Structural Characterization of Ru-B 4c Multilayers Fabricated By Magnetron Sputtering
Keyword(s):
X Ray
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ABSTRACTMultilayer structures composed of alternating, ultrathin layers of Ru and B4C have been fabricated using DC magnetron sputtering. These multilayers are potentially important as normal incidence x-ray reflectors at wavelengths above the boron K-absorption edge at 65Å. The detailed structure of the layers has been characterized using x-ray diffraction and high-resolution transmission electron microscopy. It is found that, under optimized deposition conditions, continuous layers can be grown that have smooth and abrupt interfaces. The normal incidence reflectivity at x-ray wavelengths of ∼70Å has been measured, and values as high as 20% have been obtained.
2014 ◽
Vol 92
(7/8)
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pp. 940-942
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1973 ◽
Vol 31
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pp. 132-133
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2012 ◽
Vol 174-177
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pp. 508-511
2017 ◽
Vol 8
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pp. 1257-1265
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