Crystallization kinetics of sputter-deposited LaNiO3 thin films on Si substrate

1998 ◽  
Vol 13 (8) ◽  
pp. 2291-2296 ◽  
Author(s):  
Hsin-Yi Lee ◽  
Tai-Bor Wu
Keyword(s):  
Thin Films ◽  
High Temperature ◽  
Crystallization Kinetics ◽  
Crystallization Rate ◽  
Diffraction Method ◽  
Sputtering Deposition ◽  
Diffusion Controlled ◽  
Activation Energy Of Crystallization ◽  
Sputter Deposited ◽  
Kinetics Of

The kinetics of in situ crystallization of LaNiO3 thin films in sputtering deposition at temperatures ranging from 250 to 450 °C and isothermal crystallization of room-temperature (RT) sputtered LaNiO3 thin films in annealing at 350–500 °C were investigated by the x-ray diffraction method. The crystallization in both cases basically followed the Johnson–Mehl–Avrami (JMA) relation. However, different crystallization kinetics were observed. The transformation index and activation energy of crystallization in high temperature sputtering were about 1.5 and 33 kJ/mole, respectively, while in the annealing of RT-sputtered films, 1.0 and 63 kJ/mole were found. From the determined transformation index, it is suggested that the crystallization rate in high temperature sputtering was determined by a diffusion-controlled process of lateral growth with a decreasing nucleation rate of crystallites in the adsorption layer. However, the annealed films crystallized by an interface-controlled and one-dimensional growth of existing nuclei.

Thickness Effect On The Crystallization Kinetics Of Electrolessly-Deposited Ni(P) Thin Films

1993 ◽  
Vol 321 ◽  
Author(s):  
L. T. Shi ◽  
E. J. M. O'Sullivan
Keyword(s):  
Thin Films ◽  
Crystallization Kinetics ◽  
Annealing Temperature ◽  
Sample Thickness ◽  
Thickness Effect ◽  
Heating Rates ◽  
Activation Energy Of Crystallization ◽  
Constant Heating ◽  
Kinetics Of ◽  
Seed Layers

ABSTRACTIn order to understand thickness and interfacial effects on the crystallization kinetics of amorphous solids, Ni(P) thin films electrolessly deposited on Cu seed layers were annealed at constant heating rates or at constant temperatures in a DSC to obtain activation energies andAvrami exponents. It was found that the activation energy of crystallization in Ni(P) changes asa function of sample thickness when the sample thickness is less than 1.0 μm. Furthermore, the Avrami exponent was found to change not only as a function of thickness but also as a function of annealing temperature.

scholarly journals Isothermal Crystallization Kinetics of Poly(ethylene oxide)/Poly(ethylene glycol)-g-silica Nanocomposites

Polymers ◽  
2021 ◽  
Vol 13 (4) ◽  
pp. 648
Author(s):  
Xiangning Wen ◽  
Yunlan Su ◽  
Shaofan Li ◽  
Weilong Ju ◽  
Dujin Wang
Keyword(s):  
Molecular Weight ◽  
Ethylene Oxide ◽  
Crystallization Kinetics ◽  
Isothermal Crystallization ◽  
Crystallization Rate ◽  
Poly Ethylene Glycol ◽  
Isothermal Crystallization Kinetics ◽  
Poly Ethylene Oxide ◽  
Poly Ethylene ◽  
Kinetics Of

In this work, the crystallization kinetics of poly(ethylene oxide) (PEO) matrix included with poly(ethylene glycol) (PEG) grafted silica (PEG-g-SiO2) nanoparticles and bare SiO2 were systematically investigated by differential scanning calorimetry (DSC) and polarized light optical microscopy (PLOM) method. PEG-g-SiO2 can significantly increase the crystallinity and crystallization temperature of PEO matrix under the non-isothermal crystallization process. Pronounced effects of PEG-g-SiO2 on the crystalline morphology and crystallization rate of PEO were further characterized by employing spherulitic morphological observation and isothermal crystallization kinetics analysis. In contrast to the bare SiO2, PEG-g-SiO2 can be well dispersed in PEO matrix at low P/N (P: Molecular weight of matrix chains, N: Molecular weight of grafted chains), which is a key factor to enhance the primary nucleation rate. In particular, we found that the addition of PEG-g-SiO2 slows the spherulitic growth fronts compared to the neat PEO. It is speculated that the interfacial structure of the grafted PEG plays a key role in the formation of nuclei sites, thus ultimately determines the crystallization behavior of PEO PNCs and enhances the overall crystallization rate of the PEO nanocomposites.

Non-Isothermal Crystallization Kinetics of Graphene Oxide-Carbon Nanotubes Hybrids / Polyamide 6 Composites

2019 ◽  
Vol 41 (3) ◽  
pp. 394-394
Author(s):  
Zhi Qiang Wang Zhi Qiang Wang ◽  
Yong Ke Zhao and Xiang Feng Wu Yong Ke Zhao and Xiang Feng Wu
Keyword(s):  
Carbon Nanotubes ◽  
Graphene Oxide ◽  
Cooling Rate ◽  
Crystallization Kinetics ◽  
Isothermal Crystallization ◽  
Crystallization Rate ◽  
Polyamide 6 ◽  
Degree Of Crystallinity ◽  
Isothermal Crystallization Kinetics ◽  
Kinetics Of

The hybrids combined by nano-materials with different dimensions usually possess much better enhancement effects than single one. Graphene oxide-carbon nanotubes hybrids / polyamide 6 composites has been fabricated. The non-isothermal crystallization kinetics of the as-prepared samples was discussed. Research results showed that increasing the cooling rate was in favor of increasing the crystallization rate and the degree of crystallinity for the as-prepared samples. Moreover, the crystallization rate was first decreased and then increased with increasing the hybrids loading. Furthermore, the crystallization mechanism was changed with increasing the crystallization temperature and the cooling rate. The nucleation and growth modes of the non-isothermal crystallization could be classified into three different types, according to the Ozawa’s theory. These complicated results could be attributed to the important role of crystallization rate as well as the simultaneous hindering and promoting effects of the as-prepared hybrids. This work has reference values for understanding the crystallization kinetics of the polyamide 6-based composites.

Crystallization kinetics of polyetheretherketone during high temperature-selective laser sintering

2020 ◽  
Vol 36 ◽  
pp. 101615 ◽  
Author(s):  
Peng Chen ◽  
Haosong Cai ◽  
Zhaoqing Li ◽  
Maoyuan Li ◽  
Hongzhi Wu ◽  
...  
Keyword(s):  
High Temperature ◽  
Crystallization Kinetics ◽  
Selective Laser Sintering ◽  
Laser Sintering ◽  
Kinetics Of

Investigation on the Thermal and Electrical Properties of Ti-Si-O Film Formed by the Composite Sputtering Deposition

2001 ◽  
Vol 670 ◽  
Author(s):  
Akira Nishiyama ◽  
Akio Kaneko ◽  
Masato Koyama ◽  
Yoshiki Kamata ◽  
Ikuo Fujiwara ◽  
...  
Keyword(s):  
Thin Films ◽  
Dielectric Constant ◽  
Phase Separation ◽  
Nanocrystalline Film ◽  
Post Deposition Annealing ◽  
Current Increase ◽  
Sputtering Deposition ◽  
Thermal And Electrical Properties ◽  
Sputter Deposited ◽  
Post Deposition

ABSTRACTTi-Si-O films were sputter deposited from TiO2+SiO2 composite targets with various SiO2 content. The phase separation occurred for every SiO2 content used in this experiment (from 14% to 75%) and it has been revealed that nanocrystalline (TiO2)1-x(SiO2)x films in which anatase TiO2 forms tiny grains were obtained when x in the film is larger than 0.26. The tiny grain was effective for suppressing the thermal grooving phenomenon of the thin films by the post deposition annealing which leads to the leakage current increase. The dielectric constant of the nanocrystalline film was varied with the SiO2 content from the value of the bulk anatase to SiO2.

The effect of Fe doping on the crystallization kinetics of Ni-Mn-Sn free-standing alloy thin films

2018 ◽  
Vol 495 ◽  
pp. 19-26 ◽  
Author(s):  
Xiaohua Tian ◽  
Zhenhua Wang ◽  
Jiachen Zhu ◽  
Changlong Tan ◽  
Kun Zhang ◽  
...  
Keyword(s):  
Thin Films ◽  
Crystallization Kinetics ◽  
Fe Doping ◽  
Free Standing ◽  
Kinetics Of

The Crystallization Kinetics of Ni-Mn-Ga Magnetic Shape Memory Alloy Thin Films

2019 ◽  
Vol 48 (4) ◽  
pp. 2137-2143
Author(s):  
Jiachen Zhu ◽  
Changlong Tan ◽  
WenBin Zhao ◽  
ZhaiPing Yang ◽  
Kun Zhang ◽  
...  
Keyword(s):  
Thin Films ◽  
Shape Memory Alloy ◽  
Shape Memory ◽  
Crystallization Kinetics ◽  
Magnetic Shape Memory ◽  
Magnetic Shape Memory Alloy ◽  
Kinetics Of

Non-Isothermal Crystallization Kinetics of Mg61Zn35Ca4 Glassy Alloy

2017 ◽  
Vol 898 ◽  
pp. 657-665
Author(s):  
Dao Zhang ◽  
Wang Shu Lu ◽  
Xiao Yan Wang ◽  
Sen Yang
Keyword(s):  
Activation Energy ◽  
Crystallization Kinetics ◽  
Isothermal Crystallization ◽  
Melt Spinning ◽  
Glassy Alloy ◽  
Heating Rates ◽  
Isothermal Crystallization Kinetics ◽  
Complex Process ◽  
Activation Energy Of Crystallization ◽  
Kinetics Of

The non-isothermal crystallization kinetics of Mg61Zn35Ca4 glassy alloy prepared via melt-spinning were studied by using isoconversion method. The crystalline characterization of Mg61Zn35Ca4 was examined by X-ray diffraction. Different scanning calorimeter was used to investigate the non-isothermal crystallization kinetics at different heating rates (3-60 K/min). The calculated value of Avrami exponent obtained by Matusita method indicated that the crystalline transformation for Mg61Zn35Ca4 is a complex process of nucleation and growth. The Kissinger-Akahira-Sunose method was used to investigate the activation energy. The activation energy of crystallization varies with the extent of crystallization and hence with temperature. The Sestak-Berggren model was used to describe the non-isothermal crystallization kinetics.

Crystallization kinetics of NixTi1−x alloy thin films

2010 ◽  
Vol 405 (3) ◽  
pp. 947-950 ◽  
Author(s):  
Yongchao Lei ◽  
HuiJie Zhao ◽  
Wei Cai ◽  
Xu An ◽  
Laixu Gao
Keyword(s):  
Thin Films ◽  
Crystallization Kinetics ◽  
Kinetics Of
Sign in / Sign up

Export Citation Format

Share Document