Si Nanowire CMOS Transistors and Circuits by Top-Down Technology Approach

2019 ◽  
Vol 13 (1) ◽  
pp. 201-211 ◽  
Author(s):  
Narayanan Balasubramanian ◽  
Navab Singh ◽  
Subhash C. Rustogi ◽  
Kavitha D. Buddharaju ◽  
J Fu ◽  
...  
Author(s):  
Stefano Bonaldo ◽  
Mariia Gorchichko ◽  
En Xia Zhang ◽  
Teng Ma ◽  
Serena Mattiazzo ◽  
...  

2008 ◽  
Vol 52 (9) ◽  
pp. 1312-1317 ◽  
Author(s):  
K.D. Buddharaju ◽  
N. Singh ◽  
S.C. Rustagi ◽  
Selin H.G. Teo ◽  
G.Q. Lo ◽  
...  
Keyword(s):  
Top Down ◽  

2011 ◽  
Author(s):  
T. Moon ◽  
J. Kang ◽  
Y. Han ◽  
C. Kim ◽  
Y. Jeon ◽  
...  

2013 ◽  
Vol 30 (1) ◽  
pp. 128-133
Author(s):  
Sungman Kim ◽  
Younghak Cho ◽  
Junhyung Lee ◽  
Jihyoung Rho ◽  
Daesung Lee

2016 ◽  
Vol 4 (18) ◽  
pp. 3890-3897 ◽  
Author(s):  
Christopher W. Pinion ◽  
Joseph D. Christesen ◽  
James F. Cahoon

Bottom-up, chemical methods to control the morphology of semiconductor nanostructures are a promising complement to the top-down fabrication techniques that currently dominate the semiconductor industry.


2010 ◽  
Vol 9 (1) ◽  
pp. 114-122 ◽  
Author(s):  
Jing Zhuge ◽  
Yu Tian ◽  
Runsheng Wang ◽  
Ru Huang ◽  
Yiqun Wang ◽  
...  

2013 ◽  
Vol 13 (5) ◽  
pp. 3350-3353 ◽  
Author(s):  
Youngin Jeon ◽  
Jeongmin Kang ◽  
Myeongwon Lee ◽  
Taeho Moon ◽  
Sangsig Kim

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