scholarly journals Clusters of nickel atoms and controlling their state in silicon lattice

2018 ◽  
Vol 21 (4) ◽  
pp. 392-396
Author(s):  
M.K. Bakhadyrkhanov ◽  
Keyword(s):  
1989 ◽  
Vol 4 (2) ◽  
pp. 394-398 ◽  
Author(s):  
V. S. Kaushik ◽  
A. K. Datye ◽  
D. L. Kendall ◽  
B. Martinez-Tovar ◽  
D. S. Simons ◽  
...  

Implantation of nitrogen at 150 KeV and a dose of 1 ⊠ 1018/cm2 into (110) silicon results in the formation of an amorphized layer at the mean ion range, and a deeper tail of nitrogen ions. Annealing studies show that the amorphized layer recrystallizes into a continuous polycrystalline Si3N4 layer after annealing for 1 h at 1200 °C. In contrast, the deeper nitrogen fraction forms discrete precipitates (located 1μm below the wafer surface) in less than 1 min at this temperature. The arcal density of these precipitates is 5 ⊠ 107/cm2 compared with a nuclei density of 1.6 ⊠ 105/cm2 in the amorphized layer at comparable annealing times. These data suggest that the nucleation step limits the recrystallization rate of amorphous silicon nitride to form continuous buried nitride layers. The nitrogen located within the damaged crystalline silicon lattice precipitates very rapidly, yielding semicoherent crystallites of β–Si3N4.


Materials ◽  
2021 ◽  
Vol 14 (11) ◽  
pp. 3127
Author(s):  
Feng Dai ◽  
Dandan Zhao ◽  
Lin Zhang

The effect of vacancy defects on the structure and mechanical properties of semiconductor silicon materials is of great significance to the development of novel microelectronic materials and the processes of semiconductor sensors. In this paper, molecular dynamics is used to simulate the atomic packing structure, local stress evolution and mechanical properties of a perfect lattice and silicon crystal with a single vacancy defect on heating. In addition, their influences on the change in Young’s modulus are also analyzed. The atomic simulations show that in the lower temperature range, the existence of vacancy defects reduces the Young’s modulus of the silicon lattice. With the increase in temperature, the local stress distribution of the atoms in the lattice changes due to the migration of the vacancy. At high temperatures, the Young’s modulus of the silicon lattice changes in anisotropic patterns. For the lattice with the vacancy, when the temperature is higher than 1500 K, the number and degree of distortion in the lattice increase significantly, the obvious single vacancy and its adjacent atoms contracting inward structure disappears and the defects in the lattice present complex patterns. By applying uniaxial tensile force, it can be found that the temperature has a significant effect on the elasticity–plasticity behaviors of the Si lattice with the vacancy.


1981 ◽  
Vol 7 ◽  
Author(s):  
J. S. Williams ◽  
K. T. Short

ABSTRACTHigh resolution Rutherford backscattering and channeling techniques have been used to investigate the formation and stability of supersaturated solid solutions of As, Sb, In, Pb, Tℓ and Bi implants in (100) silicon. In all cases nearsubstitutional solid solubilities far exceeding maximum equilibrium solubility limits can be achieved by furnace annealing at temperatures ≤ 600°C. Details of the recrystallisation process indicate that the maximum impurity concentration which can be incorporated onto silicon lattice sites may be controlled by impurity size and associated strain effects at the amorphous-crystal boundary during epitaxial regrowth.


Author(s):  
Ulrich Kuetgens ◽  
Birk Andreas ◽  
Kathrin Friedrich ◽  
Christoph Weichert ◽  
Paul Kochert ◽  
...  

1997 ◽  
Vol 144 (5) ◽  
pp. 1890-1890 ◽  
Author(s):  
Aleksei R. Chelyadinsky ◽  
Alexander M. Dorofeev ◽  
Nikolai M. Kazuchits ◽  
Sandro La Monica ◽  
Serguei K. Lazarouk ◽  
...  

MAPAN ◽  
2020 ◽  
Author(s):  
Enrico Massa ◽  
Carlo Paolo Sasso ◽  
Giovanni Mana

AbstractX-ray interferometry established a link between atomic and macroscopic realisations of the metre. The possibility of measuring the silicon lattice parameter in terms of optical wavelengths opened the way to count atoms, to determine the Avogadro constant with unprecedented accuracy, and, nowadays, to realise the kilogram from the Planck constant. Also, it is a powerful tool in phase-contrast imaging by X-rays and, combined with optical interferometry, in linear and angular metrology with capabilities at the atomic scale. This review tells the history of the development of this fascinating technology at the Istituto Nazionale di Ricerca Metrologica in the last forty years. Eventually, it highlights its contribution to the redefinition of the International System of Units (SI).


1998 ◽  
Vol 527 ◽  
Author(s):  
A.Yu. Kuznetsov ◽  
J. Cardenas ◽  
B.G. Svensson ◽  
A. Nylandsted Larsen ◽  
J. Lundsgaard Hansen

ABSTRACTEnhanced Sb diffusion in biaxially compressed Si1-xGex layers is observed. Assuming the prefactors to be stress independent the Sb diffusion coefficients in biaxially compressed Si0.9Ge0.1 and Si0.8Ge0.2 were extracted as 0.4 × 102 exp[−(3.98(eV)±0.12)/kT] and 1.3 × 102 exp[−(3.85(eV)±0.12)/kT] cm2/s, respectively. The activation volume of Sb diffusion in Si1-xGex (× ≤ 0.2) is estimated to be close to Ω, where Ω is the volume corresponding to a silicon lattice site.


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