(Invited) ALD of Phase Change and Threshold Switching Materials for Next-Generation Nonvolatile Memory Devices

2020 ◽  
Vol MA2020-02 (23) ◽  
pp. 1684-1684
Author(s):  
Valerio Adinolfi ◽  
Ryan Clarke ◽  
Mario Laudato ◽  
Scott Jewhurst ◽  
Martin McBriarty ◽  
...  
2007 ◽  
Vol 46 (No. 4) ◽  
pp. L99-L102 ◽  
Author(s):  
Sung-Min Yoon ◽  
Kyu-Jeong Choi ◽  
Nam-Yeal Lee ◽  
Seung-Yun Lee ◽  
Young-Sam Park ◽  
...  

1996 ◽  
Vol 433 ◽  
Author(s):  
Norifumi Fujimura ◽  
Tadashi Ishida ◽  
Takeshi Yoshimura ◽  
Taichiro Ito

AbstractWe have proposed ReMnO3 (Re:rare earth) thin films, as a new candidate for nonvolatile memory devices. In this paper, we try to fabricate (0001) oriented YMnO3 films on (111)MgO, (0001)ZnO:Al/(0001) sapphire and (111)Pt/(111)MgO using rf magnetron sputtering. We succeed in obtaining (0001) epitaxial YMnO3 films on (111) MgO and (0001)ZnO:Al/(0001)sapphire substrate, and polycrystalline films on (111)Pt/(1 11)MgO for the first time. Electrical property of the bottom electrode (ZnO:Al) changes with varying the deposition condition of YMnO3 films. However, we find an optimum deposition condition of ZnO:Al film such that it functions as a bottom electrode even after YMnO3 film deposition. The dielectric properties of the epitaxial and polycrystalline YMnO3 films are almost the same. The YMnO3 films show leaky electrical properties. This may be caused by a change in the valence electron of Mn from 3+.


2007 ◽  
Vol 91 (7) ◽  
pp. 073511 ◽  
Author(s):  
Liang Chen ◽  
Yidong Xia ◽  
Xuefei Liang ◽  
Kuibo Yin ◽  
Jiang Yin ◽  
...  

2013 ◽  
Vol 706-708 ◽  
pp. 103-107
Author(s):  
Jing Hang Hu ◽  
Xue Jian Yan ◽  
Guo Dong Zhu

In recent years ferroelectric polymer-based nonvolatile memory devices have attracted much attention due to their flexibility, transparency and ease of production. However, their electrical stability is seldom studied. In this letter we report the observation of electric fatigue in metal/ferroelectric polymer/SiO2/p-Si capacitor memories, which is compared with the electric fatigue obtained from metal/ferroelectric polymer/p-Si capacitors. Our experiments indicate that the existence of SiO2 layer has greatly improved the fatigue endurance in metal/ferroelectric polymer/SiO2/p-Si capacitors. We also discuss the possible mechanism causing this improved fatigue endurance.


Sign in / Sign up

Export Citation Format

Share Document