Processing and microstructural characterization of sputter-deposited Ni/Ni3Al multilayered thin films

2003 ◽  
Vol 18 (4) ◽  
pp. 979-987 ◽  
Author(s):  
Evan A. Sperling ◽  
Rajarshi Banerjee ◽  
Gregory B. Thompson ◽  
Jason P. Fain ◽  
Peter M. Anderson ◽  
...  
Keyword(s):  
Thin Films ◽  
Crystallographic Texture ◽  
Volume Fraction ◽  
Microstructural Characterization ◽  
Processing Parameters ◽  
Face Centered Cubic ◽  
Orientation Relationships ◽  
Bilayer Period ◽  
Sputter Deposited ◽  
Multilayered Thin Films

The crystallographic texture, orientation relationships, coherency stress, and thermal stability of sputter-deposited Ni/Ni3Al multilayered thin films were studied as a function of bilayer period (Λ) as well as processing parameters such as substrate type, deposition temperature, and prebake conditions. Deposition onto oxidized Si or single-crystal Cu(001), NaCl(001), or KBr(001) substrates near room temperature produces multilayers with a [111] crystallographic texture along the Ni/Ni3Al interface normal and a disordered face-centered cubic structure for the Ni3Al phase. In contrast, deposition at 673 K onto NaCl(001) or KBr(001) substrates that are prebaked in vacuum at 693 K produces a chemically ordered L12 structure for the Ni3Al phase and (001) epitaxial growth. X-ray diffraction measurements of (001) multilayers with equal volume fraction of Ni and Ni3Al reveals a transition from a nearly incoherent state at Λ=40 nm to a semicoherent one at Λ 40 nm. Remarkably, (001) multilayers were observed to solutionize at 1373 K, which is approximately 100 K below that predicted by the Ni–Al phase diagram.

Formation and Phase Transformation of R. F. Sputter Deposited NON-BCC 6-A15 Chromium Thin Films

1996 ◽  
Vol 441 ◽  
Author(s):  
J. P. Chu ◽  
J. W. Chang ◽  
P. Y. Lee ◽  
J. K. Wu
Keyword(s):  
Thin Films ◽  
Phase Transformation ◽  
Processing Parameters ◽  
X Ray Diffraction ◽  
Scanning Calorimetry ◽  
Working Pressure ◽  
Annealing Study ◽  
First Order Transition ◽  
Sputter Deposited ◽  
First Time

AbstractFormation and phase transformation of non-BCC δ-A15 Cr thin films prepared by R. F. magnetron sputtering have been characterized. Processing parameters such as working pressure, deposition time and temperature were found to affect the formation of δ-A15 Cr films. Using differential scanning calorimetry, we have demonstrated for the first time that the phase transformation of the δ-A15 Cr phase to the equilibrium c-BCC Cr phase is an irreversible, exothermic, first-order transition. At a heating rate of 10°C/min, the onset and peak temperatures of transformation were determined to be 428°C and 437°C, respectively. Our post-deposition annealing study by X-ray diffraction further verified the occurrence of transformation.

Electron Diffraction Investigation of Crystallographic Texture of Thin Films

1999 ◽  
Vol 562 ◽  
Author(s):  
Li Tang ◽  
Shanlin Duan ◽  
David E. Laughlin
Keyword(s):  
Thin Films ◽  
Electron Diffraction ◽  
Crystallographic Texture ◽  
Film Plane ◽  
Electron Diffraction Investigation ◽  
Texture Axis ◽  
Circular Arcs ◽  
Ewald Sphere ◽  
Diffraction Patterns ◽  
Multilayered Thin Films

ABSTRACTA method of investigating thin film crystallographic texture by electron diffraction is reviewed. The reciprocal lattices of fibrous and lamellar textured thin films are spherical belts around the texture axis. Equations describing the projection of the spherical belts onto the Ewald sphere along the texture axis direction are presented. Based on these equations the geometric and intensity evolution of the electron diffraction patterns with the tilt angle about an arbitrary axis in the film plane can be analyzed in a systematic way. The geometric characteristics of the electron diffraction patterns are then used to derive the texture axis directional index and its angular distribution. The way to determine the equal-intensity circular arcs on the diffraction pattern is also discussed. This method can be applied to both single layered and multilayered thin films of various applications.

Critical factors that determine face-centered cubic to body-centered cubic phase transformation in sputter-deposited austenitic stainless steel films

2004 ◽  
Vol 19 (6) ◽  
pp. 1696-1702 ◽  
Author(s):  
X. Zhang ◽  
A. Misra ◽  
R.K. Schulze ◽  
C.J. Wetteland ◽  
H. Wang ◽  
...  
Keyword(s):  
Thin Films ◽  
Stainless Steel ◽  
Austenitic Stainless Steel ◽  
Phase Stability ◽  
Cubic Phase ◽  
Face Centered Cubic ◽  
Body Centered Cubic ◽  
Bcc Structure ◽  
Face Centered ◽  
Sputter Deposited

Bulk austenitic stainless steels (SS) have a face-centered cubic (fcc) structure. However, sputter deposited films synthesized using austenitic stainless steel targets usually exhibit body-centered cubic (bcc) structure or a mixture of fcc and bcc phases. This paper presents studies on the effect of processing parameters on the phase stability of 304 and 330 SS thin films. The 304 SS thin films with in-plane, biaxial residual stresses in the range of approximately 1 GPa (tensile) to approximately 300 MPa (compressive) exhibited only bcc structure. The retention of bcc 304 SS after high-temperature annealing followed by slow furnace cooling indicates depletion of Ni in as-sputtered 304 SS films. The 330 SS films sputtered at room temperature possess pure fcc phase. The Ni content and the substrate temperature during deposition are crucial factors in determining the phase stability in sputter deposited austenitic SS films.

Effects of annealing on phase structure and magnetic characteristics of sputter deposited Ni2FeGa/Si (100) thin films

2020 ◽  
Vol 13 (08) ◽  
pp. 2051048
Author(s):  
S. Vinodh Kumar ◽  
Zhigang Wu ◽  
Zuoyu Sun ◽  
M. Manivel Raja ◽  
M. Mahendran
Keyword(s):  
Thin Films ◽  
Phase Structure ◽  
Volume Fraction ◽  
High Hardness ◽  
Amorphous Structure ◽  
Magnetic Characteristics ◽  
Austenitic Phase ◽  
Fe Content ◽  
Nanoindentation Measurement ◽  
Sputter Deposited

This paper investigates the effects of post-deposition annealing on the evolution of phase structure and magnetic properties of magnetron sputtered Ni2FeGa/Si (001) thin films. The results revealed that the as-deposited film was partially crystallized in an fcc structure, i.e. [Formula: see text] phase. Crystallization of the amorphous structure into the [Formula: see text] phase was greatly encouraged following annealing at 723 K for 1 h. Annealing at higher temperatures for the same period triggered the formation of the bcc austenitic phase, which competed with the [Formula: see text] phase simultaneously for crystallization and grain growth. The evolution of phase structure and grain size also influenced the nanomechanical properties of the films according to the nanoindentation measurement. The film annealed at 873 K for 1 h showed high hardness and elastic modulus values of 11.1 GPa and 156 GPa. The [Formula: see text] phase showed stronger ferromagnetic characteristics relative to the bcc austenite due to the richer Fe content. This leads to the saturation magnetization to be maximized at 80 emu/g when annealed at 773 K for 1 h attributed to the enhanced film crystallinity and dominant volume fraction of [Formula: see text] phase in the thin film.

The elastic biaxial modulus of Ag–Pd multilayered thin films measured using the bulge test

1994 ◽  
Vol 9 (1) ◽  
pp. 25-30 ◽  
Author(s):  
Martha K. Small ◽  
Brian J. Daniels ◽  
Bruce M. Clemens ◽  
William D. Nix
Keyword(s):  
Thin Films ◽  
Elastic Behavior ◽  
Bulge Test ◽  
Critical Composition ◽  
Transmission Electron ◽  
Bilayer Period ◽  
Nonlinear Elastic ◽  
Multilayered Thin Films ◽  
Ray Methods ◽  
Preparation Techniques

Analysis and sample preparation techniques for the bulge test have been improved to the point where the test can provide reliable and accurate measurements of the mechanical properties of thin films. Ag-Pd multilayer films of variable bilayer period were prepared for this study and characterized by cross-section transmission electron microscopy and by x-ray methods. The films were tested in the bulge test to determine their biaxial moduli. The data show no peak in biaxial modulus at a critical composition wavelength and no nonlinear elastic behavior. They do show a slight trend toward increasing elastic modulus with increasing strength of (111) crystallographic texture. These findings refute a previous report of the “supermodulus” effect in this system and add to the evidence that the effect is caused by artifacts of the mechanical testing technique. Methods for eliminating such artifacts are discussed.

scholarly journals Nanoindentation Study of Amorphous Metal Multilayered Thin Films

1999 ◽  
Vol 594 ◽  
Author(s):  
J. B. Vella ◽  
R. C. Cammarata ◽  
T. P. Weihs ◽  
C. L. Chien ◽  
A. B. Mann ◽  
...  
Keyword(s):  
Thin Films ◽  
Plastic Deformation ◽  
Amorphous Metal ◽  
Repeat Length ◽  
Total Thickness ◽  
Sapphire Substrates ◽  
Multilayered Systems ◽  
Magnetron Sputter ◽  
Sputter Deposited ◽  
Multilayered Thin Films

AbstractNanoindentation studies were preformed on amorphous metal, multilayered thin films containing alternating layers of Fe50Ti50 and Cu35Nb65 in order to investigate the mechanism for plastic deformation in metallic glass. Films with a total thickness of 1μm and bilayer repeat lengths ranging from 2 to 50 nm were magnetron sputter-deposited onto sapphire substrates. In contrast to many crystalline multilayered systems, where large hardness enhancements have been observed when the bilayer repeat length is reduced below about 10 nm, no significant hardness enhancement as a function of bilayer repeat length was observed in the Fe50Ti50/ Cu35Nb65 amorphous metal system. This result suggests that a dislocation–like mechanism for plastic deformation may not be appropriate for these amorphous metals.

scholarly journals Preparation Conditions of rf-Sputter Deposited Fe/AlN Multilayered Thin Films and Their Properties.

1998 ◽  
Vol 45 (3) ◽  
pp. 253-256
Author(s):  
Shinichi Kikkawa ◽  
Shinsuke Enomoto ◽  
Masao Takahashi ◽  
Ken Hirota ◽  
Osamu Yamaguchi
Keyword(s):  
Thin Films ◽  
Preparation Conditions ◽  
Sputter Deposited ◽  
Multilayered Thin Films

Development of Crystallographic Texture in RF Sputter Deposited CoCrTa/Cr Thin Films

1993 ◽  
Vol 313 ◽  
Author(s):  
Y. C. Feng ◽  
D. E. Laughlin ◽  
D. N. Lambeth
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Elevated Temperature ◽  
Substrate Temperature ◽  
Crystallographic Texture ◽  
Film Morphology ◽  
Substrate Bias ◽  
Sputter Deposited

ABSTRACTIt is well known that Cr sputtered on glass or NiP/Al substrates has either the (002) or (110) crystallographic texture (depending on the substrate temperature) and that the Co-alloy layers which are deposited on the Cr underlayers have either the (1120) or (1011) textures respectively. However, the dependence of the crystallographic textures on other sputtering parameters is not clear. We report here on the study of the dependence of crystallographic textures of CoCrTa/Cr films on substrate bias. It is found that both Cr (110) and Cr (002) textures can form at elevated temperature, depending on the substrate bias. The development of the crystallographic texture is discussed with a Model. It is also found that the epitaxy of CoCrTa layer depends on the sputtering conditions of both the Cr and the CoCrTa layers. The extrinsic magnetic properties (such as He, S and S*) of thin films with various textures are also presented. By controlling the sputtering procedure, the effects of crystallographic textures on magnetic properties were separated from the effects of film Morphology.

Si Doped and Un-Doped CrN Thin Films Produced by Magnetron Sputtering: Structural and Mechanical Properties

2012 ◽  
Vol 18-19 ◽  
pp. 201-211 ◽  
Author(s):  
L. Cunha ◽  
C. Moura
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Crystallite Size ◽  
Processing Parameters ◽  
Preferred Orientation ◽  
Chromium Nitride ◽  
Face Centered Cubic ◽  
Face Centered ◽  
Silicon Doped

Chromium nitride and silicon doped chromium nitride thin films have been deposited by r.f. reactive magnetron sputtering. The effect of processing parameters on the properties of chromium nitride films and the correspondent influence of the addition of silicon on the chromium nitride matrix in the films structure and mechanical properties have been investigated. The characterization of the coatings was performed by X-ray diffraction (XRD), and nano-indentation experiments. These studies allow analyzing the crystalline phases, crystal orientation/texture, crystallite size, mechanical properties and the relations between the characteristics of the films. The increase of the nitrogen partial pressure in the working atmosphere produces changes from a body-centered cubic (bcc) Cr structure, to hexagonal Cr2N to face-centered cubic (fcc) CrN structure, with CrN (111) preferred orientation. For the films with a dominant Cr2N phase the hardness has a relative maximum (42 GPa). The highest hardness was measured for a coating with dominant CrN phase (45 GPa) with a crystallite size around 18 nm. The addition of Si, in the films with CrN dominant phase, maintains the CrN (111) preferred orientation and produced variable changes in films hardness, depending on deposition conditions.

Sign in / Sign up

Export Citation Format

Share Document