The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition

2012 ◽  
Vol 12 (7) ◽  
pp. 5494-5499 ◽  
Author(s):  
Jaesang Lee ◽  
Hyungchul Kim ◽  
Taeyong Park ◽  
Youngbin Ko ◽  
Heeyoung Jeon ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Radio Frequency ◽  
Room Temperature ◽  
Atomic Layer ◽  
Radio Frequency Plasma ◽  
Plasma Power ◽  
Remote Plasma ◽  
Layer Deposition ◽  
Frequency Plasma ◽  
Al2o3 Films

scholarly journals Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source

2011 ◽  
Vol 18 ◽  
pp. 100-106 ◽  
Author(s):  
Xingcun Li ◽  
Qiang Chen ◽  
Lijun Sang ◽  
Lizhen Yang ◽  
Zhongwei Liu ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Radio Frequency ◽  
Atomic Layer ◽  
Plasma Source ◽  
Radio Frequency Plasma ◽  
Layer Deposition ◽  
Frequency Plasma

Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition

2014 ◽  
Vol 115 (7) ◽  
pp. 073502 ◽  
Author(s):  
Hyunsoo Jung ◽  
Heeyoung Jeon ◽  
Hagyoung Choi ◽  
Giyul Ham ◽  
Seokyoon Shin ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Radio Frequency ◽  
Layer Structure ◽  
Atomic Layer ◽  
Remote Plasma ◽  
Layer Deposition

scholarly journals HfS2 thin films deposited at room temperature by an emerging technique, solution atomic layer deposition

2021 ◽  
Author(s):  
Yuanyuan Cao ◽  
Sha Zhu ◽  
Julien Bachmann
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Room Temperature ◽  
Atomic Layer ◽  
Two Dimensional ◽  
Molecular Precursors ◽  
Layer Deposition

The two-dimensional material and semiconducting dichalcogenide hafnium disulfide is deposited at room temperature by atomic layer deposition from molecular precursors dissolved in hexane.

ZnO Schottky Nanodiodes Processed From Plasma-Enhanced Atomic Layer Deposition at Near Room Temperature

2018 ◽  
Vol 65 (10) ◽  
pp. 4513-4519
Author(s):  
Mei Shen ◽  
Triratna P. Muneshwar ◽  
Kenneth C. Cadien ◽  
Ying Yin Tsui ◽  
Douglas W. Barlage
Keyword(s):  
Atomic Layer Deposition ◽  
Room Temperature ◽  
Atomic Layer ◽  
Layer Deposition
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