Correlation between crystallinity and mid-infrared optical absorption spectra of silicon supersaturated with sulfur

2015 ◽  
Vol 1738 ◽  
Author(s):  
Ikurou Umezu ◽  
Katsuki Nagao ◽  
Tatsuya Nakai ◽  
Muneyuki Naito ◽  
Mitsuru Inada ◽  
...  

ABSTRACTWe prepared silicon hyperdoped with sulfur by ion-implantation followed by pulsed laser melting. Effects of laser fluence during pulsed laser melting and of post-annealing on the silicon hyperdoped with sulfur are investigated. The structure of hyperdoped layer changes from poly-to mono-crystal with increasing laser fluence. Interface between sulfur-implanted-layer and single-crystal substrate disappear above 1.1 J/cm2. The spectral intensity of mid-infrared (MIR) optical absorption increases with crystallinity and spectral shape depends on whether the melt depth during pulsed laser melting reaches interface between implanted layer and single-crystal silicon substrate or not. The MIR absorption intensity rapidly decreases with thermal annealing temperature and almost disappears at 750 °C. The activation energy of conductivity decreases with increasing laser fluence and further decreases with increasing post thermal-annealing temperature. The insulator-metal transition is observed for the sample annealed at 750 °C. These results indicate that there is no direct correlation between MIR optical absorption band and insulator-metal transition.

Author(s):  
Malek Tabbal ◽  
Taegon Kim ◽  
Jeffrey M. Warrender ◽  
Michael J. Aziz ◽  
B. L. Cardozo ◽  
...  

2013 ◽  
Vol 103 (20) ◽  
pp. 203114 ◽  
Author(s):  
Servin Rathi ◽  
Jin-Hyung Park ◽  
In-yeal Lee ◽  
Min Jin Kim ◽  
Jeong Min Baik ◽  
...  

2003 ◽  
Vol 94 (2) ◽  
pp. 1043-1049 ◽  
Author(s):  
K. M. Yu ◽  
W. Walukiewicz ◽  
M. A. Scarpulla ◽  
O. D. Dubon ◽  
J. Wu ◽  
...  

Author(s):  
Fadei F. Komarov ◽  
Nikita S. Nechaev ◽  
Irina N. Parkhomenko ◽  
Gennadii D. Ivlev ◽  
Liudmila A. Vlasukova ◽  
...  

The Si layers doped with Te up to the concentrations of (3–5)1020 cm–3 have been formed via ion implantation and pulsed laser melting. It is found, 70–90 % of the embedded impurity atoms are in substitution states in the silicon lattice. These layers have revealed significant absorption (35–66 %) in the wavelength λ range of 1100–2500 nm. In this case, the absorption coefficient increases with the λ growth. The absorption spectra of the implanted layers after pulsed laser melting, equilibrium furnace annealing, and rapid thermal annealing have been compared. It is shown that equilibrium furnace annealing increases the photon absorption by 4 % in the wavelength range of 1100–2500 nm in comparison with virgin Si. After rapid thermal annealing, the photon absorption in the IR-range increases only by 2 %.


Author(s):  
D. Pastor ◽  
J. Olea ◽  
M. Toledano-Luque ◽  
I. Martil ◽  
G. Gonzalez-Diaz ◽  
...  

1999 ◽  
Vol 607 ◽  
Author(s):  
How-Ghee Ang ◽  
Leng-Leng Chng ◽  
Yiew-Wang Lee ◽  
Colin J. Flynn ◽  
Phil C. Smith ◽  
...  

AbstractThis paper describes the reduction of the near-band-edge absorption of zinc germanium phosphide (ZGP) through thermal annealing. The effects of the annealing time, temperature and vapour atmosphere on the reduction of the optical absorption in the near infrared (NIR) region are reported. Results have shown that the optical absorption at 2µm is reduced by at least 50% upon thermal anneal of ZGP. The optimal annealing temperature was 600'C and the optimal annealing time ranged from 200 - 400 h. Annealing in vacuum yielded a larger reduction in the 2-µm optical absorption compared to annealing in the presence of additional zinc and phosphorus vapours. Re-annealing ZGP further reduced the absorption coefficient at 2-µm. However, the percentage decrease in the 2-µm absorption coefficient was much smaller compared to the first thermal anneal.


1983 ◽  
Vol 23 ◽  
Author(s):  
R. T. Tung ◽  
J. M. Gibson ◽  
D. C. Jacobson ◽  
J. M. Poate

ABSTRACTEpitaxial Ni and Co silicides have been fabricated using pulsed laser melting. Interfacial instabilities and cell formation are suppressed during the liquid-phase epitaxy by melting mono or disilicide layers. Single crystal NiSi2 and CoSi2 films have been grown on (100) and (111) Si following a post-anneal. This method does not require UHV deposition or reaction techniques.


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