer film, which was simply prepared from a blend of hydrophobic polydimethylsiloxane elastomer and hydrophilic polyurethane, showed improved properties and economic viability for antifouling film for the marine industry. The field emission scanning electron microscope and energy dispersive X-ray spectrometer (FESEM and EDX) results from the polymer blend suggested a homogenous morphology and good distribution of the polyurethane disperse phase. The PDMS:PU blend (95:5) film gave a water contact angle of 103.4° ± 3.8° and the PDMS film gave a water contact angle of 109.5° ± 4.2°. Moreover, the PDMS:PU blend (95:5) film could also be modified with surface patterning by using soft lithography process to further increase the hydrophobicity. It was found that PDMS:PU blend (95:5) film with micro patterning from soft lithography process increased the contact angle to 128.8° ± 1.6°. The results from a field test in the Gulf of Thailand illustrated that the bonding strength between the barnacles and the PDMS:PU blend (95:5) film (0.07 MPa) were lower than the bonding strength between the barnacles and the carbon steel (1.16 MPa). The barnacles on the PDMS:PU blend (95:5) film were more easily removed from the surface. This indicated that the PDMS:PU blend (95:5) exhibited excellent antifouling properties and the results indicated that the PDMS:PU blend (95:5) film with micro patterning surface could be employed for antifouling application.

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A PSQ-L polymer microring resonator fabricated by a simple UV-based soft-lithography process

CLEO/Europe - EQEC 2009 - European Conference on Lasers and Electro-Optics and the European Quantum Electronics Conference ◽

10.1109/cleoe-eqec.2009.5196462 ◽

2009 ◽

Author(s):

Jie Teng ◽

Stijn Scheerlinck ◽

Geert Morthier ◽

Roel Baets

Keyword(s):

Soft Lithography ◽

Microring Resonator ◽

Lithography Process

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Effect of Silanization Film Thickness in Soft Lithography of Nanoscale Features

Journal of Nanotechnology in Engineering and Medicine ◽

10.1115/1.4005665 ◽

2011 ◽

Vol 2 (4) ◽

Cited By ~ 7

Author(s):

Lucas H. Ting ◽

Shirin Feghhi ◽

Sangyoon J. Han ◽

Marita L. Rodriguez ◽

Nathan J. Sniadecki

Keyword(s):

Electron Microscopy ◽

Scanning Electron Microscopy ◽

Electron Beam ◽

Electron Beam Lithography ◽

Soft Lithography ◽

Critical Parameter ◽

Lithography Process ◽

Fluorinated Silane ◽

Nanoscale Features ◽

Scanning Electron

Soft lithography was used to replicate nanoscale features made using electron beam lithography on a polymethylmethacrylate (PMMA) master. The PMMA masters were exposed to fluorinated silane vapors to passivate its surfaces so that polydimethylsiloxane (PDMS) did not permanently bond to the master. From scanning electron microscopy, the silanization process was found to deposit a coating on the master that was a few hundreds of nanometers thick. These silane films partially concealed the nanoscale holes on the PMMA master, causing the soft lithography process to produce PDMS features with dimensions that were significantly reduced. The thickness of the silane films was directly measured on silicon or PMMA masters and was found to increase with exposure time to silane vapors. These findings indicate that the thickness of the silane coatings is a critical parameter when using soft lithography to replicate nanoscale features, and caution should be taken on how long a master is exposed to silane vapors.

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