Electrical Reliability of Solgel Barium Titanate Films on Copper Foils for Organic Package Integration

2010 ◽  
Vol 1247 ◽  
Author(s):  
Manish Kumar ◽  
Shu Xiang ◽  
P. Markondeya Raj ◽  
Isaac Robin Abothu ◽  
Jin-Hyun Hwang ◽  
...  

AbstractThere is an increasing need for integrating high dielectric constant ceramic thin film components in organic and 3D IC packages to lower the power-supply impedance at high frequencies and supply noise-free power to the ICs. Sol-gel approach is very attractive for high density capacitors because of its ability to precisely control the composition of the films and the ease of introducing dopants to engineer the dielectric properties such as breakdown voltages and DC leakage characteristics. Thin films on copper foils lend themselves to organic package integration with standard foil lamination techniques used in package build-up processes. However, fabrication of thin film barium titanate on copper foils is generally affected by process incompatibility during crystallization in reducing atmospheres, leading to poor crystallization, oxygen vacancies and copper diffusion through the film that degrades the electrical properties.This paper focuses on the dielectric properties and electrical reliability of thin films on copper foils. Thin film (300-400 nm) embedded capacitors with capacitance density of 2 μF/cm2, low leakage current and high breakdown voltage were fabricated via sol-gel technology and foil lamination. To lower the leakage current, the chemical composition was altered by incorporating – 1.) Excess barium 2.) Acceptor dopants such as Mn. Both approaches lowered the leakage current compared to that of pure barium titanate. SEM analysis showed enhanced densification and refined grain structure with chemistry modification. The films showed good stability in leakage currents at 150 C with an applied field strength of 100 kV/cm, demonstrating the electrical reliability of these films.

2007 ◽  
Vol 124-126 ◽  
pp. 659-662
Author(s):  
Sung Pill Nam ◽  
Sung Gap Lee ◽  
Seong Gi Bae ◽  
Young Hie Lee

The BaTiO3/SrTiO3 heterolayered thick films were fabricated by two different methods – thick films of BaTiO3 by screen printing method on alumina substrates electrodes with Pt, thin films of SrTiO3 by the spin-coating method on BaTiO3 thick films and once more thick films of BaTiO3 by the screen printing method on SrTiO3 layer. The leakage current and the dielectric properties were investigated for effect of various stacking sequence of sol-gel-prepared SrTiO3 layer at interface of BaTiO3 thick films. The insertion of SrTiO3 interlayer yielded BaTiO3 thick films with homogeneous and dense grain structure with the number of SrTiO3 layers. The leakage current density of the BaTiO3/SrTiO3-7 film is less that 1.5 10-9 A/cm2 at 5 V.


2014 ◽  
Vol 538 ◽  
pp. 11-14
Author(s):  
Yang Lu Hou ◽  
Xing Hua Fu ◽  
Wen Hong Tao ◽  
Xin Jin

Mg-doped LaFeO3 thin film and Mg, Cr-doped La0.5Sr0.5FeO3 thin films were prepared by the sol-gel method. The change rules of structure and dielectric properties of the films were studied by XRD, SEM, and Agilent. The dielectric properties of La0.5Sr0.5FeO3 and LaFeO3 films were improved by the substitute with Mg and Cr. The doping amount of Mg and Cr for the optimal dielectric properties of La0.5Sr0.5FeO3 films is 45mol%, 25mol%, respectively, and for LaFeO3, the doping amount of Mg is 8mol%. The observed pure perovskite phase of the doped films suggested the dissolution of Mn, Co, and Ni in La0.5Sr0.5FeO3 crystal lattice. Mg and Cr were integrate in the lattice of LaFeO3 and La0.5Sr0.5FeO3, and mineral is single perovskite phase. The surface of the film is smooth, without cracks, surface grain size distribution and had uniform grain size.


2003 ◽  
Vol 30 (5-6) ◽  
pp. 99-107 ◽  
Author(s):  
M. Jain ◽  
S. B. Majumder ◽  
Yu. Yuzyuk ◽  
R. S. Katiyar ◽  
A. S. Bhalla ◽  
...  

1997 ◽  
Vol 12 (6) ◽  
pp. 1576-1581 ◽  
Author(s):  
Seung-Hyun Kim ◽  
Yong-Soo Choi ◽  
Chang-Eun Kim ◽  
Young-Jei Oh

Pb(Zr0.52Ti0.48)O3 (PZT) thin film on Pt/RuO2 double electrode was successfully prepared by using a new alkoxide-alkanolamine, sol-gel method. It was observed that the use of Pt/RuO2 double electrode reduced leakage current, resulting in a marked improvement in the leakage characteristics and more reliable capacitors. Typical P-E hysteresis behavior was observed even at low applied voltage of 5 V, manifesting greatly improved remanence and coercivity. Fatigue and breakdown characteristics, measured at 5 V, showed stable behavior, and no degradation in polarization was observed up to 1011 cycles.


2013 ◽  
Vol 1507 ◽  
Author(s):  
Santosh K. Sahoo ◽  
H. Bakhru ◽  
Sumit Kumar ◽  
D. Misra ◽  
Colin A. Wolden ◽  
...  

ABSTRACTBa0.8Sr0.2TiO3/ZrO2 heterostructured thin films are deposited on Pt/Ti/SiO2/Si substrates by a sol-gel process. The current versus voltage (I-V) measurements of metal-insulator-metal (MIM) devices using the above multilayered thin film as the dielectric have been taken in the temperature range of 310 to 410K. The electrical conduction mechanisms contributing to the leakage current at different field regions have been studied in this work. Various models are used to know the different leakage mechanisms contributing to the conduction current in these devices. It is observed that Poole-Frenkel mechanism is the dominant conduction process in the high field region with a deep trap level energy (φt) of 1.31 eV whereas space charge limited current (SCLC) mechanism and Ohmic conduction process are contributing to the leakage current in the medium and low field regions respectively. The estimated shallow trap level (Et) for SCLC mechanism is 0.26 eV whereas the activation energy (Ea) for the electrons in the Ohmic conduction process is about 0.07 eV. An energy band diagram is given to explain the various leakage mechanisms in different field regions for these heterostructured thin films.


2007 ◽  
Vol 336-338 ◽  
pp. 799-801
Author(s):  
Rong Juan Zhao ◽  
Yuan Hua Lin ◽  
Jing Nan Cai ◽  
Ce Wen Nan ◽  
Dan Xie

Ni-Si-O thin films on Si substrate have been prepared by a sol-gel method. The microstructure and phase composition of the films were investigated by XRD, SEM, FTIR. The XRD results showed that the films are amorphous while annealed at 800oC for 10 min, the SEM imagines proved that the films are smooth and thickness is about 190 nm. Electrical property of the film indicated that the leakage current was as low as 10-6A/cm2 at an electric field of 1MV/cm. The dielectric properties of Ni-Si-O thin films can be improved as increasing the annealed temperature.


2012 ◽  
Vol 252 ◽  
pp. 232-236 ◽  
Author(s):  
Xiao Hua Sun ◽  
Xiu Neng Li ◽  
Ying Yang ◽  
Min Wu ◽  
Shuang Hou ◽  
...  

Pb0.3Sr0.7TiO3 (PST) thin films have been prepared from precursor solution sonicated for different time on Pt/Ti/SiO2/Si substrates by sol-gel method. The effect of ultrasonic processing on the chemical bonding of PST precursor solution and the thermal evolution of PST dry gel are characterized with FT-IR and TG-DT technology. The structure, dielectric properties and leakage current density of PST thin films are investigated as functions of sol ultrasonic processing time. It’s found that ultrasonic processing brings about the partial sol structure rearrangement, the delay of PST formative temperature, the reduction of crystallization and dielectric constant, and the significant improvement of leakage current, dielectric loss and the figure of merit (FOM). The results suggest that the enhancement in the quality of thin films prepared with sol-gel method can be obtained by the suitable ultrasonic processing on precursor solutions. The PST thin film prepared from precursor solution sonicated for 8 h shows the highest FOM for its appropriate tunability of 57.36% and low dielectric loss of 0.0144.


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