HfZnO/ZnO Heterostructures Fabricated Using Low-Cost Large-Area Compatible Sputtering Processes

2015 ◽  
Vol 1731 ◽  
Author(s):  
Chih-Hung Li ◽  
Jian-Zhang Chen ◽  
I-Chun Cheng

ABSTRACTWe investigated the electrical properties of the rf-sputtered HfxZn1-xO/ZnO heterostructures. The thermal annealing on ZnO prior to the HfxZn1-xO deposition greatly influences the properties of the heterostructures. A highly conductive interface formed at the interface between HfxZn1-xO and ZnO thin films as the ZnO annealing temperature exceeded 500°C, leading to the apparent decrease of the electrical resistance. The resistance decreased with an increase of either thickness or Hf content of the HfxZn1-xO capping layer. The Hf0.05Zn0.95O/ZnO heterostructure with a 200-nm-thick 600°C-annealed ZnO exhibits a carrier mobility of 14.3 cm2V-1s-1 and a sheet carrier concentration of 1.93×1013 cm-2; the corresponding values for the bare ZnO thin film are 0.47 cm2V-1s-1 and 2.27×1012 cm-2, respectively. Rf-sputtered HfZnO/ZnO heterostructures can potentially be used to increase the carrier mobility of thin-film transistors in large-area electronics.

MRS Advances ◽  
2018 ◽  
Vol 3 (33) ◽  
pp. 1871-1876 ◽  
Author(s):  
Chen Jiang ◽  
Hanbin Ma ◽  
Arokia Nathan

Abstract:All-inkjet-printed organic thin-film transistors take advantage of low-cost fabrication and high compatibility to large-area manufacturing, making them potential candidates for flexible, wearable electronics. However, in real-world applications, device instability is an obstacle, and thus, understanding the factors that cause instability becomes compelling. In this work, all-inkjet-printed low-voltage organic thin-film transistors were fabricated and their stability was investigated. The devices demonstrate low operating voltage (<3 V), small subthreshold slope (128 mV/decade), good mobility (0.1 cm2 V−1 s−1), close-to-zero threshold voltage (−0.16 V), and high on/off ratio (>105). Several aspects of stability were investigated, including mechanical bending, shelf life, and bias stress. Based on these tests, we find that water molecule polarization in dielectrics is the main factor causing instability. Our study suggests use of a printable water-resistant dielectric for stability enhancement for the future development of all-inkjet-printed organic thin-film transistors.


1985 ◽  
Vol 49 ◽  
Author(s):  
J. Allison ◽  
D.P. Turner ◽  
D.C. Cousins

AbstractPrototype thin film transistors have previously been fabricated by r.f. magnetron sputtering of a-Si:H on to CVD Si02 using a crystalline silicon gate. These devices exhibited an on/off current ratio of four orders of magnitude for gate voltages as low as 10 volts. This demonstrated the suitability of the sputtered layer for liquid crystal display applications.The use of a crystalline substrate negates the advantages of using a thin film,such as large area capability and low cost, so we have turned our attention to the provision of a sputtered dielectric. Several candidate materials have been considered, including Si02, Si3N4, Ta205, AIN and Ti02. We present the characteristics of our first all-sputtered transistor utilising an Si02 gate,and assess the dielectric properties and potential of other materials, with emphasis on the silicon oxynitride system.


2011 ◽  
Vol 364 ◽  
pp. 206-210 ◽  
Author(s):  
Brian Yuliarto ◽  
Mardiana Silvia ◽  
Muhammad Iqbal ◽  
Nugraha

The liquid petroleum (LP) gas leakage detector was successfully fabricated using modified nanostructured ZnO thin film as the sensitive layer. The detector consists of ZnO sensitive layer, a heater, a comparator, a transistor, an LED and a buzzer. The detector has the switch system where the comparator can change the current through the LED and buzzers when the LP gas is detected. The ZnO thin films were fabricated by sol gel method using chemical bath deposition technique at moderate temperature on an alumina substrate with electrode contacts. This sensors system allows us to produce LP gas sensor with a relatively low-cost procedure. The detector was tested with the LP gas leakages and had shown good response values as measured at the operational temperature of 200o C.


2017 ◽  
Vol 64 (5) ◽  
pp. 2030-2037 ◽  
Author(s):  
Jiaqing Zhao ◽  
Pengfei Yu ◽  
Shi Qiu ◽  
Qinghang Zhao ◽  
Linrun Feng ◽  
...  

2013 ◽  
Vol 60 (10) ◽  
pp. 3424-3429 ◽  
Author(s):  
Christian Brox-Nilsen ◽  
Jidong Jin ◽  
Yi Luo ◽  
Peng Bao ◽  
Aimin M. Song

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