Magnetron Sputtering Deposition of Calcium Phosphate Films with Nanoscale Grain Morphology in their Surface

2006 ◽  
Vol 975 ◽  
Author(s):  
Wilfredo Otaño ◽  
Víctor M. Pantojas ◽  
Juan M. Figueroa ◽  
Darimar Hernández ◽  
Alejandro Rodríguez-Navarro

ABSTRACTHydroxyapatite (HA) is a calcium phosphate mineral analogous to the mineral part of bone. This similarity makes this material bioactive and suitable to coat medical implants. However, at present, there is not a coating technique which gives the coated implant the desired properties and long life required for medical implants.In an effort to produce HA coatings with improved properties, calcium phosphate films were prepared using magnetron sputtering deposition on a silicon substrate at 600°C. Initial efforts resulted in the deposition of amorphous films with a distinctive grain-like surface morphology. The morphological grain size was studied using SEM and found that it was possible to control the average diameter value of the round shaped grains by adjusting the deposition time. Increasing the deposition time increases the mean grain diameter. EDS spectra showed the unintentional addition of carbon, iron and nickel to the samples during deposition. After eliminating the impurities, it was possible to prepare calcium phosphate films in the HA phase but without the grain-like surface morphology. These results suggested that the impurities prevented the formation of the calcium phosphate HA phase while acting as nuclei for the heterogeneous nucleation of the grains. This is an important result where the deposition process parameters can be controlled to functionalize the films in order to produce distinctive nanoscale features in the surface morphology.

2015 ◽  
Vol 1131 ◽  
pp. 251-254
Author(s):  
Montri Aiempanakit ◽  
Chantana Salawan ◽  
Kamon Aiempanakit

The effect of continuous and discontinuous deposition time on the properties of TiO2 thin films deposited by reactive direct current magnetron sputtering (DCMS) on glass substrates was investigated. The deposition processes were designed for a condition of continuous deposition time D1 (60 min) and three conditions of discontinuous deposition time D2 (30 min × 2 times), D3 (15 min × 4 times), and D4 (1 min × 60 times). The crystal structure, surface morphology, and hydrophilicity of TiO2 thin films were characterized by X-ray diffraction, atomic force microscope, and water contact angle method, respectively. It was found that the increasing of discontinuous deposition time (conditions from D1 to D4) shows the changing of grain size from big grain size with spherical shape to small grain size with oval shape. The crystallinity of TiO2 films decrease with increasing the discontinuous deposition time. The water contact angles also decrease as a function of increasing discontinuous deposition time. These results may be explained from the accumulation of heat on the substrate which affected the phase composition and surface morphology of TiO2 thin films.


2013 ◽  
Vol 667 ◽  
pp. 530-533
Author(s):  
L. Helena ◽  
A.A. Azira ◽  
Mohamad Rusop

Carbon nanotubes (CNTs) were produced on silicon (Si) substrate prepared by Thermal-CVD method using C55H96O6 (Palm Oil) as a starting material. Catalyst has been prepared by dissolving Nickel (II) nitrate, Ni (NO3)2.6H2O and ethyl alcohol, C2H5OH. Before the deposition process, silicon was coated with Nickel using spin coater. Various parameters such as amount of catalyst, amount of palm oil, deposition time, deposition temperature, flow rate of gas and carrier gas have been studied. By using Thermal-CVD, samples were penetrated using NH3 (argon) gas at a temperature 700 - 900oC for catalyst and 450oC for palm oil. Surface morphology and uniformity of CNTs were characterized using FESEM at different deposition temperature. Chemical functional groups of CNTs were characterized using FTIR. The surface morphology and uniformity of CNTs are dependents on parameters used.


2008 ◽  
Vol 587-588 ◽  
pp. 323-327 ◽  
Author(s):  
Pedro M.P. Salomé ◽  
António F. da Cunha

Cu(In,Ga)Se2 (CIGS) thin film semiconductors are among the most attractive materials for thin film solar cell applications. Conversion efficiency exceeding 19% has been achieved for CIGS absorber layers deposited by three-stage co-evaporation technique. From a technological point of view the sputtering deposition process is more attractive than thermal co-evaporation, however, solar cell parameters obtained so far are worse. The highest efficiency value reported for co-sputtered CIS thin films is less than 8% and there is no data found for CIGS layers produced by a similar technique. We have developed a hybrid RF-magnetron sputtering/evaporation method for the deposition of the CIGS absorber layer. In this method Cu and In are sequentially sputtered from metallic targets in the presence of Se vapour. Ga depth profiling leads to a band gap grading which is known to play an important role in cell performance. Here, we report the results of our work on three different ways of Ga incorporation into the CIGS thin films. They consisted of sputtering from In-GaSe, Cu-GaSe composite targets and Ga evaporation. The Ga content and distribution across the layer thickness was investigated by AES measurements. The CIGS formation kinetics, structural and compositional studies were performed by SEM, XRD and AES measurements.


2017 ◽  
Vol 4 (5) ◽  
pp. 6372-6380 ◽  
Author(s):  
P. Premphet ◽  
M. Prasoetsri ◽  
D. Boonyawan ◽  
R. Supruangnet ◽  
S. Udomsom ◽  
...  

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