Direct patterning of TiO2 and TiN based sol-gel using laser interference and nanospheres UV lithography

AbstractAn optimized reverse micelles sol-gel composition was deposited by inkjet direct patterning onto glass supports. Experimental “material printer” Fujifilm Dimatix 2831 was used for sol patterning. Printing was repeated up to 4 times in wet-to-dry manner and photocatalytic coatings of various thickness were obtained after final thermal calcination. Basic material properties of prepared coating were studied by optical microscopy, electron and atomic force imaging, Raman, XRD and UV-VIS spectrometry. Photocatalytic activity was evaluated by dye and fatty acid degradation rate as well as photoinduced hydrophilic conversion rate. Reverse micelles proved to be viable synthetic route for the preparation of titania coatings with even structure and their compatibility with inkjet direct patterning deposition was demonstrated.

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Direct patterning of polystyrene-polymethyl methacrylate copolymer by means of laser interference lithography using UV laser irradiation

Polymer Engineering & Science ◽

10.1002/pen.21189 ◽

2008 ◽

Vol 48 (12) ◽

pp. 2367-2372 ◽

Cited By ~ 14

Author(s):

A.F. Lasagni ◽

D.F. Acevedo ◽

C.A. Barbero ◽

F. Mücklich

Keyword(s):

Laser Irradiation ◽

Polymethyl Methacrylate ◽

Interference Lithography ◽

Laser Interference Lithography ◽

Uv Laser ◽

Laser Interference ◽

Direct Patterning ◽

Methacrylate Copolymer

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Direct patterning of sol–gel metal oxide semiconductor and dielectric films via selective surface wetting

RSC Advances ◽

10.1039/c5ra04515k ◽

2015 ◽

Vol 5 (48) ◽

pp. 38125-38129 ◽

Cited By ~ 30

Author(s):

Sujin Sung ◽

Sungjun Park ◽

Seungbok Cha ◽

Won-June Lee ◽

Chang-Hyun Kim ◽

...

Keyword(s):

Metal Oxide ◽

Low Voltage ◽

Thin Film Transistor ◽

Sol Gel ◽

Oxide Semiconductor ◽

Oxide Thin Film ◽

Dielectric Films ◽

Surface Wetting ◽

Direct Patterning ◽

Metal Oxide Thin Film

Simple, photolithography-free, direct patterning of solution-processed metal oxide materials was developed for fabricating all-solution low-voltage metal oxide thin-film transistor arrays.

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Spatially-Regulated Deposition of Quantum Dots on the Patterned Polymer Brush

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2020.18523 ◽

2020 ◽

Vol 20 (8) ◽

pp. 5201-5210

Author(s):

Tomoya Sato ◽

Gary J. Dunderdale ◽

Chihiro Urata ◽

Atsushi Hozumi

Keyword(s):

Quantum Dots ◽

Chemical Reactivity ◽

Sol Gel ◽

Polymer Brush ◽

Silicon Substrates ◽

Mild Conditions ◽

Air Atmosphere ◽

Direct Patterning ◽

Functionalized Nanomaterials ◽

Epoxy Groups

We have demonstrated direct patterning of surface initiator layer (SIL) for Atom Transfer Radical Polymerization (ATRP) using a sol–gel based “ink” containing (p-chloromethyl)phenyltrimethoxysilane and tetraethoxysilane for an inkjet printer. Mechanically/chemically robust and smooth micropatterns of SIL several tens of micrometer in width and 15 nm thickness were directly printed on silicon substrates under mild conditions (open to the atmosphere, at ~28 °C under >60% relative humidity). Subsequent surface-initiated ATRP of glycidyl methacrylate (GMA) under the air atmosphere gave area-selective/stepwise growth of homogeneous polyGMA brushes (pGMA) from the micropatterns of SIL. This area-selective growth of pGMA was also confirmed by a fluorescence microscopy. Because of chemical reactivity of epoxy groups on the grafted pGMA surfaces toward amino-functionalized nanomaterials, CdS/ZnS-alloyed quantum dots were spatially deposited only on the pGMA-covered regions with a complete area-selectivity.

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Fabrication of two-dimensional lattices by using photosensitive sol–gel and four-beam laser interference

Journal of Non-Crystalline Solids ◽

10.1016/j.jnoncrysol.2010.11.013 ◽

2011 ◽

Vol 357 (3) ◽

pp. 1223-1227 ◽

Cited By ~ 7

Author(s):

Zhezhe Wang ◽

Gaoyang Zhao ◽

Xiaolei Zhang ◽

Liu Heguang ◽

Nana Zhao

Keyword(s):

Sol Gel ◽

Two Dimensional ◽

Laser Interference ◽

Beam Laser

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Top-down and bottom-up nanofabrication for multipurpose applications.

MRS Proceedings ◽

10.1557/proc-0921-t03-06 ◽

2006 ◽

Vol 921 ◽

Author(s):

Enzo Di Fabrizio ◽

Filippo Romanato ◽

Stefano Cabrini ◽

Francesco Deangelis ◽

Arum Amy Yu ◽

...

Keyword(s):

Electron Beam Lithography ◽

Ion Beam ◽

Sol Gel ◽

Top Down ◽

Bottom Up ◽

Direct Patterning ◽

Focus Ion Beam ◽

Fluorescent Molecules ◽

Beam Technique ◽

Nanoscale Level

AbstractIn this article we will show three recent examples of combined strategies aiming at merging top-down and bottom-up approach for nanofabrication at nanoscale level. The first example shows the fabrication of nanogaps performed by Focus Ion Beam technique that have been used to measure the conductivity of few gold nanoparticles aggregates deposited by Dip Pen lithography. The second example deals with the parallel replica of high resolution master generated by Electron Beam lithography by means of an innovative lithographic process based on DNA supramolecular nano-stamping. The latter example proposes the possibility to generate, through radiation exposure, direct patterning of hybrid sol gel material doped with fluorescent molecules. The outline of the fabrication approaches and their scientific and technical perspective are discussed.

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