Strength and Isothermal Fatigue Resistance of Snbi/snagcu Joints Reflowed At Low Temperatures

Author(s):  
Manu Yadav ◽  
Thaer Alghoul ◽  
Sanoop Thekkut ◽  
Ronit Das ◽  
Christopher Greene ◽  
...  

Abstract Soldered microelectronics assemblies may have to survive a variety of mechanical loads in repeated drops, cyclic bending, or vibration. A very large body of work has addressed the isothermal fatigue performance of SnAgCu solder joints. The present work offers a general assessment of the achievable performance of so-called hybrid solder joints formed by soldering with eutectic SnBi or SnBiAg to SnAgCu bumps on area array components. This allows for soldering at much lower temperatures than with SnAgCu alone, but the deformation and damage properties of the resulting structures depend strongly on details of the design and process. A peak reflow temperature of 175C was shown to be sufficient to ensure that the life of the joints remains limited by fatigue of the unmixed SnAgCu near the component. However, a higher effective stiffness of the mixed region near the substrate means that the life will be lower by 45%.

2008 ◽  
Vol 48 (3) ◽  
pp. 431-437 ◽  
Author(s):  
Qiang Yu ◽  
Tadahiro Shibutani ◽  
Do-Seop Kim ◽  
Yusuke Kobayashi ◽  
Jidong Yang ◽  
...  

Author(s):  
Byoung-Joon Kim ◽  
Hae-A-Seul Shin ◽  
In-Suk Choi ◽  
Young-Chang Joo

Abstract The electrical resistance Cu film on flexible substrate was investigated in cyclic bending deformation. The electrical resistance of 1 µm thick Cu film on flexible substrate increased up to 120 % after 500,000 cycles in 1.1 % tensile bending strain. Crack and extrusion were observed due to the fatigue damage of metal film. Low bending strain did not cause any damage on metal film but higher bending strain resulted in severe electrical and mechanical damage. Thinner film showed higher fatigue resistance because of the better mechanical property of thin film. Cu film with NiCr under-layer showed poorer fatigue resistance in tensile bending mode. Ni capping layer did not improve the fatigue resistance of Cu film, but Al capping layer suppressed crack formation and lowered electrical resistance change. The NiCr under layer, Ni capping layer, and Al capping layer effect on electrical resistance change of Cu film was compared with Cu only sample.


2007 ◽  
Vol 47 (12) ◽  
pp. 2161-2168 ◽  
Author(s):  
Weiqun Peng ◽  
Eduardo Monlevade ◽  
Marco E. Marques

2001 ◽  
Vol 24 (1) ◽  
pp. 10-16 ◽  
Author(s):  
S.H. Fan ◽  
Y.C. Chan ◽  
C.W. Tang ◽  
J.K.L. Lai

2020 ◽  
Vol 54 ◽  
pp. 221-227
Author(s):  
Waluyo Adi Siswanto ◽  
M. Arun ◽  
Irina V. Krasnopevtseva ◽  
A. Surendar ◽  
Andino Maseleno

Author(s):  
Jicheng Gong ◽  
Changqing Liu ◽  
Paul P. Conway ◽  
Vadim V. Silberschmidt

2018 ◽  
Vol 47 (5) ◽  
pp. 2526-2544 ◽  
Author(s):  
Peter Borgesen ◽  
Luke Wentlent ◽  
Sa’d Hamasha ◽  
Saif Khasawneh ◽  
Sam Shirazi ◽  
...  

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