scholarly journals Deposition of a titanium carbonitride coating by magnetron sputtering on a substrate with a potential voltage

2021 ◽  
Author(s):  
A.A. Mamaeva ◽  
◽  
A.V. Panichkin ◽  
A.K. Kenzhegulov ◽  
B.B. Kshibekova ◽  
...  
Keyword(s):  
Wear Resistance ◽  
Friction Coefficient ◽  
Magnetron Sputtering ◽  
Protective Coatings ◽  
Titanium Carbonitride ◽  
Negative Bias ◽  
Reactive Magnetron ◽  
Negative Bias Voltage ◽  
Friction Units ◽  
Optimal Mode

Titanium carbonitride (TiCN) is of high relevance in the field of creating wear-resistant protective coatings in order to ensure maximum wear resistance and service life of parts of friction units. Titanium carbonitride coatings were obtained by magnetron sputtering at various bias substrate in the range from 0 to -130 V with a step of 10 V. The effect of the bias substrate on the deposition rate, phase and elemental composition, and the friction coefficient of the obtained coatings was investigated. As a result of the obtained dependences, the most optimal mode of deposition by the method of reactive magnetron sputtering with a negative bias voltage on the substrate was determined.

Study on Interfacial Bonding Strength of TiN Films Prepared by Magnetron Sputtering at Low Temperature

2008 ◽  
Vol 373-374 ◽  
pp. 155-158
Author(s):  
X.Q. Bai ◽  
J. Li
Keyword(s):  
Surface Roughness ◽  
Magnetron Sputtering ◽  
Bonding Strength ◽  
Negative Bias ◽  
Reactive Magnetron ◽  
Negative Bias Voltage ◽  
Tin Films ◽  
Tin Film ◽  
Interfacial Bonding Strength ◽  
Substrate Hardness

Reactive magnetron sputtering technique was used to gain titanium nitride (TiN) films on W18Cr4V high-speed steel and GCr15 bearing steel substrates at low temperature. The Surface chemical composition of the films was analyzed using energy dispersive X-ray spectroscopy (EDXS) and the surface morphology was examined using atomic force microscopy (AFM). Moreover, a series of experiments have been conducted to study the relationship between interfacial bonding strength and some major technological parameters, that is, substrate surface roughness, negative bias voltage, intermediate transition layer, substrate hardness, and ion etching before deposition. The experimental results have indicated that the TiN film with typical ratio of chemical metric can be deposited on substrates using reactive magnetron sputtering technique below 140°C. The AFM image has showed that the TiN film using magnetron sputtering technique was composed of densely distributed nano-grains with uniform structure. Its surface was flat and smooth. The indentation testing results have showed that the increase of surface roughness and substrate hardness improves the bonding strength of TiN / substrate significantly. Furthermore, the bonding strength of TiN / substrate can also be improved through the following methods: (1) choosing a proper intermediate transition layer; (2) adopting ion etching before deposition and (3) increasing negative bias voltage before deposition.

Effects of Substrate Bias Voltage on the Microstructure of Cr-Al-N Coatings

2008 ◽  
Vol 373-374 ◽  
pp. 167-171 ◽  
Author(s):  
Ming Zhu ◽  
Shu Wang Duo ◽  
Tian Peng Li ◽  
Mei Shuan Li ◽  
Yan Chun Zhou
Keyword(s):  
Grain Size ◽  
Bias Voltage ◽  
Failure Load ◽  
Lattice Parameter ◽  
Preferred Orientation ◽  
Negative Bias ◽  
Substrate Bias ◽  
Reactive Magnetron ◽  
Negative Bias Voltage ◽  
Substrate Bias Voltage

Cr-Al-N coatings with the thickness of about 2 μm have been prepared by a reactive magnetron sputtering method. The effects of substrate negative bias voltage (VB) on the microstructure and critical failure load have been investigated as the VB varied from 0 to –150 V. With VB increasing, grain size, lattice parameter and microstrain increase. (111) preferred orientation dominates in the coatings deposited under 0 and –50 V, while a (200) preferred orientation developed when VB further raised. The reasons for these variation caused by VB are discussed.

Deposition and Characterization of C-NbN/NbCN Multilayers on Si(100) Substrates

2017 ◽  
Vol 898 ◽  
pp. 1447-1452
Author(s):  
Kan Zhang ◽  
X. Li ◽  
Su Xuan Du ◽  
Ping Ren ◽  
Mao Wen ◽  
...  
Keyword(s):  
Friction Coefficient ◽  
Magnetron Sputtering ◽  
Compressive Stress ◽  
Reactive Magnetron ◽  
Modulated Structure ◽  
Mechanical And Tribological Properties ◽  
Peak Intensity ◽  
Maximum Value ◽  
Mixture Value

The cubic-NbN/NbCN multilayers with modulation periodicity (Λ) ranging from 4.2 to 39.1 nm were deposited on Si (100) substrate by reactive magnetron sputtering in a mixture of Ar and N2 gases. The Λ dependent structural, mechanical and tribological properties for resulting c-NbN/NbCN multilayers were explored. As Λ varied from 4.2 to 39.1 nm, all the films exhibited an obvious modulated structure. Increasing the Λ, the Nb (C,N)(111) peak in XRD gradually shifted to bigger angles and the peak intensity of NbN(111) became stronger. The stress for all multilayers was compressive ranging in between the stress for both NbN and NbCN single layers, and the stress value was stable with increasing Λ. The NbN layer was beneficial to relaxing the compressive stress which induced by NbCN layer. In addition, as Λ increases, the hardness (H) first increased, and then decreased after reaching a maximum value. The obvious enhancement in hardness for multilayers was observed, whose maximum value approaches 43.3 GPa when Λ = 8.4 nm, 37% larger than that obtained by the rule of mixture value. The friction coefficient values of NbN/NbCNmultilayers ranging between 0.34 and 0.4 were much lower than that of NbN monolayer but higher than that of NbCN monolayer were.

scholarly journals Tribological Properties of PVD Carbon-Copper Composite Films Reinforced by Titanium

2016 ◽  
Vol 53 (1) ◽  
pp. 66-74
Author(s):  
J. Lungevics ◽  
A. Leitans ◽  
J. Rudzitis ◽  
N. Bulahs ◽  
P. Nazarovs ◽  
...  
Keyword(s):  
Wear Resistance ◽  
Friction Coefficient ◽  
Wear Rate ◽  
Magnetron Sputtering ◽  
Measuring Equipment ◽  
Composite Coatings ◽  
Composite Films ◽  
Wear Volume ◽  
Copper Composite ◽  
In The Beginning

Abstract Carbon-copper composite coatings reinforced with titanium were deposited using high power magnetron sputtering technique. Tribological and metrological tests were performed using Taylor Hobson Talysurf Intra 50 measuring equipment and CSM Instruments ball-on-disk type tribometer. Friction coefficient and wear rate were determined at 2N, 4N, 6N loads. It was revealed that friction coefficient decreased at a higher Ti concentration, which was particularly expressed at bigger applied loads. However, wear volume values tended to increase in the beginning, till Ti concentration reached about 11 %, but then decreased, thus providing better nanocoating wear resistance.

scholarly journals RESULTS OF MECHANICAL RESISTANCE TEST OF LABORATORY SAMPLES COATING APPLIED BY LASER DEPOSITION

2016 ◽  
pp. 77-83
Author(s):  
S. A. Frolov ◽  
V. N. Svetashov ◽  
D. D. Vodorezov ◽  
D. S. Leontiev ◽  
O. M. Stolbova
Keyword(s):  
Wear Resistance ◽  
Friction Coefficient ◽  
Protective Coatings ◽  
Laser Deposition ◽  
Resistance Test ◽  
Mechanical Resistance ◽  
Relative Wear ◽  
Relative Wear Resistance ◽  
Application Methods ◽  
Laboratory Specimen

The article analyzes the results of tests of mechanical resistance of laboratory specimen coating applied by laser deposition. Based on the analysis a conclusion is drawn about the effect of protective coatings and their application methods on the friction coefficient and relative wear resistance.

The investigation on the microstructure of magnetron sputtering ion plated Al/Cu film: The effect of substrate negative bias voltage

1988 ◽  
Vol 22 (6) ◽  
pp. 757-760 ◽  
Author(s):  
B.Q. Chen ◽  
F.J. Wang ◽  
Y.K. Wang ◽  
J.X. Wang ◽  
H.M. Han ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Negative Bias ◽  
Negative Bias Voltage ◽  
Cu Film

EVALUATION OF CRACK INITIATION AND FATIGUE BEHAVIOR OF CrN FILM DEPOSITED ON Ti-6Al-4V ALLOY

2010 ◽  
Vol 24 (15n16) ◽  
pp. 2502-2505 ◽  
Author(s):  
MD. SHAMIMUR RAHMAN ◽  
TAKESHI KATSUMA ◽  
DAISUKE YONEKURA ◽  
RI-ICHI MURAKAMI
Keyword(s):  
Wear Resistance ◽  
Titanium Alloy ◽  
Fatigue Strength ◽  
Tensile Test ◽  
Fatigue Test ◽  
Bias Voltage ◽  
Fatigue Behavior ◽  
Fatigue Properties ◽  
Negative Bias ◽  
Negative Bias Voltage

Titanium alloy has an attractive strength-to-weight ratio and good fatigue properties. However, the titanium alloy has very poor wear resistance, therefore, surface treatments must be considered in order to make the contact parts. Hard thin film deposited by PVD technique is well-known to improve the wear resistance. In this study, chromium nitride ( CrN ) film was applied to titanium alloy and its effect on the fatigue behavior was investigated. Ti -6 Al -4 V alloy was used as a substrate material. The CrN film was deposited by arc ion plating (AIP) method at two different negative bias voltages because the film hardness, crystal orientation and surface morphology were strongly depended on the bias voltage during the deposition. Tension-tension fatigue test and tensile test were carried out to investigate the fatigue properties. As the result, the fatigue strength was influenced by the deposition of the CrN film, especially, the fatigue strength was remarkable decreased by the deposition of the CrN film at high negative bias voltage compared to the uncoated specimen and the deposition of the CrN at low negative bias voltage. The difference of the fatigue strength was also investigated on the basis of crack initiating behavior during fatigue test and tensile test.

W-Doped DLC Films by IBD and MS

2010 ◽  
Vol 434-435 ◽  
pp. 477-480 ◽  
Author(s):  
Zhi Qiang Fu ◽  
Cheng Biao Wang ◽  
Wei Wang ◽  
Zhi Jian Peng ◽  
Xiang Yu ◽  
...  
Keyword(s):  
Wear Resistance ◽  
Friction Coefficient ◽  
Magnetron Sputtering ◽  
Ion Beam ◽  
Ion Beam Deposition ◽  
Minimum Value ◽  
Substrate Adhesion ◽  
Film Substrate ◽  
Beam Deposition ◽  
And Tungsten

W-doped DLC films were synthesized from ethyne and tungsten by ion beam deposition and magnetron sputtering, and the influence of W target current on the structures and the properties of W-doped DLC films were studied. There exist some defects smaller than 3micron in W-doped DLC films and the influence of W target current on the defects is unobvious. The W content in the films is tardily increased with W target current below 3.5A, and then acutely rises with W target current. When target current is below 3.5A, the ratio of sp3-C to sp2-C is first decreased and then increased with the rise of target current, and the ratio of WC-C to sp2-C is close to 0; but when the target is above 3.5A, the ratio of sp3-C to sp2-C is decreased and the ratio of WC-C to sp2-C is augmented with further increasing target current. The hardness and the modulus is first decreased with target current and the minimum value is reached for the W-doped DLC films deposited with a target current of 2.6A. The W-doped DLC films deposited with a target current of 2.6A exhibit the best film-substrate adhesion. The W-doped DLC films deposited with a low target current exhibit a friction coefficient while the wear resistance of the W-doped DLC films deposited with a medium target current of 2.6A is best.

Stresses in Amorphous Gd-Fe Alloy Thin Films Deposited by Magnetron Sputtering

1990 ◽  
Vol 188 ◽  
Author(s):  
Zhi-Feng Zhou ◽  
Qi-Gang Zhou ◽  
Yu-Dian Fan
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Compressive Stress ◽  
Bias Voltage ◽  
Negative Bias ◽  
Negative Bias Voltage ◽  
Working Pressure ◽  
Planar Magnetron ◽  
Very High ◽  
High Working Pressure

ABSTRACTAmorphous Gd-Fe alloy thin films were made by D.C. planar magnetron sputtering under various deposition conditions (e.g., film thickness, composition, working pressure of Ar, negative bias voltage and deposition rate). The stress, the film composition and the content of entrapped Ar in the films were measured respectively. The experimental results showed that in this case the working pressure of Ar and the negative bias voltage did not change the composition of the films, and the stresses were all compressive except for the films deposited in a very high working pressure of Ar. The origin of the compressive stress can be attributed to the atomic peening effect produced by fast neutral working gas atoms rebounded from the sputtering target. The magnitude of the compressive stress depends not only on the amount of Ar atoms incorporated in the films but also on the film microstructure such as the packing density.

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