Direct Patterning on Sol–Gel Low-kPorous Silica by Thermal Nanoimprinting

2010 ◽  
Vol 49 (6) ◽  
pp. 06GL08 ◽  
Author(s):  
Makoto Okada ◽  
Takahiro Nakayama ◽  
Yuji Kang ◽  
Yuichi Haruyama ◽  
Kazuhiro Kanda ◽  
...  
Keyword(s):  
Sol Gel ◽  
Direct Patterning

Photocatalytic and Self-cleaning Properties of Titania Coatings Prepared by Inkjet Direct Patterning of a Reverse Micelles Sol-gel Composition

2012 ◽  
Vol 15 (1) ◽  
Author(s):  
Petr Dzik ◽  
Magdalena Morozová ◽  
Petr Klusoň ◽  
Michal Veselý
Keyword(s):  
Material Properties ◽  
Reverse Micelles ◽  
Degradation Rate ◽  
Sol Gel ◽  
Basic Material ◽  
Fatty Acid Degradation ◽  
Direct Patterning ◽  
Atomic Force ◽  
Titania Coatings ◽  
Gel Composition

AbstractAn optimized reverse micelles sol-gel composition was deposited by inkjet direct patterning onto glass supports. Experimental “material printer” Fujifilm Dimatix 2831 was used for sol patterning. Printing was repeated up to 4 times in wet-to-dry manner and photocatalytic coatings of various thickness were obtained after final thermal calcination. Basic material properties of prepared coating were studied by optical microscopy, electron and atomic force imaging, Raman, XRD and UV-VIS spectrometry. Photocatalytic activity was evaluated by dye and fatty acid degradation rate as well as photoinduced hydrophilic conversion rate. Reverse micelles proved to be viable synthetic route for the preparation of titania coatings with even structure and their compatibility with inkjet direct patterning deposition was demonstrated.

Direct patterning of sol–gel metal oxide semiconductor and dielectric films via selective surface wetting

RSC Advances ◽  
2015 ◽  
Vol 5 (48) ◽  
pp. 38125-38129 ◽  
Author(s):  
Sujin Sung ◽  
Sungjun Park ◽  
Seungbok Cha ◽  
Won-June Lee ◽  
Chang-Hyun Kim ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Low Voltage ◽  
Thin Film Transistor ◽  
Sol Gel ◽  
Oxide Semiconductor ◽  
Oxide Thin Film ◽  
Dielectric Films ◽  
Surface Wetting ◽  
Direct Patterning ◽  
Metal Oxide Thin Film

Simple, photolithography-free, direct patterning of solution-processed metal oxide materials was developed for fabricating all-solution low-voltage metal oxide thin-film transistor arrays.

Spatially-Regulated Deposition of Quantum Dots on the Patterned Polymer Brush

2020 ◽  
Vol 20 (8) ◽  
pp. 5201-5210
Author(s):  
Tomoya Sato ◽  
Gary J. Dunderdale ◽  
Chihiro Urata ◽  
Atsushi Hozumi
Keyword(s):  
Quantum Dots ◽  
Chemical Reactivity ◽  
Sol Gel ◽  
Polymer Brush ◽  
Silicon Substrates ◽  
Mild Conditions ◽  
Air Atmosphere ◽  
Direct Patterning ◽  
Functionalized Nanomaterials ◽  
Epoxy Groups

We have demonstrated direct patterning of surface initiator layer (SIL) for Atom Transfer Radical Polymerization (ATRP) using a sol–gel based “ink” containing (p-chloromethyl)phenyltrimethoxysilane and tetraethoxysilane for an inkjet printer. Mechanically/chemically robust and smooth micropatterns of SIL several tens of micrometer in width and 15 nm thickness were directly printed on silicon substrates under mild conditions (open to the atmosphere, at ~28 °C under >60% relative humidity). Subsequent surface-initiated ATRP of glycidyl methacrylate (GMA) under the air atmosphere gave area-selective/stepwise growth of homogeneous polyGMA brushes (pGMA) from the micropatterns of SIL. This area-selective growth of pGMA was also confirmed by a fluorescence microscopy. Because of chemical reactivity of epoxy groups on the grafted pGMA surfaces toward amino-functionalized nanomaterials, CdS/ZnS-alloyed quantum dots were spatially deposited only on the pGMA-covered regions with a complete area-selectivity.

Top-down and bottom-up nanofabrication for multipurpose applications.

2006 ◽  
Vol 921 ◽  
Author(s):  
Enzo Di Fabrizio ◽  
Filippo Romanato ◽  
Stefano Cabrini ◽  
Francesco Deangelis ◽  
Arum Amy Yu ◽  
...  
Keyword(s):  
Electron Beam Lithography ◽  
Ion Beam ◽  
Sol Gel ◽  
Top Down ◽  
Bottom Up ◽  
Direct Patterning ◽  
Focus Ion Beam ◽  
Fluorescent Molecules ◽  
Beam Technique ◽  
Nanoscale Level

AbstractIn this article we will show three recent examples of combined strategies aiming at merging top-down and bottom-up approach for nanofabrication at nanoscale level. The first example shows the fabrication of nanogaps performed by Focus Ion Beam technique that have been used to measure the conductivity of few gold nanoparticles aggregates deposited by Dip Pen lithography. The second example deals with the parallel replica of high resolution master generated by Electron Beam lithography by means of an innovative lithographic process based on DNA supramolecular nano-stamping. The latter example proposes the possibility to generate, through radiation exposure, direct patterning of hybrid sol gel material doped with fluorescent molecules. The outline of the fabrication approaches and their scientific and technical perspective are discussed.

scholarly journals Optical Properties of Titania Coatings Prepared by Inkjet Direct Patterning of a Reverse Micelles Sol-Gel Composition

Molecules ◽  
2015 ◽  
Vol 20 (8) ◽  
pp. 14552-14564 ◽  
Author(s):  
Veronika Schmiedova ◽  
Petr Dzik ◽  
Michal Vesely ◽  
Oldrich Zmeskal ◽  
Magdalena Morozova ◽  
...  
Keyword(s):  
Optical Properties ◽  
Reverse Micelles ◽  
Sol Gel ◽  
Direct Patterning ◽  
Titania Coatings ◽  
Gel Composition

TEM visualization of surface replicated acid and base catalyzed sol-gel glasses

1986 ◽  
Vol 44 ◽  
pp. 448-449
Author(s):  
George C. Ruben ◽  
Merrill W. Shafer
Keyword(s):  
Elevated Temperatures ◽  
Sol Gel ◽  
Basic Medium ◽  
Glass Transition Point ◽  
Structural Space ◽  
Acid And Base ◽  
Organometallic Precursors ◽  
New Processing ◽  
Gel Glasses ◽  
Physical Phenomena

Traditionally ceramics have been shaped from powders and densified at temperatures close to their liquid point. New processing methods using various types of sols, gels, and organometallic precursors at low temperature which enable densificatlon at elevated temperatures well below their liquidus, hold the promise of producing ceramics and glasses of controlled and reproducible properties that are highly reliable for electronic, structural, space or medical applications. Ultrastructure processing of silicon alkoxides in acid medium and mixtures of Ludox HS-40 (120Å spheres from DuPont) and Kasil (38% K2O &62% SiO2) in basic medium have been aimed at producing materials with a range of well defined pore sizes (∼20-400Å) to study physical phenomena and materials behavior in well characterized confined geometries. We have studied Pt/C surface replicas of some of these porous sol-gels prepared at temperatures below their glass transition point.

Electron microscopy studies of PZT ferroelectric film capacitor structures

1992 ◽  
Vol 50 (2) ◽  
pp. 1364-1365
Author(s):  
V. Kaushik ◽  
P. Maniar ◽  
J. Olowolafe ◽  
R. Jones ◽  
A. Campbell ◽  
...  
Keyword(s):  
Electric Fields ◽  
Sol Gel ◽  
Ferroelectric Material ◽  
Dielectric Constants ◽  
Dielectric Films ◽  
Lead Zirconium Titanate ◽  
Si Substrate ◽  
Film Capacitor ◽  
Pzt Films ◽  
High Dielectric

Lead zirconium titanate films (Pb (Zr,Ti) O3 or PZT) are being considered for potential application as dielectric films in memory technology due to their high dielectric constants. PZT is a ferroelectric material which shows spontaneous polarizability, reversible under applied electric fields. We report herein some results of TEM studies on thin film capacitor structures containing PZT films with platinum-titanium electrodes.The wafers had a stacked structure consisting of PZT/Pt/Ti/SiO2/Si substrate as shown in Figure 1. Platinum acts as electrode material and titanium is used to overcome the problem of platinum adhesion to the oxide layer. The PZT (0/20/80) films were deposited using a sol-gel method and the structure was annealed at 650°C and 800°C for 30 min in an oxygen ambient. XTEM imaging was done at 200KV with the electron beam parallel to <110> zone axis of silicon.Figure 2 shows the PZT and Pt layers only, since the structure had a tendency to peel off at the Ti-Pt interface during TEM sample preparation.

The crystallization of thin-film ceramics

1992 ◽  
Vol 50 (1) ◽  
pp. 338-339
Author(s):  
J.M. Schwartz ◽  
L.F. Francis ◽  
L.D. Schmidt ◽  
P.S. Schabes-Retchkiman
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Sol Gel ◽  
Processing Route ◽  
Small Areas ◽  
Ceramic Thin Films ◽  
Complex Shapes ◽  
Sol Gel Process ◽  
Ceramic Precursors ◽  
Crystalline Ceramic

Ceramic thin films and coatings are of interest for electrical, optical, magnetic and thermal barrier applications. Critical for improved properties in thin films is the development of specific microstructures during processing. To this end, the sol-gel method is advantageous as a versatile processing route. The sol-gel process involves depositing a solution containing metalorganic or colloidal ceramic precursors onto a substrate and heating the deposited layer to form a crystalline or non-crystalline ceramic coating. This route has several advantages, including the ability to create tailored microstructures and properties, to coat large or small areas, simple or complex shapes, and to more easily prepare multicomponent ceramics. Sol-gel derived coatings are amorphous in the as-deposited state and develop their crystalline structure and microstructure during heat-treatment. We are particularly interested in studying the amorphous to crystalline transformation, because many key features of the microstructure such as grain size and grain size distribution may be linked to this transformation.

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