Sputter Deposition and Thermally Induced Phase Transformation of Non-BCC Chromium Thin Films

1993 ◽  
Vol 311 ◽  
Author(s):  
M. J. O'Keefe ◽  
S. Horiuchi ◽  
J.J. Chu ◽  
J.J. Rigsbee
Keyword(s):  
Crystal Structure ◽  
Thin Films ◽  
Photoelectron Spectroscopy ◽  
Low Carbon Steel ◽  
Substrate Material ◽  
Low Carbon ◽  
Thermally Induced ◽  
X Ray ◽  
Sputter Deposited ◽  
Cr Film

ABSTRACTThe crystal structure of sputter deposited chromium thin films on Coming 7059 glass, polytetrafluoroethylene, and cold rolled (110) oriented low carbon steel α-Fe substrates was investigated as a function of O and C incorporation into the growing Cr film. The as-deposited crystal structure of the films was found by X-ray diffraction to be either highly oriented (110) BCC α-Cr or (200) oriented A-15 δ-Cr. Chemical analysis of the films by Auger electron spectroscopy determined that the δ-Cr phaseformed when the combined O and C impurity concentration in the film was ∼15-30 at.%. At total impurity concentrations above ∼30 at.% or below ∼10 at.% standard BCC α-Cr formed. The crystal structure of the films was not influenced by the substrate material. X-ray photoelectron spectroscopy of the Cr 2pl/2-2p3/2 orbitals indicated that the dominate binding state of both the BCC α-Cr and A-15 δ-Cr films was characteristic of elemental Cr. Vacuum annealing of the A-15 δ-Cr films at 500º for one hour transformed the crystal structure into BCC α-Cr without a measurable change in chemical composition. The incorporation of O and C into the growing Cr film is believed to impurity stabilize the A-15 structure and favor its formation over the BCC structure.

Improvement of Mechanical and Electrochemical Properties of Titanium Thin Films Deposited by Duplex Treatment

2020 ◽  
Vol 46 ◽  
pp. 1-6
Author(s):  
Mohamed Mounes Alim ◽  
Fayçal Hadj-Larbi ◽  
Rabah Tadjine
Keyword(s):  
Thin Films ◽  
Electrochemical Properties ◽  
Low Carbon Steel ◽  
Hybrid Reactor ◽  
Steel Alloy ◽  
Low Carbon ◽  
X Ray Diffraction ◽  
X Ray ◽  
Titanium Thin Films ◽  
Duplex Surface Treatment

The mechanical and electrochemical properties of a low carbon steel alloy were improved with titanium (Ti) nitrides thin films. A nitriding process ensures the adhesion of the deposited thin films and provides the nitrogen source involved in the formation of the desired nitrides. A hybrid reactor was used to permit this duplex surface treatment and to avoid the oxidation of our samples. The X-ray diffraction revealed the formation of nitrided phases (TiN and Ti2N). The scanning electron microscopy showed an improvement in the adhesion of the deposited thin films with increasing negative bias voltages. The nanohardness of the duplex treated samples was found to be improved. The results obtained after the corrosion tests indicate a reduction of electrochemical activity and therefore an improvement of corrosion resistance.

scholarly journals Corrosion Inhibition of Low-Carbon Steel by Hydrophobic Organosilicon Dispersions

Metals ◽  
2021 ◽  
Vol 11 (8) ◽  
pp. 1269
Author(s):  
Yuri Makarychev ◽  
Natalia Gladkikh ◽  
Ivan Arkhipushkin ◽  
Yuri Kuznetsov
Keyword(s):  
Carbon Steel ◽  
Corrosion Inhibitor ◽  
Photoelectron Spectroscopy ◽  
Corrosion Inhibitors ◽  
Low Carbon Steel ◽  
Low Carbon ◽  
X Ray ◽  
Micelle Core ◽  
Hydrophobic Solvent ◽  
Polymer Type

This article proposes a method for obtaining stable hydrophobic inhibitor dispersions, where the micelle core contains a hydrophobic solvent, a corrosion inhibitor and an organosilane. Such compositions can be used as polymer-type corrosion inhibitors for low-carbon steel. Using electrochemical methods, corrosion tests and X-ray photoelectron spectroscopy, features of the formation of polymeric layers of hydrophobic organosilicon dispersions were studied.

Stress, Microstructure and Temperature Stability of Reactive Sputter Deposited Ta(N) Thin Films

1999 ◽  
Vol 594 ◽  
Author(s):  
K. D. Leedy ◽  
M. J. O'Keefe ◽  
J. T. Grant
Keyword(s):  
Thin Films ◽  
Photoelectron Spectroscopy ◽  
Nitrogen Concentration ◽  
Temperature Stability ◽  
Microstructural Characterization ◽  
Tantalum Nitride ◽  
X Ray ◽  
Nitrogen Concentrations ◽  
Sputter Deposited ◽  
Temperature Exposure

AbstractInterest in tantalum nitride thin films for use as diffusion barriers in Cu-based microelectronic interconnects merits the study of tantalum nitride thin film properties as a function of deposition conditions and elevated temperature exposure. In this investigation, the influence of nitrogen content and post deposition annealing on the stress, microstructure and resistivity of Ta(N) films was analyzed. Ta(N) thin films were deposited by reactive dc magnetron sputtering of a Ta target in Ar/N2 gas mixtures. With an increasing N2 to Ar flow ratio, the as-deposited crystal structure of the films changed from ß-Ta to bcc Ta with N in solid solution to TaN0.1 to Ta2N and finally to TaN. The as-deposited Ta(N) stress, grain size and resistivity of the films were found to be strongly dependent on the phase(s) present. Films with less than 20 at. % nitrogen concentration displayed large compressive stress increases during 650°C anneals in flowing N2. Phase transformations to Ta2N occurred after 650°C anneals in films with nitrogen concentrations from ∼ 15 to 25 at. %. Microstructural characterization using transmission electron microscopy and x-ray diffraction, and chemical analysis by x-ray photoelectron spectroscopy and Auger electron spectroscopy of the Ta(N) films were used to identify the as-deposited and transformed phases.

scholarly journals Switchable Piezoresistive SmS Thin Films on Large Area

Sensors ◽  
2019 ◽  
Vol 19 (20) ◽  
pp. 4390 ◽  
Author(s):  
Andreas Sousanis ◽  
Dirk Poelman ◽  
Christophe Detavernier ◽  
Philippe F. Smet
Keyword(s):  
Thin Films ◽  
Photoelectron Spectroscopy ◽  
Metallic State ◽  
Large Area ◽  
Thermally Induced ◽  
X Ray ◽  
Piezoresistive Sensors ◽  
Deposition Parameters ◽  
Structural And Electrical Properties ◽  
Samarium Monosulfide

Samarium monosulfide (SmS) is a switchable material, showing a pressure-induced semiconductor to metal transition. As such, it can be used in different applications such as piezoresistive sensors and memory devices. In this work, we present how e-beam sublimation of samarium metal in a reactive atmosphere can be used for the deposition of semiconducting SmS thin films on 150 mm diameter silicon wafers. The deposition parameters influencing the composition and properties of the thin films are evaluated, such as the deposition rate of Sm metal, the substrate temperature and the H2S partial pressure. We then present the changes in the optical, structural and electrical properties of this compound after the pressure-induced switching to the metallic state. The back-switching and stability of SmS thin films are studied as a function of temperature and atmosphere via in-situ X-ray diffraction. The thermally induced back switching initiates at 250 °C, while above 500 °C, Sm2O2S is formed. Lastly, we explore the possibility to determine the valence state of the samarium ions by means of X-ray photoelectron spectroscopy.

Plasma Polymerization of Fluorocarbon Thin Films on Glass and Metal Substrates

1993 ◽  
Vol 304 ◽  
Author(s):  
M. J. O'Keefe ◽  
J. M. Rigsbee
Keyword(s):  
Photoelectron Spectroscopy ◽  
Plasma Polymerization ◽  
Low Carbon Steel ◽  
Optical Emission ◽  
Substrate Material ◽  
Low Carbon ◽  
Graphite Target ◽  
Fluorocarbon Films ◽  
Deposited Films

AbstractPlasma polymerization of thin, fluorocarbon films onto glass, low carbon steel, and aluminium foil substrates using a hexafluoroethane (C2F6) glow discharge in a parallel plate, rf-sputter system was studied. Continuous, 100 nm thick fluoropolymer films were obtained when a graphite sputter target was used as the cathode material. Depositions conducted without the use of a consumable cathode produce continuous but thin (<10 nm) films of fluorocarbon material. Analysis of the plasma by optical emission spectroscopy determined that the dominant species in the discharge was CF2 for both target configurations. An increase in the intensity of specific CF2 transitions was observed when the graphite target was used. Characterization of the deposited films by X-ray photoelectron spectroscopy of the C 1s and F 1s photoelectrons was used to determine the atomic F/C ratio and distribution of CF3, CF2, CF, C-CF, and C binding states. Films fabricated with the graphite target had a lower F/C ratio than depositions made without a consumable target. However, the distribution of binding states and the F/C ratio in the fluoropolymer was dependent on the substrate material. The results of the study indicate that the fluoropolymer film composition was significantly influenced by the underlying substrate material.

scholarly journals Electrochemical Obtaining and Corrosion Behavior of Zinc-Polyaniline (Zn-PANI) Hybrid Coatings

Coatings ◽  
2019 ◽  
Vol 9 (8) ◽  
pp. 487 ◽  
Author(s):  
Nelly Boshkova ◽  
Nadezhda Tabakova ◽  
Genoveva Atanassova ◽  
Nikolai Boshkov
Keyword(s):  
Photoelectron Spectroscopy ◽  
Zinc Coating ◽  
Low Carbon Steel ◽  
Open Circuit ◽  
Steel Plates ◽  
Hybrid Coatings ◽  
Low Carbon ◽  
Model Medium ◽  
X Ray ◽  
Before And After

Hybrid zinc-based coatings with embedded polyaniline (PANI) particles in the metal matrix are obtained in a one-step process via electrodeposition on low-carbon steel plates. The aim is directly to use the inhibitor properties of polyaniline for improved protection against corrosion in chloride containing medium (5% NaCl solution). PANI-particles (concentration of 0.025 g/L) are added to the starting zinc electrolyte in dispersed form—the latter being obtained via oxidation polymerization in the presence of stabilizers (polyvinyl pyrrolidone (PVP) or colloidal SiO2). Electrodeposition conditions are equal to those for obtaining an ordinary zinc coating. The surface morphology of the hybrid coatings before and after corrosion treatment in the model medium is characterized with SEM. The influence of the incorporated PANI/PVP- or PANI/SiO2-particles on the protective properties of the coatings is evaluated by the application of electrochemical (potentiodynamic polarization, open-circuit potential, polarization resistance, cyclic voltammetry) as well as X-ray based (X-ray diffraction and X-ray photoelectron spectroscopy) methods. A discussion and some conclusions about the reasons for the improved corrosion resistance and protective ability of the hybrid coatings in that model medium are proposed.

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