scholarly journals High Speed Deposition of Amorphous Silicon Film by Atmospheric Pressure Plasma Chemical Vapor Deposition (3rd Report). Electrical and Optical Properties of a-Si Films Fabricated at Very High Deposition Rate.

2001 ◽  
Vol 67 (5) ◽  
pp. 829-833
Author(s):  
Yuzo MORI ◽  
Kumayasu YOSHII ◽  
Kiyoshi YASUTAKE ◽  
Hiroaki KAKIUCHI ◽  
Seiichi KIYAMA ◽  
...  
Keyword(s):  
High Speed ◽  
Silicon Film ◽  
Atmospheric Pressure Plasma ◽  
Chemical Vapor ◽  
High Deposition Rate ◽  
Plasma Chemical ◽  
Electrical And Optical Properties ◽  
Plasma Chemical Vapor Deposition ◽  
Si Films ◽  
Very High

404 The high-speed and large-area synthesis of diamond using in-liquid plasma chemical vapor deposition

2009 ◽  
Vol 2009.47 (0) ◽  
pp. 101-102
Author(s):  
Yohei Ishimaru ◽  
Shinfuku Nomura ◽  
Hiromichi Toyota ◽  
Yoshiyuki Takahashi ◽  
Shinobu Mukasa
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Speed ◽  
Chemical Vapor ◽  
Large Area ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition
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