Wideband bright-soliton frequency-comb generation at optical telecommunication wavelength in a thin silicon nitride film

2018 ◽  
Vol 12 (04) ◽  
pp. 1 ◽  
Author(s):  
Ali Eshaghian Dorche ◽  
Amir Hossein Hosseinnia ◽  
Ali Asghar Eftekhar ◽  
Ali Adibi
Keyword(s):  
Silicon Nitride ◽  
Frequency Comb ◽  
Optical Telecommunication ◽  
Bright Soliton ◽  
Nitride Film ◽  
Silicon Nitride Film ◽  
Telecommunication Wavelength ◽  
Thin Silicon ◽  
Comb Generation

The Effects of Chemical Vapor Cleaning Chemistries on Silicon Surfaces

1993 ◽  
Vol 318 ◽  
Author(s):  
S.E. Beck ◽  
A.G. Gilicinski ◽  
B.S. Felker ◽  
J.G. Langan ◽  
D.A. Bohling ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Plasma Treatment ◽  
Silicon Surface ◽  
Chemical Vapor ◽  
Silicon Surfaces ◽  
Nitride Film ◽  
Silicon Nitride Film ◽  
Thin Silicon

ABSTRACTThis study explores the effects of two chemical vapor cleaning chemistries on silicon surfaces. The silicon surfaces are not significantly roughened by exposure to either process. Trace amounts of fluorine are found on the surfaces exposed to 1,1,1,5,5,5-hexafluoro-2,4-pentanedione (HFAC). A thin silicon nitride film forms on the silicon surface as a result of exposure to the HMDS process and is attributed to the H2/N2 plasma treatment used in the first step of the process.

scholarly journals Dispersion engineering and frequency comb generation in thin silicon nitride concentric microresonators

2017 ◽  
Vol 8 (1) ◽  
Author(s):  
Sangsik Kim ◽  
Kyunghun Han ◽  
Cong Wang ◽  
Jose A. Jaramillo-Villegas ◽  
Xiaoxiao Xue ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Frequency Comb ◽  
Dispersion Engineering ◽  
Thin Silicon ◽  
Comb Generation

Microbridge Testing of Thin Films Under Small Deformation

1999 ◽  
Vol 594 ◽  
Author(s):  
T. Y. Zhang ◽  
Y. J. Su ◽  
C. F. Qian ◽  
M. H. Zhao ◽  
L. Q. Chen
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Silicon Nitride ◽  
Young’S Modulus ◽  
Young's Modulus ◽  
Chemical Vapor ◽  
Small Deformation ◽  
Nitride Film ◽  
Silicon Nitride Film ◽  
Pressure Chemical

AbstractThe present work proposes a novel microbridge testing method to simultaneously evaluate the Young's modulus, residual stress of thin films under small deformation. Theoretic analysis and finite element calculation are conducted on microbridge deformation to provide a closed formula of deflection versus load, considering both substrate deformation and residual stress in the film. Silicon nitride films fabricated by low pressure chemical vapor deposition on silicon substrates are tested to demonstrate the proposed method. The results show that the Young's modulus and residual stress for the annealed silicon nitride film are respectively 202 GPa and 334.9 MPa.

Investigation on the composition and structure of silicon nitride film prepared by ECR-PECVD

1994 ◽  
Vol 3 (9) ◽  
pp. 682-689 ◽  
Author(s):  
Chen Jun-fang ◽  
Cheng Shao-yu ◽  
Ren Zhao-xing ◽  
Zhang Su-qing ◽  
Ning Zhao-yuan ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Nitride Film ◽  
Silicon Nitride Film ◽  
Composition And Structure
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