Growth of Diamond Films Using C3F8AND H2in A New System

ABSTRACTIn the present study, the new system used C3F8and H2 as source gases. Filament-assisted chemical vapor deposition was utilized. Continuous diamond films were grown on the Si and Mo substrates without any surface pretreatment. The results of scanning electron microscopy, Raman spectroscopy, X-ray diffraction, and atomic force microscopy measurements indicate that the films deposited on the Mo substrates are of high quality. Homoepitaxial diamond films were grown on the high pressure synthetic single crystal diamond substrates. The results show that in our experimental conditions epitaxial films were easily grown on the (111) synthetic diamond substrates and sometimes epitaxial filmse also grown on the (100) synthetic diamond substrates.

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Synthesis of ultrasmooth nanostructured diamond films by microwave plasma chemical vapor deposition using a He/H2/CH4/N2gas mixture

Journal of Materials Research ◽

10.1557/jmr.2006.0334 ◽

2006 ◽

Vol 21 (10) ◽

pp. 2675-2682 ◽

Cited By ~ 14

Author(s):

S. Chowdhury ◽

Damon A. Hillman ◽

Shane A. Catledge ◽

Valery V. Konovalov ◽

Yogesh K. Vohra

Keyword(s):

Gas Flow ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Optical Emission ◽

X Ray Diffraction ◽

Plasma Chemical Vapor Deposition ◽

Force Microscopy ◽

Atomic Force ◽

Gas Flow Ratio

Ultrasmooth nanostructured diamond (USND) films were synthesized on Ti–6Al–4V medical grade substrates by adding helium in H2/CH4/N2plasma and changing the N2/CH4gas flow from 0 to 0.6. We were able to deposit diamond films as smooth as 6 nm (root-mean-square), as measured by an atomic force microscopy (AFM) scan area of 2 μm2. Grain size was 4–5 nm at 71% He in (H2+ He) and N2/CH4gas flow ratio of 0.4 without deteriorating the hardness (∼50–60 GPa). The characterization of the films was performed with AFM, scanning electron microscopy, x-ray diffraction (XRD), Raman spectroscopy, and nanoindentation techniques. XRD and Raman results showed the nanocrystalline nature of the diamond films. The plasma species during deposition were monitored by optical emission spectroscopy. With increasing N2/CH4feedgas ratio (CH4was fixed) in He/H2/CH4/N2plasma, a substantial increase of CN radical (normalized by Balmer Hαline) was observed along with a drop in surface roughness up to a critical N2/CH4ratio of 0.4. The CN radical concentration in the plasma was thus correlated to the formation of ultrasmooth nanostructured diamond films.

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Influence of the growth parameters of TiO2 thin films deposited by the MOCVD method

Cerâmica ◽

10.1590/s0366-69132002000100009 ◽

2002 ◽

Vol 48 (305) ◽

pp. 38-42 ◽

Cited By ~ 3

Author(s):

M. I. B. Bernardi ◽

E. J. H. Lee ◽

P. N. Lisboa-Filho ◽

E. R. Leite ◽

E. Longo ◽

...

Keyword(s):

Thin Films ◽

Growth Parameters ◽

Structural Characteristics ◽

Chemical Vapor ◽

X Ray Diffraction ◽

Tio2 Thin Films ◽

X Ray ◽

Force Microscopy ◽

Atomic Force ◽

Deposition Parameters

The synthesis of TiO2 thin films was carried out by the Organometallic Chemical Vapor Deposition (MOCVD) method. The influence of deposition parameters used during growth on the final structural characteristics was studied. A combination of the following experimental parameters was studied: temperature of the organometallic bath, deposition time, and temperature and substrate type. The high influence of those parameters on the final thin film microstructure was analyzed by scanning electron microscopy with electron dispersive X-ray spectroscopy, atomic force microscopy and X-ray diffraction.

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HETERO-GROWTH OF (100) ORIENTATED ZNO FILMS ON SILICON BY SS-CVD

International Journal of Modern Physics B ◽

10.1142/s0217979202015194 ◽

2002 ◽

Vol 16 (28n29) ◽

pp. 4250-4254 ◽

Cited By ~ 1

Author(s):

JIAN-GUO LU ◽

ZHI-ZHEN YE ◽

HAN-HONG CHEN ◽

JING-YUN HUANG ◽

BING-HUI ZHAO

Keyword(s):

Texture Coefficient ◽

Zinc Acetate Dihydrate ◽

Chemical Vapor ◽

Zno Films ◽

X Ray Diffraction ◽

Lower Growth ◽

Force Microscopy ◽

Atomic Force ◽

First Time ◽

Lower Growth Temperature

ZnO films with (100) preferred orientation are reported for the first time. ZnO films were synthesized on Si(100) substrate by solid-source chemical vapor deposition (SS-CVD) using zinc acetate dihydrate (solid) as a precursor. The structural properties were investigated by X-ray diffraction and atomic force microscopy. Results show that a lower growth temperature and a higher deposition rate will facilitate the formation of (100) texture. The texture coefficient for (100) plane is 3.28.

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Deposition of GaN Films on Freestanding CVD Thick Diamond Films

Materials Science Forum ◽

10.4028/www.scientific.net/msf.654-656.1740 ◽

2010 ◽

Vol 654-656 ◽

pp. 1740-1743 ◽

Cited By ~ 1

Author(s):

Dong Zhang ◽

Yi Zhen Bai ◽

Fu Wen Qin ◽

Ji Ming Bian

Keyword(s):

Electron Cyclotron Resonance ◽

Diamond Films ◽

Chemical Vapor ◽

High Energy ◽

Organic Chemical ◽

High Quality ◽

Small Surface ◽

Force Microscopy ◽

Atomic Force ◽

Metal Organic

High quality GaN films are deposited on freestanding thick diamond films by electron cyclotron resonance plasma enhanced metal organic chemical vapor deposition (ECR-PEMOCVD). The characteristics of GaN films were investigated by x-ray diffraction analysis (XRD), reflection high energy electron diffraction (RHEED) and atomic force microscopy (AFM). The high quality GaN films with small surface roughness of 8.3 nm and high c-orientation are successfully achieved at the optimized nitriding time with the diamond substrate. These properties of GaN films with small surface smoothness and high c-orientation are well used as piezoelectric films for surface acoustic wave (SAW) devices.

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The Effects of Friction and Wear on PECVD Diamond Films.

MRS Proceedings ◽

10.1557/proc-339-653 ◽

1994 ◽

Vol 339 ◽

Author(s):

M. L. Languell ◽

J. L. Davidson ◽

J. J. Wert ◽

M. A. George ◽

W. E. Collins ◽

...

Keyword(s):

Vapor Deposition ◽

Friction And Wear ◽

Diamond Films ◽

Chemical Vapor ◽

Nasa Lewis Research ◽

Force Microscopy ◽

Atomic Force ◽

Mean Diameter ◽

Before And After ◽

Surface Changes

ABSTRACTThe effects of friction and wear were examined on plasma enhanced chemical vapor deposition (PECVD) diamond films deposited on tungsten substrates. The tribology of diamond on diamond was studied and the changes in surface roughness and the bearing ratio were determined before and after wear. The (111) textured heteroepitaxial films were studied morphologically by scanning electron microscopy (SEM) and atomic force microscopy (AFM). The changes in morphology involved a transition from the large as grown diamond crystallites with a mean diameter of 10 μm to a surface with grains as small as 100 nm. The nature of the wear-modified films will be discussed regarding the possible mechanisms for the surface changes.Work partially supported by NASA Lewis Research Center grant NAG3–1430.

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Influence of Ammonia on the Fabrication of Aligned Carbon Nanotubes Using Thermal CVD

Key Engineering Materials ◽

10.4028/www.scientific.net/kem.467-469.312 ◽

2011 ◽

Vol 467-469 ◽

pp. 312-315

Author(s):

Gang Li ◽

Wen Ming Cheng

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor ◽

X Ray Diffraction ◽

Vertical Alignment ◽

X Ray ◽

Force Microscopy ◽

Si Substrates ◽

Atomic Force ◽

Aligned Carbon Nanotubes ◽

20 Nm

Ultra-thin (20 nm) nickel catalyst films were deposited by sputtering on SiO2/Si substrates. At the pretreatments, ammonia (NH3) was conducted for different time in a thermal chemical vapor deposition (CVD) system. Pretreated samples were characterized using atomic force microscopy (AFM). After the pretreatment, acetylene was introduced into the chamber for 10 min, samples were characterized using scanning electron micrograph (SEM) and X-ray diffraction (XRD). It was concluded that NH3 pretreatment was very crucial to control the surface morphology of catalytic metals and thus to achieve the vertical alignment of carbon nanotubes (CNTs). With higher density of the Ni particles, better alignment of the CNTs can be obtained due to steric hindrance effect between neighboring CNTs.

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Simulation-Based Development of a New Cylindrical-Cavity Microwave-Plasma Reactor for Diamond-Film Synthesis

Crystals ◽

10.3390/cryst9060320 ◽

2019 ◽

Vol 9 (6) ◽

pp. 320 ◽

Cited By ~ 6

Author(s):

Qijun Wang ◽

Gai Wu ◽

Sheng Liu ◽

Zhiyin Gan ◽

Bo Yang ◽

...

Keyword(s):

Cylindrical Cavity ◽

Microwave Plasma ◽

Plasma Reactor ◽

Diamond Films ◽

Chemical Vapor ◽

Optical Microscope ◽

Plasma Chemical Vapor Deposition ◽

Atomic Force ◽

Single Crystal Diamond ◽

Film Synthesis

A 2.45 GHz microwave-plasma chemical-vapor deposition (MPCVD) reactor was designed and built in-house by collaborating with Guangdong TrueOne Semiconductor Technology Co., Ltd. A cylindrical cavity was designed as the deposition chamber and a circumferential coaxial-mode transformer located at the top of the cavity was adopted as the antenna. Two quartz-ring windows that were placed far away from the plasma and cooled by water-cooling cavity walls were used to affix the antenna to the cavity and act as a vacuum seal for the reactor, respectively. This design improved the sealing and protected the quartz windows. In addition, a numerical simulation was proposed to predict the electric-field and plasma-density distributions in the cavity. Based on the simulation results, a microwave-plasma reactor with TM021 mode was built. The leak rate of this new reactor was tested to be as low as 1 × 10−8 Pa·m3·s−1, and the maximal microwave power was as high as 10 kW. Then, single-crystal diamond films were grown with the morphology and crystalline quality characterized by an optical microscope, atomic force microscope (AFM), Raman spectrometer, photoluminescence (PL) spectrometer, and high-resolution X-ray diffractometer. It was shown that the newly developed MPCVD reactor can produce diamond films with high quality and purity.

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Nanotribology of Diamond Films Studied by Atomic Force Microscopy

MRS Proceedings ◽

10.1557/proc-188-219 ◽

1990 ◽

Vol 188 ◽

Author(s):

Gabi Neubauer ◽

Sidney R. Cohen ◽

Gary M. Mcclelland ◽

Hajime Seki

Keyword(s):

High Vacuum ◽

Diamond Films ◽

Ultra High Vacuum ◽

Nanometer Scale ◽

Kinetic Friction ◽

Experimental Conditions ◽

Stick Slip ◽

Force Microscopy ◽

Atomic Force ◽

The Difference

ABSTRACTAn atomic force microscope, operated in ultra-high vacuum has been employed to study the tribological properties of diamond films under small loads (< 10−6 N) on a nanometer scale. The incidence of intermittent motion, “stick-slip”, while sliding a diamond tip across the diamond film, is detected under certain experimental conditions and is discussed with respect to the difference between static and kinetic friction, sample topography and a varying sample condition.

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