Defect clustering in GaN irradiated with O+ ions

2002 ◽  
Vol 17 (11) ◽  
pp. 2945-2952 ◽  
Author(s):  
C. M. Wang ◽  
W. Jiang ◽  
W. J. Weber ◽  
L. E. Thomas
Keyword(s):  
Point Defects ◽  
Basal Plane ◽  
Room Temperature ◽  
Dynamic Recovery ◽  
Stacking Faults ◽  
Extended Defects ◽  
Dislocation Loops ◽  
Defect Clusters ◽  
Transmission Electron ◽  
High Resolution Tem

Transmission electron microscopy (TEM) was used to study microstructures formed in GaN irradiated with 600-keV O+ ions at room temperature. Three types of defect clusters were identified in the irradiated GaN: (i) basal-plane stacking faults with dimensions ranging from 5 to 30 nm, (ii) pyramidal dislocation loops, and (iii) local regions of highly disordered material. High-resolution TEM imaging clearly revealed that one type of the basal-plane stacking faults corresponded to insertion of one extra Ga–N basal plane in the otherwise perfect GaN lattice. The interpretation of these results indicated that interstitials of both Ga and N preferentially condensed on the basal plane to form a new layer of Ga–N under these irradiation conditions. The formation of these extended defects and their interactions with the point defects produced during irradiation contributed to a dramatic increase in the dynamic recovery of point defects in GaN at room temperature.

Expansion of Stacking Faults in 4H-SiC Epitaxial Layer under Laser Light Excitation during Room Temperature Photoluminescence Mapping

2008 ◽  
Vol 600-603 ◽  
pp. 349-352 ◽  
Author(s):  
Norihiro Hoshino ◽  
Michio Tajima ◽  
M. Naitoh ◽  
Eiichi Okuno ◽  
Shoichi Onda
Keyword(s):  
Laser Beam ◽  
Epitaxial Layer ◽  
Basal Plane ◽  
High Intensity ◽  
Room Temperature ◽  
Stacking Faults ◽  
Scanning Laser ◽  
Epitaxial Layers ◽  
Dislocation Loops ◽  
Room Temperature Photoluminescence

We investigated the expansion of single Shockley stacking faults (SSFs) in a 4H-SiC epitaxial layer under high-intensity scanning laser beam during room temperature photoluminescence mapping, which is similar to the degradation of bipolar pin diodes during forward current injection. In an epitaxial layer on an 8 off-axis (0001) substrate, the SSF-related intensity patterns induced by scanning high-intensity laser beam were classified into two types. The first one was a triangular pattern and the second a pattern which expanded in accordance with the motion of the scanning laser beam. The origins of the SSFs responsible for both patterns are presumably due to the preexisting basal plane dislocations and the dislocation-loops on the basal plane in the epitaxial layer, respectively. On the other hand, most of the SSF-expansion in on-axis (11 2 0) epitaxial layers were similar to the second type in the (0001) epitaxial layer. We, therefore, suggest that the dislocation-loops, which were located close to the surface, were dominant nucleation-sites of the SSFs in the (11 2 0) epitaxial layers.

High Resolution Transmission Electron Microscopy of Defect Clusters in Aluminum During Electron and Ion Irradiation at Room Temperature

1996 ◽  
Vol 439 ◽  
Author(s):  
Kazuo Furuya ◽  
Min Piao ◽  
Nobuhiro Ishikawa ◽  
Tetsuya Saito
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Room Temperature ◽  
Ion Irradiation ◽  
In Situ Observation ◽  
Dislocation Loops ◽  
Frank Loop ◽  
Planar Defects ◽  
Defect Clusters ◽  
Transmission Electron

AbstractDefect clusters in Al during electron and ion irradiation have been investigated using highresolution transmission electron microscopy (HRTEM). An ION/HVEM system which consists of a high-voltage TEM and ion implanters was used for in-situ observation of damage evolution under 1000 keV electrons and 15 keV He+ irradiation at room temperature. HRTEM of Al in [110] orientation showed many planar defects along { 111 } planes during electron irradiation, while a high density of small polyhedron-shaped cavities (He-bubbles) was observed in addition to the planar defects after He+ irradiation. Multi-slice image simulation of various models of dislocation loops indicated the planar defect as an interstitial-type Frank loop.

Silicon Light Emissions from Boron Implant-Induced Extended Defects

2005 ◽  
Vol 864 ◽  
Author(s):  
G. Z. Pan ◽  
R. P. Ostroumov ◽  
L. P. Ren ◽  
Y. G. Lian ◽  
K. L. Wang
Keyword(s):  
Room Temperature ◽  
Light Emission ◽  
Extended Defects ◽  
Dislocation Loops ◽  
Plan View ◽  
Annealing Conditions ◽  
Peak Intensity ◽  
Transmission Electron ◽  
Different Types ◽  
Dislocation Defect

AbstractWe studied the electroluminescence (EL) of boron-implanted p-n junction Si LEDs in correlation with the implant-induced extended defects of different types. By varying the post implant annealing conditions to tune the extended defects and by using plan-view transmission electron microscopy to identify them, we found that {113} defects along Si<110> are the ones that result in strong silicon light emission of the p-n junction Si LEDs other than {111} perfect prismatic and {111} faulted Frank dislocation loops. The EL peak intensity at about 1.1 eV of {113} defect-engineered Si LEDs is about twenty-five times higher than that of dislocation defect-engineered Si LEDs. The EL measured at temperatures from room temperature to 4 K indicated that the emissions related to the extended defects are from silicon band edge radiative recombination.

Annealing Of Radiation Damage in Tungsten

1970 ◽  
Vol 28 ◽  
pp. 412-413
Author(s):  
Robert C. Rau ◽  
John Moteff
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Radiation Damage ◽  
Thermal Annealing ◽  
Neutron Fluence ◽  
Dislocation Loops ◽  
Defect Clusters ◽  
Polycrystalline Tungsten ◽  
Transmission Electron ◽  
Radiation Induced

Transmission electron microscopy has been used to study the thermal annealing of radiation induced defect clusters in polycrystalline tungsten. Specimens were taken from cylindrical tensile bars which had been irradiated to a fast (E > 1 MeV) neutron fluence of 4.2 × 1019 n/cm2 at 70°C, annealed for one hour at various temperatures in argon, and tensile tested at 240°C in helium. Foils from both the unstressed button heads and the reduced areas near the fracture were examined.Figure 1 shows typical microstructures in button head foils. In the unannealed condition, Fig. 1(a), a dispersion of fine dot clusters was present. Annealing at 435°C, Fig. 1(b), produced an apparent slight decrease in cluster concentration, but annealing at 740°C, Fig. 1(C), resulted in a noticeable densification of the clusters. Finally, annealing at 900°C and 1040°C, Figs. 1(d) and (e), caused a definite decrease in cluster concentration and led to the formation of resolvable dislocation loops.

Study of dislocation loops in Arsenic-Rich as-grown GaAs

1987 ◽  
Vol 45 ◽  
pp. 350-351
Author(s):  
Byung-Teak Lee
Keyword(s):  
Point Defects ◽  
Electronic Devices ◽  
Arsenic Concentration ◽  
Stoichiometric Compound ◽  
Dislocation Loops ◽  
Gaas Crystal ◽  
Ion Milling ◽  
Transmission Electron ◽  
Arsenic Source ◽  
High Arsenic

Grown-in dislocations in GaAs have been a major obstacle in utilizing this material for the potential electronic devices. Although it has been proposed in many reports that supersaturation of point defects can generate dislocation loops in growing crystals and can be a main formation mechanism of grown-in dislocations, there are very few reports on either the observation or the structural analysis of the stoichiometry-generated loops. In this work, dislocation loops in an arsenic-rich GaAs crystal have been studied by transmission electron microscopy.The single crystal with high arsenic concentration was grown using the Horizontal Bridgman method. The arsenic source temperature during the crystal growth was about 630°C whereas 617±1°C is normally believed to be optimum one to grow a stoichiometric compound. Samples with various orientations were prepared either by chemical thinning or ion milling and examined in both a JEOL JEM 200CX and a Siemens Elmiskop 102.

ION CHANNELING AND PIXE STUDIES OF S IMPLANTATION IN GaAs

1992 ◽  
Vol 02 (02) ◽  
pp. 151-159
Author(s):  
LIU SHIJIE ◽  
WANG JIANG ◽  
HU ZAOHUEI ◽  
XIA ZHONGHUONG ◽  
GAO ZHIGIANG ◽  
...  
Keyword(s):  
Room Temperature ◽  
Dislocation Loops ◽  
Good Recovery ◽  
Electrical Measurements ◽  
X Ray ◽  
Defect Complexes ◽  
Ion Channeling ◽  
Transmission Electron ◽  
Activation Efficiency ◽  
Very High

GaAs (100) crystals were implanted with 100 keV S+ to a dose of 3×1015 cm−2 in a nonchanneling direction at room temperature, and treated with rapid thermal annealing (RTA). He+ Rutherford backscattering and particle-induced X-ray emission in channeling mode in combination with transmission electron microscopy (TEM) were used to study the damage and the lattice location of S atoms. It is revealed that the RTA at 950 °C for 10 sec has resulted in a very good recovery of crystallinity with a few residual defects in the form of dislocation loops, and a very high substitutionality (~90%). The activation efficiency and the Hall mobility of the implanted samples are found to be low after the electrical measurements. Based on these results an extended dopant diffusion effect for the residual defects and a correlation between the electrical properties and defect complexes are suggested.

Defects and Polytype Instabilities

2018 ◽  
Vol 924 ◽  
pp. 147-150
Author(s):  
Jörg Pezoldt ◽  
Andrei Alexandrovich Kalnin
Keyword(s):  
Long Range ◽  
Basal Plane ◽  
Partial Dislocation ◽  
Stacking Faults ◽  
Dislocation Loops ◽  
Elastic Fields ◽  
Basal Plane Dislocation ◽  
The Stability ◽  
Shockley Dislocation ◽  
Polytype Structure

A model based on the generation and recombination of defect was developed to describe the stability of stacking faults and basal plane dislocation loops in crystals with layered polytype structures. The stability of the defects configuration was analysed for stacking faults surrounded by Shockley and Frank partial dislocation as well as Shockley dislocation dipoles with long range elastic fields. This approach allows the qualitative prediction of defect subsystems in polytype structure in external fields.

Effect of Self-Interstitial Diffusion Anisotropy in Electron-Irradiated Zirconium. A Cluster Dynamics Modeling

2005 ◽  
Vol 237-240 ◽  
pp. 659-664
Author(s):  
Frédéric Christien ◽  
Alain Barbu
Keyword(s):  
Point Defects ◽  
Thin Foil ◽  
Elastic Interaction ◽  
Dislocation Loops ◽  
Considerable Influence ◽  
Dynamics Modeling ◽  
Dynamics Model ◽  
Diffusion Anisotropy ◽  
Vacancy Loops ◽  
Transmission Electron

Irradiation of metals leads to the formation of point-defects (vacancies and selfinterstitials) that usually agglomerate in the form of dislocation loops. Due to the elastic interaction between SIA (self-interstitial atoms) and dislocations, the loops absorb in most cases more SIA than vacancies. That is why the loops observed by transmission electron microscopy are almost always interstitial in nature. Nevertheless, vacancy loops have been observed in zirconium following electron or neutron irradiation (see for example [1]). Some authors proposed that this unexpected behavior could be accounted for by SIA diffusion anisotropy [2]. Following the approach proposed by Woo [2], the cluster dynamics model presented in [3] that describes point defect agglomeration was extended to the case where SIA diffusion is anisotropic. The model was then applied to the loop microstructure evolution of a zirconium thin foil irradiated with electrons in a high-voltage microscope. The main result is that, due to anisotropic SIA diffusion, the crystallographic orientation of the foil has considerable influence on the nature (vacancy or interstitial) of the loops that form during irradiation.

The mechanisms of plastic deformation of rapidly solidified Al3Ti and Al67Ni8Ti25 intermetallic compounds.

1988 ◽  
Vol 133 ◽  
Author(s):  
Vijay K. Vasudevan ◽  
Robert Wheeler ◽  
Hamish L. Fraser
Keyword(s):  
Room Temperature ◽  
Considerable Increase ◽  
Stacking Faults ◽  
Temperature Deformation ◽  
Deformation Microstructure ◽  
Partial Dislocations ◽  
Transmission Electron ◽  
The Mean ◽  
Rapidly Solidified ◽  
Mechanisms Of Plastic Deformation

ABSTRACTThe dislocation structures in rapidly solidified Al3Ti with the DO22 structure and the ternary Al-25Ti-8Ni (at.%) alloy with the L12 structure deformed in compression in the temperature range of 25 to 800°C have been studied by transmission electron microscopy. The room temperature deformation microstructure of the Al3Ti compound is characterized by the presence of stacking faults/order twins on {111} planes bounded by partial dislocations with Burgers vector b=1/6<112], as reported by others. At intermediate temperatures, besides the stacking faults, slip is also observed as bands on the {001] plane delineated by dislocations with b=1/2<110] which bound APB's. At 600°C, the reported increase in ductility is associated here with additional slip on the {001)<110], {001)[100] and {001)[010] systems. Dislocations with b=<110] exist as pairs of partial dislocations with b=1/2<110] connected by APB's. The mean separation between the partials was measured to be 30 nm, corresponding to an APB energy of ≍32 mJ.m-2 on the (001) plane. Observations also indicate that the APB energy is anisotropic, i.e., is considerably higher on the {111} planes compared to the {001) plane. The deformation microstructure of the Al-25Ti-8Ni L12 alloy is characterized by slip of dislocations with b=<110> gliding on {111} planes, a major fraction of which exist as dipoles. Following deformation at 300°C, there is essentially no evidence of dissociation of these dislocations, although some dissociated dislocations on (001) having b=l/2<110> are also observed. With an increase in temperature, there is a considerable increase in dislocation activity and strong evidence for 1/2<110> dissociated dislocations is present.

The Effect of Cryorolling on the Microstructure of Al-Cu-Mg Alloy

2016 ◽  
Vol 877 ◽  
pp. 188-193 ◽  
Author(s):  
Li Wei Quan ◽  
Wen Ning Mu ◽  
Lei Kang ◽  
Xiao Ma ◽  
Peng Han ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Tensile Strength ◽  
Yield Strength ◽  
Optical Microscopy ◽  
Room Temperature ◽  
Solution Treatment ◽  
Mg Alloy ◽  
Dislocation Loops ◽  
Transmission Electron

A precipitation hardenable Al-Cu-Mg alloy was cryorolled with liquid nitrogen followed solution treatment and then aged at 170 ̊C for different time. The microstructure was characterized by optical microscopy (OM) and transmission electron microscopy (TEM). Hardness and tensile strength were also tested. The dislocation loops in the cryorolled alloy are more than the room temperature rolled alloy. Meanwhile the hardness, yield strength and tensile strength are larger than the room temperature rolled alloy.

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