The Improvement of the Micro Torsional Mirror by a Reinforced Folded Frame

2000 ◽  
Author(s):  
Hung-Yi Lin ◽  
Weileun Fang
Keyword(s):  
Thin Film ◽  
Residual Stresses ◽  
Film Thickness ◽  
Experimental Results ◽  
Dynamic Loads ◽  
Inertia Force ◽  
Optical Performance ◽  
Thin Film Thickness ◽  
Static Loads ◽  
Dynamic Inertia

Abstract Stiffness of micromachined structures is limited by thin film thickness. Hence, static loads such as thin film residual stresses, or dynamic loads such as the inertia force could significantly deform the thinness micromachined torsional mirror. This work aims to stiffen the thin film micromachinined torsional mirror. The proposed torsional mirror exploits a reinforced frame to improve the stiffness of the mirror plate. Consequently, the mirror plate has less deformation no matter subject to the residual stresses or to the dynamic inertia force. In addition the reinforced frame stiffen the mirror without increasing the mass significantly. In application of this technique, the micro torsional mirror was fabricated through the integration of DRIE, conventional bulk and surface micromachining processes. The experimental results demonstrated that the proposed design significantly improves the flatness of the mirror plate in both static and dynamic conditions. Consequently, the optical performance of the micro torsional mirror was improved.

Organic thin film thickness-dependent photocurrents polarity in graphene heterojunction phototransistor

Carbon ◽  
2021 ◽  
Vol 178 ◽  
pp. 506-514
Author(s):  
Meiyu He ◽  
Jiayue Han ◽  
Xingwei Han ◽  
Jun Gou ◽  
Ming Yang ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Organic Thin Film ◽  
Thin Film Thickness

scholarly journals Precise control of Jeff=12 magnetic properties in Sr2IrO4 epitaxial thin films by variation of strain and thin film thickness

2020 ◽  
Vol 102 (21) ◽  
Author(s):  
Stephan Geprägs ◽  
Björn Erik Skovdal ◽  
Monika Scheufele ◽  
Matthias Opel ◽  
Didier Wermeille ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetic Properties ◽  
Film Thickness ◽  
Epitaxial Thin Films ◽  
Thin Film Thickness ◽  
Precise Control

scholarly journals Optimization of Fiber Bragg Gratings Inscribed in Thin Films Deposited on D-Shaped Optical Fibers

Sensors ◽  
2021 ◽  
Vol 21 (12) ◽  
pp. 4056
Author(s):  
José Javier Imas ◽  
Carlos R. Zamarreño ◽  
Ignacio del Villar ◽  
Ignacio R. Matías
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Optical Fibers ◽  
Flat Surface ◽  
Sno2 Thin Film ◽  
Thin Film Thickness ◽  
A Value ◽  
Surrounding Refractive Index ◽  
Reflected Power ◽  
Fabrication Parameters

A fiber Bragg grating patterned on a SnO2 thin film deposited on the flat surface of a D-shaped polished optical fiber is studied in this work. The fabrication parameters of this structure were optimized to achieve a trade-off among reflected power, full width half maximum (FWHM), sensitivity to the surrounding refractive index (SRI), and figure of merit (FOM). In the first place, the influence of the thin film thickness, the cladding thickness between the core and the flat surface of the D-shaped fiber (neck), and the length of the D-shaped zone over the reflected power and the FWHM were assessed. Reflected peak powers in the range from −2 dB to −10 dB can be easily achieved with FWHM below 100 pm. In the second place, the sensitivity to the SRI, the FWHM, and the FOM were analyzed for variations of the SRI in the 1.33–1.4 range, the neck, and the thin-film thickness. The best sensitivities theoretically achieved for this device are next to 40 nm/RIU, while the best FOM has a value of 114 RIU−1.

Influence of ion beam parameters onto two-dimensional optical thin film thickness distributions deposited by ion beam sputtering

2019 ◽  
Vol 682 ◽  
pp. 109-120 ◽  
Author(s):  
Wjatscheslaw Sakiew ◽  
Stefan Schrameyer ◽  
Marco Jupé ◽  
Philippe Schwerdtner ◽  
Nick Erhart ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Ion Beam ◽  
Two Dimensional ◽  
Ion Beam Sputtering ◽  
Thin Film Thickness ◽  
Optical Thin Film ◽  
Beam Sputtering ◽  
Beam Parameters

Thin film thickness sensor based on a new magnetostrictive delay line arrangement

1999 ◽  
Vol 76 (1-3) ◽  
pp. 156-161 ◽  
Author(s):  
E. Hristoforou ◽  
H. Chiriac ◽  
J.N. Avaritsiotis
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Delay Line ◽  
Thin Film Thickness ◽  
Line Arrangement
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