Preparation of Large Thin Area Vlsi Tem Specimens by Dimpling With A “Flatting Tool”
Keyword(s):
AbstractAn alternative VLSI TEM specimen preparation technique has been developed to produce 100μm diameter electron transparent thin area by using a conventional dimpler with a texmet padded ‘flatting tool’ for dimpling and a microcloth padded ‘flatting tool’ for polishing, followed by low angle ion milling. The advantages of this technique are a large sampling area and shorter milling times than conventional specimen preparation methods. In the following, we report the details of the modified dimpling technique. The improvements in available electron transparency, and a decrease in ion milling time are demonstrated with the preparation of planar and cross section VLSI device samples.
Keyword(s):
1989 ◽
Vol 47
◽
pp. 712-713
Keyword(s):
1989 ◽
Vol 47
◽
pp. 438-439
Keyword(s):
1990 ◽
Vol 48
(4)
◽
pp. 742-743
Keyword(s):
1996 ◽
Vol 182
(3)
◽
pp. 186-191
◽
1991 ◽
Vol 49
◽
pp. 1104-1105
Keyword(s):