Apparent Long Spacings from Clay-Water Gels, Glasses, and Crystalline Materials due to Total Reflection of X-Rays: Reply to Comment

1985 ◽  
Vol 33 (5) ◽  
pp. 472-472
Author(s):  
T. C. Simonton
Keyword(s):  
Total Reflection ◽  
X Rays ◽  
Crystalline Materials

Contribution of x-ray total reflection to the background intensity in EPMA

1990 ◽  
Vol 48 (2) ◽  
pp. 202-203
Author(s):  
Werner P. Rehbach ◽  
Peter Karduck
Keyword(s):  
Atomic Number ◽  
Target Material ◽  
Total Reflection ◽  
Background Intensity ◽  
X Rays ◽  
Characteristic Radiation ◽  
X Ray

In the EPMA of soft x rays anomalies in the background are found for several elements. In the literature extremely high backgrounds in the region of the OKα line are reported for C, Al, Si, Mo, and Zr. We found the same effect also for Boron (Fig. 1). For small glancing angles θ, the background measured using a LdSte crystal is significantly higher for B compared with BN and C, although the latter are of higher atomic number. It would be expected, that , characteristic radiation missing, the background IB (bremsstrahlung) is proportional Zn by variation of the atomic number of the target material. According to Kramers n has the value of unity, whereas Rao-Sahib and Wittry proposed values between 1.12 and 1.38 , depending on Z, E and Eo. In all cases IB should increase with increasing atomic number Z. The measured values are in discrepancy with the expected ones.

How to Use the Features of Total Reflection of X-Rays for Energy Dispersive XRF

1988 ◽  
Vol 32 ◽  
pp. 105-114 ◽  
Author(s):  
H. Schwenke ◽  
W. Berneike ◽  
J. Knoth ◽  
U. Weisbrod
Keyword(s):  
Thin Films ◽  
Penetration Depth ◽  
Fluorescence Analysis ◽  
Total Reflection ◽  
X Rays ◽  
X Ray ◽  
Characteristic Features ◽  
Respective Characteristic ◽  
Nanometer Regime ◽  
Sensitive Method

AbstractThe total reflection of X-rays is mainly determined by three parameters , that is the orltical angle, the reflectivity and the penetration depth. For X-ray fluorescence analysis the respective characteristic features can be exploited in two rather different fields of application. In the analysis of trace elements in samples placed as thin films on optical flats, detection limits as low as 2 pg or 0.05 ppb, respectively, have been obtained. In addition, a penetration depth in the nanometer regime renders Total Reflection XRF an inherently sensitive method for the elemental analysis of surfaces. This paper outlines the main physical and constructional parameters for instrumental design and quantitation in both branches of TXRF.

Total Reflection of X-Rays from Nickel Films Part II

1929 ◽  
Vol 33 (4) ◽  
pp. 463-466 ◽  
Author(s):  
Hiram W. Edwards
Keyword(s):  
Total Reflection ◽  
X Rays ◽  
Nickel Films

Applications of High-Resolution Powder X-Ray Diffraction

2007 ◽  
Vol 130 ◽  
pp. 7-14 ◽  
Author(s):  
Andrew N. Fitch
Keyword(s):  
High Resolution ◽  
Synchrotron Radiation ◽  
Powder Diffraction ◽  
X Rays ◽  
X Ray Diffraction ◽  
Crystalline Materials ◽  
X Ray ◽  
Structural Characterisation ◽  
Pdf Analysis

The highly-collimated, intense X-rays produced by a synchrotron radiation source can be harnessed to build high-resolution powder diffraction instruments with a wide variety of applications. The general advantages of using synchrotron radiation for powder diffraction are discussed and illustrated with reference to the structural characterisation of crystalline materials, atomic PDF analysis, in-situ and high-throughput studies where the structure is evolving between successive scans, and the measurement of residual strain in engineering components.

X–ray absorption fine structure (XAFS) of Si wafer measured using total reflection X–rays

1999 ◽  
Vol 54 (1) ◽  
pp. 215-222 ◽  
Author(s):  
Jun Kawai ◽  
Shinjiro Hayakawa ◽  
Yoshinori Kitajima ◽  
Yohichi Gohshi
Keyword(s):  
Fine Structure ◽  
Total Reflection ◽  
X Rays ◽  
X Ray ◽  
Absorption Fine ◽  
X Ray Absorption ◽  
Si Wafer

Unusual liquid-solid transition effects in a methoxypentamethylflavan

1958 ◽  
Vol 243 (1235) ◽  
pp. 518-533 ◽  
Keyword(s):  
Solid Phase ◽  
Polarized Light ◽  
Melting Process ◽  
X Rays ◽  
Melting Range ◽  
Crystalline Materials ◽  
External Conditions ◽  
Transition Effects ◽  
Solid Liquid ◽  
Crystal Boundaries

The solid phase of the compound 2'-methoxy-2 : 4 : 4 : 7 : 4'- pentamethylflavan differs in many respects from normally crystalline materials, yet is not amorphous. It tends to form spherical masses which exhibit no regular crystal boundaries, even when seen under the microscope. The solid melts over a range of up to 3° C and the actual temperatures at which melting begins and ends vary according to the thermal treatment previously received by the specimen. The temperature at which the melt starts to solidify on cooling is always several degrees below the melting range; this is not due to normal supercooling. Solidification from the melt presents several other interesting features, including some rhythmic effects. Variations in the external conditions during solidification can give rise to three superficially different forms of the solid phase. The solid-liquid and liquid-solid transitions have been followed by measurements of density, rigidity and dielectric constant, all of which give further indications of the diffuse nature of the melting process and the existence of hysteresis between melting and solidifica­tion. These effects recall the behaviour of some crystalline high polymers and examination of solid methoxypentamethylflavan by polarized light, X-rays and electron microscopy has revealed further analogies with such materials. It is tentatively concluded that the solid is composed of submicroscopic crystalline regions which are organized into larger spherulitic aggregates, but no definite explanations of the failure of the compound to form macroscopic crystals or of the similarities between it and polymers seem possible at present.

Total reflection and surface scattering of soft X-rays on the Si-SiO2system and hexagonal BN crystal

1995 ◽  
Vol 7 (14) ◽  
pp. 2731-2744 ◽  
Author(s):  
E Filatova ◽  
A Stepanov ◽  
C Blessing ◽  
J Friedrich ◽  
R Barchewitz ◽  
...  
Keyword(s):  
Total Reflection ◽  
Surface Scattering ◽  
X Rays

scholarly journals Nanofocusing Optics for an X-Ray Free-Electron Laser Generating an Extreme Intensity of 100 EW/cm2 Using Total Reflection Mirrors

2020 ◽  
Vol 10 (7) ◽  
pp. 2611
Author(s):  
Hirokatsu Yumoto ◽  
Yuichi Inubushi ◽  
Taito Osaka ◽  
Ichiro Inoue ◽  
Takahisa Koyama ◽  
...  
Keyword(s):  
Photon Energy ◽  
Pulse Energy ◽  
Free Electron ◽  
Free Electron Laser ◽  
Total Reflection ◽  
Experimental Chamber ◽  
X Rays ◽  
X Ray ◽  
Set Up ◽  
Focused Beam

A nanofocusing optical system—referred to as 100 exa—for an X-ray free-electron laser (XFEL) was developed to generate an extremely high intensity of 100 EW/cm2 (1020 W/cm2) using total reflection mirrors. The system is based on Kirkpatrick-Baez geometry, with 250-mm-long elliptically figured mirrors optimized for the SPring-8 Angstrom Compact Free-Electron Laser (SACLA) XFEL facility. The nano-precision surface employed is coated with rhodium and offers a high reflectivity of 80%, with a photon energy of up to 12 keV, under total reflection conditions. Incident X-rays on the optics are reflected with a large spatial acceptance of over 900 μm. The focused beam is 210 nm × 120 nm (full width at half maximum) and was evaluated at a photon energy of 10 keV. The optics developed for 100 exa efficiently achieved an intensity of 1 × 1020 W/cm2 with a pulse duration of 7 fs and a pulse energy of 150 μJ (25% of the pulse energy generated at the light source). The experimental chamber, which can provide different stage arrangements and sample conditions, including vacuum environments and atmospheric-pressure helium, was set up with the focusing optics to meet the experimental requirements.

Sign in / Sign up

Export Citation Format

Share Document