Intrinsic Stress in Sputtered Thin Films
Keyword(s):
X Ray
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AbstractUnderstanding of the stress in thin films is important in controls of the properties of nanometer period x-ray multilayers. Stress evolution at the initial stages of thin film formation was studied by molecular dynamics simulation of Mo atoms impinging on a 5×5×5 unit cell Mo substrate. The simulation shows that the structure initially increases in a compressive state. The stress then decreases when the deposited atoms have covered the substrate surface. Measured stress of Ru films in Ru/C multilayers by laser curvature technique shows similar behavior to the simulated results.
Keyword(s):
2013 ◽
Vol 8
(9)
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pp. 2064-2069
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Keyword(s):
1993 ◽
Vol 11
(2)
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pp. 307-313
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Keyword(s):
2007 ◽
Vol 303
(2)
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pp. 530-536
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2006 ◽
Vol 2006.12
(0)
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pp. 241-242