High Efficiency Large Area a-Si:H and a-SiGe:H Multi-junction Solar Cells Using MVHF at High Deposition Rate

2009 ◽  
Vol 1153 ◽  
Author(s):  
Xixiang Xu ◽  
Dave Beglau ◽  
Scott Ehlert ◽  
Yang Li ◽  
Tining Su ◽  
...  

AbstractWe have developed high efficiency large area a-Si:H and a-SiGe:H multi-junction solar cells using a Modified Very High Frequency (MVHF) glow discharge process. We conducted a comparative study for different cell structures, and compared the initial and stable performance and light-induced degradation of solar cells made using MVHF and RF techniques. Besides high efficiency, the MVHF cells also demonstrate superior light stability, showing <10% degradation after 1000 hour of one-sun light soaking at 50 °C. We also studied light-induced defect level and hydrogen evolution characteristics of MVHF deposited a-SiGe:H films and compared them with the RF deposited films.

MRS Bulletin ◽  
1993 ◽  
Vol 18 (10) ◽  
pp. 45-47 ◽  
Author(s):  
T. Suntola

Cadmium telluride is currently the most promising material for high efficiency, low-cost thin-film solar cells. Cadmium telluride is a compound semiconductor with an ideal 1.45 eV bandgap for direct light-to-electricity conversion. The light absorption coefficient of CdTe is high enough to make a one-micrometer-thick layer of material absorb over 99% of the visible light. Processing homogenous polycrystalline thin films seems to be less critical for CdTe than for many other compound semiconductors. The best small-area CdTe thin-film cells manufactured show more than 15% conversion efficiency. Large-area modules with aperture efficiencies in excess of 10% have also been demonstrated. The long-term stability of CdTe solar cell structures is not known in detail or in the necessary time span. Indication of good stability has been demonstrated. One of the concerns about CdTe solar cells is the presence of cadmium which is an environmentally hazardous material.


2009 ◽  
Vol 1153 ◽  
Author(s):  
Xixiang Xu ◽  
Yang Li ◽  
Scott Ehlert ◽  
Tining Su ◽  
Dave Beglau ◽  
...  

AbstractWe report our investigations of large area multi-junction solar cells based on hydrogenated nano-crystalline silicon (nc-Si:H). We compared results from cells deposited by RF (13.56 MHz) at lower deposition rate (˜3 Å/s) and by Modified Very High Frequency (MVHF) at higher rate (≥ 10 Å/s). With optimized process conditions and cell structures, we have obtained ˜12% initial small active-area (˜0.25 cm2) efficiency for both RF and MVHF cells and 10˜11% large aperture-area (˜400 cm2) encapsulated MVHF cell efficiency for both a-Si:H/nc-Si:H double-junction and a-Si:H/nc-Si:H/nc-Si:H triple-junction structures on Ag/ZnO coated stainless steel substrate.


2008 ◽  
Vol 1066 ◽  
Author(s):  
Xixiang Xu ◽  
Baojie Yan ◽  
Dave Beglau ◽  
Yang Li ◽  
Greg DeMaggio ◽  
...  

ABSTRACTSolar cells based on hydrogenated nanocrystalline silicon (nc-Si:H) have demonstrated significant improvement in the last few years. From the standpoint of commercial viability, good quality nc-Si:H films must be deposited at a high rate. In this paper, we present the results of our investigations on obtaining high quality nc-Si:H and a-Si:H films and solar cells over large areas using high deposition rate. We have employed the modified very high frequency (MVHF) glow discharge technique to realize high-rate deposition. Modeling studies were conducted to attain good spatial uniformity of electric field over a large area (15”×1”) MVHF cathode for nc-Si:H deposition. A comparative study has been carried out between the RF and MVHF plasma deposited a-Si:H and nc-Si:H single-junction and a-Si:H/nc-Si:H double-junction solar cells. By optimizing the nc-Si:H cell and the tunnel/recombination junctions, we have obtained an initial aperture-area (460 cm2) efficiency of 11.9% for a-Si:H/nc-Si:H double-junction cells using conventional RF (13.56 MHz) plasma deposition. The deposition rate was 3 Å/sec. Results on solar cells made with MVHF will also be presented.


1998 ◽  
Vol 507 ◽  
Author(s):  
S.J. Jones ◽  
X. Deng ◽  
T. Liu ◽  
M. Izu

ABSTRACTThe 70 MHz Plasma Enhance Chemical Vapor Deposition (PECVD) technique has been tested as a high deposition rate (10 A/s) process for the fabrication of a-Si:H and a-SiGe:H alloy ilayers for high efficiency nip solar cells. As a prelude to multi-junction cell fabrication, the deposition conditions used to make single-junction a-Si:H and a-SiGe:H cells using this Very High Frequency (VHF) method have been varied to optimize the material quality and the cell efficiencies. It was found that the efficiencies and the light stability for a-Si:H single-junction cells can be made to remain relatively constant as the i-layer deposition rate is varied from 1 to 10 Å/s. Also these stable efficiencies are similar to those for cells made at low deposition rates (1 Å/s) using the standard 13.56 MHz PECVD technique. For the a-SiGe:H cells of the same i-layer thickness, use of the VHF technique leads to cells with higher currents and an ability to more easily current match triple-junction cells prepared at high deposition rates which should lead to higher multi-junction efficiencies. Thus, use of this VHF method in the production of large area a- Si:H based multi-junction solar modules will allow for higher i-layer deposition rates, higher manufacturing throughput and reduced module cost.


2010 ◽  
Vol 1245 ◽  
Author(s):  
Xixiang Xu ◽  
Tining Su ◽  
Scott Ehlert ◽  
David Bobela ◽  
Dave Beglau ◽  
...  

AbstractWe present the progress made in attaining high-efficiency large-area nc-Si:H based multi-junction solar cells using Modified Very High Frequency technology. We focused our effort on improving the spatial uniformity and homogeneity of nc-Si:H film growth and cell performance. We also conducted both indoor and outdoor light soaking studies and achieved 11.2% stabilized efficiency on large-area (≥400 cm2) encapsulated a-Si:H/nc-Si:H/nc-Si:H triple-junction cells.


2021 ◽  
pp. 2109968
Author(s):  
Xiaojia Xu ◽  
Xiaoyu Ji ◽  
Rui Chen ◽  
Fangyuan Ye ◽  
Shuaijun Liu ◽  
...  

2019 ◽  
Vol 191 ◽  
pp. 389-398 ◽  
Author(s):  
Shaoyang Ma ◽  
Tao Ye ◽  
Tingting Wu ◽  
Zhe Wang ◽  
Zhixun Wang ◽  
...  

Author(s):  
S. Yoshida ◽  
K. Mitsui ◽  
T. Oda ◽  
Y. Yukimoto ◽  
K. Shirahata

2020 ◽  
Vol 32 (51) ◽  
pp. 2002202 ◽  
Author(s):  
Sang‐Won Lee ◽  
Soohyun Bae ◽  
Donghwan Kim ◽  
Hae‐Seok Lee

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