Ionized Cluster Beam Epitaxy of Single Crystal Metal Films on Semiconductors and Insulators

1987 ◽  
Vol 93 ◽  
Author(s):  
I. Yamada ◽  
L. L. Levenson ◽  
H. Usui ◽  
T. Takagi
Keyword(s):  
Single Crystal ◽  
Film Formation ◽  
Substrate Surface ◽  
Three Dimensional ◽  
Lattice Misfit ◽  
Cluster Ions ◽  
Mis Structure ◽  
Ionic Charge ◽  
Surface And Interface ◽  
Si Substrates

ABSTRACTOur experiments show that ionized cluster beams (ICB) can form epitaxial Al films on Si(111) and Si(100) substrates. This is unique because the lattice misfit of this material combination is more than 25%. Al can also be epitaxially grown on CaF2 films deposited on Si substrates. The initial stage of the film formation is measured by in-situ electron diffraction. In the case of Al(111) growth on Si(111) and CaF2, growth of mixed layers of different epitaxial islands of approximately 20–50 Angstrom thickness on the substrate surface is observed. With increase of thickness, the film shows the single crystal state with a flat surface, which indicates the epitaxial single crystal film formation on CaF2 or on Si substrates. It should be noted that in the Al/CaF2/Si (MIS) structure, the epitaxial CaF2 is a good insulating layer, which can be used to prepare three dimensional devices. These results show that the kinetic energy and the ionic charge of cluster ions have much influence on surface and interface modification, and that ICB is capable of producing films of good quality at low substrate temperatures.

Formation Mechanism of Epitaxial CoSi2 Films on (001) Si Using Ti-Co Bimetallic Layer Source Materials

1992 ◽  
Vol 280 ◽  
Author(s):  
S. L. Hsia ◽  
T. Y. Tana ◽  
P. L. Smith ◽  
G. E. Mcguire
Keyword(s):  
Film Formation ◽  
Substrate Surface ◽  
Native Oxide ◽  
Formation Processes ◽  
Mechanism Of Formation ◽  
Si Substrate ◽  
Barrier Material ◽  
Si Substrates ◽  
Bimetallic Layer ◽  
Source Materials

ABSTRACTThe mechanism of formation of epitaxial CoSi2 film on (001) Si substrate, produced using sequentially deposited Ti-Co bimetallic layer source materials for which Ti was deposited onto the Si substrates first, has been studied by observing the Co silicide formation processes and structures in samples prepared by isochronal annealing and by isothermal annealing. The results demonstrated that, in leading to epitaxial CoSi2 film formation, Ti has played two roles. It has served as a barrier material to Co atoms and thus preventing Co2Si from forming. More importantly, it has allowed nucleation and growth of epitaxial-CoSi2 to dominate the Co silicide film formation process, apparently because it has served as a cleanser to remove native oxide from the Si substrate surface.

Growth Behavior of Au on Semiconductor and Insulating Substrates

1985 ◽  
Vol 47 ◽  
Author(s):  
E. I. Alessandrini ◽  
M. O. Aboelfotoh ◽  
R. B. Laibowltz ◽  
J. A. Lacey
Keyword(s):  
Single Crystal ◽  
Substrate Surface ◽  
Electron Beam Evaporation ◽  
Growth Behavior ◽  
Tem Analysis ◽  
Si Substrates ◽  
Transmission Electron ◽  
Substrate Surface Roughness ◽  
Amorphous Si ◽  
Deposition Conditions

ABSTRACTThere is a great deal of interest in forming Au grains on semiconductor and insulating substratcs for device application. Reduction in density of grain boundaries is known to cause improvement of clectromigration in thin films. Transmission electron microscopy and diffraction have been used to study the growth behavior and morphology of vapor deposited Au on these substrates. Electron beam evaporation techniques were used to evaporate Au at high rates (50Å/sec or higher) on substrates held at low temperature (Rm. Temp. to 250°C). Large Au grains laave been found to form on both amorphous (Si3N4 and SiO2) and single crystal Si substrates. The grain size of Au was also found to be dependent on substrate surface roughness; rough surfaces tended to retard the formation of large grains. Grains as large as 1/2 μ in a matrix of smaller ones were observed in films as thin as 350Å Annealing up to 350°C, subsequent to deposition, did not appreciably increase the size of the larger grains, although the smaller ones grew by about 10%. The TEM analysis together with RBS and AES data showed no significant interaction between Au and Si (that is to say no atomic intermixing or silicide formation) under all deposition conditions as well as annealing heat treatments. The significance of this in relation to the growth behavior of Au on the insulating and single crystal Si substrates will be shown.

Effects of substrate quality and annealing on defect structures at GaAs/Si interfaces

1987 ◽  
Vol 45 ◽  
pp. 340-341
Author(s):  
H. L. Tsai ◽  
J. W. Lee
Keyword(s):  
Growth Process ◽  
Molecular Beam ◽  
Substrate Surface ◽  
Lattice Misfit ◽  
Device Fabrication ◽  
Silicon Substrates ◽  
Defect Structures ◽  
Gaas Film ◽  
Substrate Quality ◽  
Gaas On Si

Growth of GaAs on Si using epitaxial techniques has been receiving considerable attention for its potential application in device fabrication. However, because of the 4% lattice misfit between GaAs and Si, defect generation at the GaAs/Si interface and its propagation to the top portion of the GaAs film occur during the growth process. The performance of a device fabricated in the GaAs-on-Si film can be degraded because of the presence of these defects. This paper describes a HREM study of the effects of both the substrate surface quality and postannealing on the defect propagation and elimination.The silicon substrates used for this work were 3-4 degrees off [100] orientation. GaAs was grown on the silicon substrate by molecular beam epitaxy (MBE).

Epitaxial ferroelectric thin films

1994 ◽  
Vol 52 ◽  
pp. 572-573
Author(s):  
S. G. Ghonge ◽  
E. Goo ◽  
R. Ramesh ◽  
R. Haakenaasen ◽  
D. K. Fork
Keyword(s):  
Single Crystal ◽  
Work Function ◽  
Nonvolatile Memory ◽  
Ferroelectric Properties ◽  
Electrical Contact ◽  
Memory Devices ◽  
Ferroelectric Films ◽  
Si Substrates ◽  
Electro Optic ◽  
Wide Range

Microstructure of epitaxial ferroelectric/conductive oxide heterostructures on LaAIO3(LAO) and Si substrates have been studied by conventional and high resolution transmission electron microscopy. The epitaxial films have a wide range of potential applications in areas such as non-volatile memory devices, electro-optic devices and pyroelectric detectors. For applications such as electro-optic devices the films must be single crystal and for applications such as nonvolatile memory devices and pyroelectric devices single crystal films will enhance the performance of the devices. The ferroelectric films studied are Pb(Zr0.2Ti0.8)O3(PLZT), PbTiO3(PT), BiTiO3(BT) and Pb0.9La0.1(Zr0.2Ti0.8)0.975O3(PLZT).Electrical contact to ferroelectric films is commonly made with metals such as Pt. Metals generally have a large difference in work function compared to the work function of the ferroelectric oxides. This results in a Schottky barrier at the interface and the interfacial space charge is believed to responsible for domain pinning and degradation in the ferroelectric properties resulting in phenomenon such as fatigue.

Silicon layers grown over SiO2 by liquid phase epitaxy: Electron Microscopical study

1990 ◽  
Vol 48 (4) ◽  
pp. 566-567
Author(s):  
F. Banhart ◽  
F.O. Phillipp ◽  
R. Bergmann ◽  
E. Czech ◽  
M. Konuma ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Liquid Phase ◽  
Plasma Etching ◽  
Liquid Phase Epitaxy ◽  
Three Dimensional ◽  
Microscopical Study ◽  
Sample Temperature ◽  
Structural Defects ◽  
Si Substrates ◽  
Etched Surface

Defect-free silicon layers grown on insulators (SOI) are an essential component for future three-dimensional integration of semiconductor devices. Liquid phase epitaxy (LPE) has proved to be a powerful technique to grow high quality SOI structures for devices and for basic physical research. Electron microscopy is indispensable for the development of the growth technique and reveals many interesting structural properties of these materials. Transmission and scanning electron microscopy can be applied to study growth mechanisms, structural defects, and the morphology of Si and SOI layers grown from metallic solutions of various compositions.The treatment of the Si substrates prior to the epitaxial growth described here is wet chemical etching and plasma etching with NF3 ions. At a sample temperature of 20°C the ion etched surface appeared rough (Fig. 1). Plasma etching at a sample temperature of −125°C, however, yields smooth and clean Si surfaces, and, in addition, high anisotropy (small side etching) and selectivity (low etch rate of SiO2) as shown in Fig. 2.

Structure and Thermoelectric Properties of New Quaternary Tin and Lead Bismuth Selenides, K1+xM4-2xBi7+xSe15 (M = Sn, Pb) and K1+xSn5-xBi11+xSe22

2000 ◽  
Vol 626 ◽  
Author(s):  
Antje Mrotzek ◽  
Kyoung-Shin Choi ◽  
Duck-Young Chung ◽  
Melissa A. Lane ◽  
John R. Ireland ◽  
...  
Keyword(s):  
Thermal Conductivity ◽  
Single Crystal ◽  
Thermoelectric Properties ◽  
Three Dimensional ◽  
Structure Type ◽  
Narrow Gap ◽  
Low Thermal Conductivity ◽  
Seebeck Coefficients ◽  
Metal Atoms ◽  
Anionic Framework

ABSTRACTWe present the structure and thermoelectric properties of the new quaternary selenides K1+xM4–2xBi7+xSe15 (M = Sn, Pb) and K1-xSn5-xBi11+xSe22. The compounds K1+xM4-2xBi7+xSe15 (M= Sn, Pb) crystallize isostructural to A1+xPb4-2xSb7+xSe15 with A = K, Rb, while K1-xSn5-xBi11+xSe22 reveals a new structure type. In both structure types fragments of the Bi2Te3-type and the NaCl-type are connected to a three-dimensional anionic framework with K+ ions filled tunnels. The two structures vary by the size of the NaCl-type rods and are closely related to β-K2Bi8Se13 and K2.5Bi8.5Se14. The thermoelectric properties of K1+xM4-2xBi7+xSe15 (M = Sn, Pb) and K1-xSn5-xBi11+xSe22 were explored on single crystal and ingot samples. These compounds are narrow gap semiconductors and show n-type behavior with moderate Seebeck coefficients. They have very low thermal conductivity due to an extensive disorder of the metal atoms and possible “rattling” K+ ions.

scholarly journals An investigation of polyhedral deformation in two mixed-metal diarsenates: SrZnAs2O7and BaCuAs2O7

2015 ◽  
Vol 71 (4) ◽  
pp. 330-337 ◽  
Author(s):  
Sabina Kovač ◽  
Ljiljana Karanović ◽  
Tamara Đorđević
Keyword(s):  
Crystal Structure ◽  
Single Crystal ◽  
General Formula ◽  
Three Dimensional ◽  
X Ray Diffraction ◽  
Hydrothermal Conditions ◽  
X Ray ◽  
Open Framework ◽  
Geometrical Characteristics ◽  
Barium Copper

Two isostructural diarsenates, SrZnAs2O7(strontium zinc diarsenate), (I), and BaCuAs2O7[barium copper(II) diarsenate], (II), have been synthesized under hydrothermal conditions and characterized by single-crystal X-ray diffraction. The three-dimensional open-framework crystal structure consists of corner-sharingM2O5(M2 = Zn or Cu) square pyramids and diarsenate (As2O7) groups. Each As2O7group shares its five corners with five differentM2O5square pyramids. The resulting framework delimits two types of tunnels aligned parallel to the [010] and [100] directions where the large divalent nine-coordinatedM1 (M1 = Sr or Ba) cations are located. The geometrical characteristics of theM1O9,M2O5and As2O7groups of known isostructural diarsenates, adopting the general formulaM1IIM2IIAs2O7(M1II= Sr, Ba, Pb;M2II= Mg, Co, Cu, Zn) and crystallizing in the space groupP21/n, are presented and discussed.

scholarly journals Fabrication of Eutectic Ga-In Nanowire Arrays Based on Plateau–Rayleigh Instability

Molecules ◽  
2021 ◽  
Vol 26 (15) ◽  
pp. 4616
Author(s):  
Takashi Ikuno ◽  
Zen Somei
Keyword(s):  
Integrated Circuits ◽  
Substrate Surface ◽  
Three Dimensional ◽  
Average Diameter ◽  
Nanowire Arrays ◽  
Scanning Probe ◽  
Rayleigh Instability ◽  
Simple Method ◽  
Flat Substrate ◽  
Metal Nanowire

We have developed a simple method of fabricating liquid metal nanowire (NW) arrays of eutectic GaIn (EGaIn). When an EGaIn droplet anchored on a flat substrate is pulled perpendicular to the substrate surface at room temperature, an hourglass shaped EGaIn is formed. At the neck of the shape, based on the Plateau–Rayleigh instability, the EGaIn bridge with periodically varying thicknesses is formed. Finally, the bridge is broken down by additional pulling. Then, EGaIn NW is formed at the surface of the breakpoint. In addition, EGaIn NW arrays are found to be fabricated by pulling multiple EGaIn droplets on a substrate simultaneously. The average diameter of the obtained NW was approximately 0.6 μm and the length of the NW depended on the amount of droplet anchored on the substrate. The EGaIn NWs fabricated in this study may be used for three-dimensional wiring for integrated circuits, the tips of scanning probe microscopes, and field electron emission arrays.

Aligned single crystal Al-catalyzed boron nanorods on Si substrates

2007 ◽  
Vol 56 (1) ◽  
pp. 35-39 ◽  
Author(s):  
Qing Yang ◽  
Jian Sha ◽  
Lei Wang ◽  
Zhizhong Yuan ◽  
Deren Yang
Keyword(s):  
Single Crystal ◽  
Si Substrates
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