Transport Path in Hydrogenated Microcrystalline Silicon

2002 ◽  
Vol 715 ◽  
Author(s):  
N. Wyrsch ◽  
C. Droz ◽  
L. Feitknecht ◽  
J. Spitznagel ◽  
A. Shah

AbstractUndoped microcrystalline silicon samples deposited in the transition regime between amorphous and microcrystalline growth have been investigated by dark conductivity measurement and Raman spectroscopy. From the latter, a semi-quantitative crystalline volume fraction Xc of the sample was deduced and correlated with dark conductivity data in order to reveal possible percolation controlled transport. No threshold was observed around the critical crystalline fraction value Xc of 33%, as reported previously, but a threshold in conductivity data was found at Xc≈50%. This threshold is interpreted here speculatively as being the result of postoxidation, and not constituting an actual percolation threshold.

2004 ◽  
Vol 808 ◽  
Author(s):  
Czang-Ho Lee ◽  
Denis Striakhilev ◽  
Arokia Nathan

ABSTRACTUndoped and n+ hydrogenated microcrystalline silicon (μc-Si:H) films for thin film transistors (TFTs) were deposited at a temperature of 250°C with 99 ∼ 99.6 % hydrogen dilution of silane by standard 13.56 MHz plasma enhanced chemical vapor deposition (PECVD). High crystallinity m c-Si:H films were achieved at 99.6 % hydrogen dilution and at low rf power. An undoped 80 nm thick m c-Si:H film showed a dark conductivity of the order of 10−7 S/cm, the photosensitivity of an order of 102, and a crystalline volume fraction of 80 %. However, a 60 nm thick n+ μc-Si:H film deposited using a seed layer showed a high dark conductivity of 35 S/cm and a crystalline volume fraction of 60 %. Using n+ μc-Si:H films as drain and source contact layers in a-Si:H TFTs provides substantial performance improvement over n+ a-Si:H contacts. Finally, fully μ c-Si:H TFTs incorporating intrinsic m c-Si:H films as channel layers and n+ μc-Si:H films as contact layers have been fabricated and characterized. These TFTs exhibit a low threshold voltage and a field effect mobility of 0.85 cm2/Vs, and are far more stable under gate bias stress than a-Si:H TFTs.


2007 ◽  
Vol 989 ◽  
Author(s):  
Kyung-Bae Park ◽  
Ji-Sim Jung ◽  
Jong-Man Kim ◽  
Myung-kwan Ryu ◽  
Sang-Yoon Lee ◽  
...  

AbstractMicrocrystalline silicon was deposited on glass by standard plasma enhanced chemical vapor deposition using H2 diluted SiH4. Raman spectroscopy indicated a crystalline volume fraction of as high as 40% in films deposited at a substrate temperature 350oC. The deposition rate in films was as high as 10Å/sec. This process produced ¥ìc-Si TFTs with both an electron mobility of 10.9cm2/Vs, a threshold voltage of 1.2V, a subthreshold slop of 0.5V/dec at n-channel TFTs and a hole mobility of 3.2cm2/Vs, a threshold voltage of -5V, a subthreshold slop of 0.42V/dec at p-channel TFTs without post-fabrication annealing.


1992 ◽  
Vol 242 ◽  
Author(s):  
M. Faraji ◽  
Sunil Gokhale ◽  
S. M. Chaudhari ◽  
M. G. Takwale ◽  
S. V. Ghaisas

ABSTRACTHydrogenated microcrystalline silicon with oxygen(mc-Si:O:H) is grown using radio frequency glow discharge method. Oxygen is introduced during growth by varying it's partial pressure in the growth chamber. The crystalline volume fraction ‘f’ and the crystallite size ‘δ’ are found to vary with the oxygen content. Results indicate that oxygen can etch the silicon surface when present in low amount while it forms a-SiO2-x with increasing contents. Optical absorption studies in the range of 2 to 3 eV suggest that the absorption coefficient ‘α’ lies in between the values of c-Si and a-Si:H.being closer to a-Si:H. The Hall mobility measurements for these samples indicate that for optimum oxygen contents the mobility as high as 35 cm2 V-1 sec-1 can be obtained. Results on I-V characteristics for p-i-n structure are presented.


2002 ◽  
Vol 715 ◽  
Author(s):  
R. E. I. Schropp ◽  
Y. Xu ◽  
E. Iwaniczko ◽  
G. A. Zaharias ◽  
A. H. Mahan

AbstractWe have explored which deposition parameters in Hot Wire CVD have the largest impact on the quality of microcrystalline silicon (μc-Si) made at deposition rates (Rd) < 10 Å/s for use in thin film solar cells. Among all parameters, the filament temperature (Tfil) appears to be crucial for making device quality films. Using two filaments and a filament-substrate spacing of 3.2 cm, μc-Si films, using seed layers, can be deposited at high Tfil (∼2000°C) with a crystalline volume fraction < 70-80 % at Rd's < 30 Å/s. Although the photoresponse of these layers is high (< 100), they appear not to be suitable for incorporation into solar cells, due to their porous nature. n-i-p cells fabricated on stainless steel with these i-layers suffer from large resistive effects or barriers, most likely due to the oxidation of interconnected pores in the silicon layer. The porosity is evident from FTIR measurements showing a large oxygen concentration at ∼1050 cm-1, and is correlated with the 2100 cm-1 signature of most of the Si-H stretching bonds. Using a Tfil of 1750°C, however, the films are more compact, as seen from the absence of the 2100 cm-1 SiH mode and the disappearance of the FTIR Si-O signal, while the high crystalline volume fraction (< 70-80 %) is maintained. Using this Tfil and a substrate temperature of 400°C, we obtain an efficiency of 4.9 % for cells with a Ag/ZnO back reflector, with an i-layer thickness of only ∼0.7 μm. High values for the quantum efficiency extend to very long wavelengths, with values of 33 % at 800 nm and 15 % at 900 nm, which are unequalled by a-SiGe:H alloys. Further, by varying the substrate temperature to enable deposition near the microcrystalline to amorphous transition (‘edge’) and incorporating variations in H2 dilution during deposition of the bulk, efficiencies of 6.0 % have been obtained. The Rd's of these i-layers are 8-10 Å/s, and are the highest to date obtained with HWCVD for microcrystalline layers used in cells with efficiencies of ∼6 %.


2003 ◽  
Vol 762 ◽  
Author(s):  
T. Allen ◽  
I. Milostnaya ◽  
D. Yeghikyan ◽  
K. Leong ◽  
F. Gaspari ◽  
...  

AbstractIn the D.C. saddle field glow discharge deposition the transition from amorphous to microcrystalline silicon thin films occurs when the silane concentration in the gas phase drops below 10%. We report here the results of Raman spectroscopy, SEM, TEM, and HRTEM studies of the film morphology. We estimate the average crystallite size to be in the range of 5 to 7 nm and the crystalline volume fraction of 25 to 35%.


2006 ◽  
Vol 910 ◽  
Author(s):  
Michael Musashi Adachi ◽  
Wing Fai Lydia Tse ◽  
Garnet Cluff ◽  
Karen L. Kavanagh ◽  
Karim S. Karim

AbstractMicrocrystalline silicon was deposited by hot-wire chemical vapor deposition (HWCVD) using a graphite filament with and without a thin 50 nm microcrystalline silicon seed layer. Increasing silane concentration diluted in H2 led to a decrease in crystalline fraction as well in a decrease in dark conductivity and photo-conductivity. In addition, films deposited with a seed layer were found to have higher dark conductivity and photo-conductivity than those without a seed layer but deposited at slower growth rates. However, Raman spectroscopy showed that use of a seed layer resulted in only a small increase in crystalline fraction at the surface of the films which had thicknesses between 250-400nm. TEM measurements confirmed the crystalline nature of deposited films showing average grain sizes of 25 nm.


2000 ◽  
Vol 609 ◽  
Author(s):  
Takashi Itoh ◽  
Noriyuki Yamana ◽  
Hiroki Inouchi ◽  
Norimitsu Yoshida ◽  
Hidekuni Harada ◽  
...  

ABSTRACTHydrogenated microcrystalline silicon (μc-Si:H) films are prepared by hot-wire assisted plasma enhanced chemical vapor deposition, which controls the hydrogen radical density by filament temperatures, Tf, without changing other conditions. The effect of hydrogen radical on the properties of incorporated hydrogen into μc-Si:H films is studied using infrared absorption and gas effusion spectroscopies. The hydrogen concentration decreases with increasing Tf. The crystalline volume fraction, Xc, increases with Tf and shows a peak at Tf of 1850 °C. Integrated intensities of the modes near 2000 and 2100 cm-1 decrease with increasing Tf. Integrated intensity of the mode near 880 cm-1 shows almost same tendency of Xc. The effect of hydrogen radical on the properties of incorporated hydrogen into μc-Si:H films is discussed.


1997 ◽  
Vol 467 ◽  
Author(s):  
R. Carius ◽  
F. Finger ◽  
U. Backhausen ◽  
M. Luysberg ◽  
P. Hapke ◽  
...  

ABSTRACTThe electronic and optical properties of microcrys tall ine silicon films prepared by plasma enhanced chemical vapour deposition are investigated with Hall-effect, electrical conductivity, photothermal deflection spectroscopy and photoluminescence measurements. In particular, the influence of the grain size and the crystalline volume fraction on the conductivity, the carrier density and the Hall mobility is investigated in highly doped films. A percolation model is proposed to describe the observed transport data. Photoluminescence properties were studied in un-doped films. It is proposed that the photoluminescence is due to recombination at structural defects similar to those observed in crystalline silicon.


2014 ◽  
Vol 2014 ◽  
pp. 1-7 ◽  
Author(s):  
Yen-Tang Huang ◽  
Hung-Jung Hsu ◽  
Shin-Wei Liang ◽  
Cheng-Hang Hsu ◽  
Chuang-Chuang Tsai

Hydrogenated microcrystalline silicon-germanium (μc-Si1-xGex:H) alloys were developed for application in Si-based thin-film solar cells. The effects of thegermane concentration(RGeH4)and thehydrogen ratio(RH2)on theμc-Si1-xGex:H alloys and the corresponding single-junction thin-film solar cells were studied. The behaviors of Ge incorporation in a-Si1-xGex:H andμc-Si1-xGex:H were also compared. Similar to a-Si1-xGex:H, the preferential Ge incorporation was observed inμc-Si1-xGex:H. Moreover, a higherRH2significantly promoted Ge incorporation for a-Si1-xGex:H, while the Ge content was not affected byRH2inμc-Si1-xGex:H growth. Furthermore, to eliminate the crystallization effect, the 0.9 μm thick absorbers with a similar crystalline volume fraction were applied. With the increasingRGeH4, the accompanied increase in Ge content ofμc-Si1-xGex:H narrowed the bandgap and markedly enhanced the long-wavelength absorption. However, the bias-dependent EQE measurement revealed that too much Ge incorporation in absorber deteriorated carrier collection and cell performance. With the optimization ofRH2andRGeH4, the single-junctionμc-Si1-xGex:H cell achieved an efficiency of 5.48%, corresponding to the crystalline volume fraction of 50.5% and Ge content of 13.2 at.%. Compared toμc-Si:H cell, the external quantum efficiency at 800 nm had a relative increase by 33.1%.


1998 ◽  
Vol 507 ◽  
Author(s):  
C. Malten ◽  
R. Carius ◽  
F. Finger ◽  
S. Yamasaki

ABSTRACTUndoped microcrystalline silicon films of high crystalline volume fraction were studied by optically detected magnetic resonance (ODMR). Luminescence energies peak at 0.88 eV and emission at 1.3 eV arising from amorphous tissue is negligible. Recombination involving dangling bonds (g=2.0052, g=2.0043) in disordered regions or crystallites and shallow states near the conduction band (g= 1.998) in the crystalline parts of the material are observed. At temperatures below 30 K a very broad feature of approximately 1000 G width is observed, possibly originating from two separate resonances with high g-values of g=2.1 and g=2.08. We suggest the origin to be of hole-states near or in the valence band. No evidence for excitonic recombination was found. Frequency response indicates ODMR lifetimes of all resonances in the range of 10−5s to 10−4s.


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