Laser-Beam-Scanning Chemical Vapor Deposition Technique for Controlling the Spatial Thickness Distribution of Thin Films

1991 ◽  
Vol 30 (Part 1, No. 8) ◽  
pp. 1740-1741 ◽  
Author(s):  
Yuka Yamada ◽  
Katsuhiko Mutoh ◽  
Takashi Iwabuchi ◽  
Takeo Miyata
1989 ◽  
Vol 169 ◽  
Author(s):  
Shinji Gohda ◽  
Yasuhiro Maeda

AbstractBi‐Sr‐Ca‐Cu‐0 superconducting thin films have been prepared on MgO substrates by a Metalorganic Chemical Vapor Deposition technique using an infrared lamp. It was found in this study that the film composition ratio could be precisely controlled by using this technique. A zero resistance at 81K was obtained for Bi1Sr1.3Ca0.9Cu1.8Ox film grown at 850°C. The critical current density of this film was 1.0xl03A/cm2 at 77K.


2016 ◽  
Vol 4 (16) ◽  
pp. 3403-3414 ◽  
Author(s):  
Hilal Goktas ◽  
Xiaoxue Wang ◽  
Nicolas D. Boscher ◽  
Stephen Torosian ◽  
Karen K. Gleason

Tuning the optoelectronic properties and the density of hydroxyl pendant groups of 3-thiopheneethanol-co-ethylenedioxythiohene produced via an oxidative chemical vapor deposition technique.


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