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Novel Exploration of Flat-Band Voltage Manipulation by NPT for Advanced High-k/Metal-Gate CMOS Technology
ECS Meeting Abstracts
◽
10.1149/ma2019-01/23/1174
◽
2019
◽
Keyword(s):
Cmos Technology
◽
Flat Band
◽
Flat Band Voltage
◽
Metal Gate
◽
High K
Download Full-text
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Cited By
References
Novel Exploration of Flat-Band Voltage Manipulation by Nitrogen Plasma Treatment for Advanced High-k/Metal-Gate CMOS Technology
ECS Transactions
◽
10.1149/08903.0055ecst
◽
2019
◽
Vol 89
(3)
◽
pp. 55-59
Author(s):
Jiaxin Yao
◽
Zhaozhao Hou
◽
Zhenhua Wu
◽
Huaxiang Yin
Keyword(s):
Plasma Treatment
◽
Cmos Technology
◽
Nitrogen Plasma
◽
Flat Band
◽
Flat Band Voltage
◽
Metal Gate
◽
High K
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Flat-band voltage shift in metal-gate/high- k /Si stacks
Chinese Physics B
◽
10.1088/1674-1056/20/9/097303
◽
2011
◽
Vol 20
(9)
◽
pp. 097303
◽
Cited By ~ 7
Author(s):
An-Ping Huang
◽
Xiao-Hu Zheng
◽
Zhi-Song Xiao
◽
Zhi-Chao Yang
◽
Mei Wang
◽
...
Keyword(s):
Flat Band
◽
Flat Band Voltage
◽
Metal Gate
◽
Voltage Shift
◽
High K
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Atomic mechanism of Flat band voltage shifts by Oxide dipole Layers in High K-Metal Gate Stacks
10.7567/ssdm.2010.b-3-1
◽
2010
◽
Author(s):
J. Robertson
◽
L. Lin
Keyword(s):
Flat Band
◽
Flat Band Voltage
◽
Gate Stacks
◽
Metal Gate
◽
Atomic Mechanism
◽
High K
Download Full-text
Modelling and characterisation of flat-band roll-off behaviours in LaOx capped high-K/metal-gate NMOSFET with 28 nm CMOS technology
International Journal of Nanotechnology
◽
10.1504/ijnt.2014.065129
◽
2014
◽
Vol 11
(12)
◽
pp. 1039
Author(s):
Wen Han Hung
◽
Feng Renn Juang
◽
Yean Kuen Fang
◽
Tzyy Ming Cheng
Keyword(s):
Cmos Technology
◽
Flat Band
◽
Metal Gate
◽
High K
◽
28 Nm
Download Full-text
Origin of flat-band voltage sharp roll-off in metal gate/high-k/ultrathin- SiO2/Si p-channel metal-oxide-semiconductor stacks
Applied Physics Letters
◽
10.1063/1.3491292
◽
2010
◽
Vol 97
(13)
◽
pp. 132908
◽
Cited By ~ 8
Author(s):
X. H. Zheng
◽
A. P. Huang
◽
Z. S. Xiao
◽
Z. C. Yang
◽
M. Wang
◽
...
Keyword(s):
Metal Oxide
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Flat Band
◽
Flat Band Voltage
◽
Metal Gate
◽
High K
Download Full-text
Analysis of USJ Formation with Combined RTA/Laser Annealing Conditions for 28nm High-K/Metal Gate CMOS Technology Using Advanced TCAD for Process and Device Simulation
2012 International Silicon-Germanium Technology and Device Meeting (ISTDM)
◽
10.1109/istdm.2012.6222439
◽
2012
◽
Cited By ~ 1
Author(s):
E. M. Bazizi
◽
S. M. Pandey
◽
C. Wang
◽
I. Jiang
◽
S. Chu
◽
...
Keyword(s):
Laser Annealing
◽
Device Simulation
◽
Cmos Technology
◽
Metal Gate
◽
Annealing Conditions
◽
High K
Download Full-text
Study on the Effect of Plasma Treatment on Flat-band-voltage and Equivalent Oxide Thickness using Metal-organic Chemical Vapor Deposition TiN Film as p-MOSFETS Metal Gate Electrode
Journal of Nanomedicine & Nanotechnology
◽
10.4172/2157-7439.s7-005
◽
2015
◽
Vol 01
(s7)
◽
Author(s):
Jianfeng Gao
◽
Hong Yang
Keyword(s):
Chemical Vapor
◽
Oxide Thickness
◽
Flat Band
◽
Organic Chemical
◽
Flat Band Voltage
◽
Equivalent Oxide Thickness
◽
Metal Gate
◽
Tin Film
◽
Metal Organic
◽
Organic Chemical Vapor Deposition
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Comprehensive Investigation of Flat-band Voltage Modulation by High-K NPT for Advanced HKMG Technology
2019 China Semiconductor Technology International Conference (CSTIC)
◽
10.1109/cstic.2019.8755681
◽
2019
◽
Author(s):
Jiaxin Yao
◽
Zhaozhao Hou
◽
Wenjuan Xiong
◽
Qingzhu Zhang
◽
Zhenhua Wu
◽
...
Keyword(s):
Flat Band
◽
Flat Band Voltage
◽
Comprehensive Investigation
◽
High K
Download Full-text
A 4.0 GHz 291 Mb Voltage-Scalable SRAM Design in a 32 nm High-k + Metal-Gate CMOS Technology With Integrated Power Management
IEEE Journal of Solid-State Circuits
◽
10.1109/jssc.2009.2034082
◽
2010
◽
Vol 45
(1)
◽
pp. 103-110
◽
Cited By ~ 32
Author(s):
Yih Wang
◽
Uddalak Bhattacharya
◽
Fatih Hamzaoglu
◽
Pramod Kolar
◽
Yong-Gee Ng
◽
...
Keyword(s):
Power Management
◽
Cmos Technology
◽
Metal Gate
◽
High K
◽
Sram Design
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High performance FDSOI CMOS technology with metal gate and high-k
Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005.
◽
10.1109/.2005.1469272
◽
2005
◽
Cited By ~ 12
Author(s):
B. Doris
◽
Y.H. Kim
◽
B.P. Linder
◽
M. Steen
◽
V. Narayanan
◽
...
Keyword(s):
High Performance
◽
Cmos Technology
◽
Metal Gate
◽
High K
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