scholarly journals Electrical and Spectroscopic Diagnostics of Atmospheric Pressure DBD Plasma Jet

2016 ◽  
Vol 40 (1) ◽  
pp. 23-36
Author(s):  
NC Roy ◽  
MR Talukder
Keyword(s):  
Flow Rate ◽  
Applied Voltage ◽  
Atmospheric Pressure ◽  
Gas Flow ◽  
Optical Emission ◽  
Plasma Jet ◽  
Diagnostic Techniques ◽  
Gas Temperature ◽  
Gas Flow Rate ◽  
Dbd Plasma

Atmospheric pressure capillary dielectric barrier oxygen discharge plasma jet is developed to generate nonthermal plasma using unipolar positive pulse power supply. Both electrical and optical diagnostic techniques were used to characterize the produced plasma as functions of applied voltage and gas flow rate. Electrical diagnostics indicated that the discharge frequency decreased with gas flow rate but increased with the applied voltage. Analytical results obtained from the optical emission spectroscopic data revealed the gas temperature, excitation temperature and electron density. Gas temperature was found to decrease with increasing oxygen flow rate but increase linearly with applied voltage. The produced plasma was applied preliminarily to study the inactivation yield of Fusarium oxysporum fungus infected potato samples.Journal of Bangladesh Academy of Sciences, Vol. 40, No. 1, 23-36, 2016

scholarly journals Effects of Gas Flow on Spectral Properties of Plasma Jet Induced by Microwave

2018 ◽  
Vol 15 (1) ◽  
pp. 81-86 ◽  
Author(s):  
Baghdad Science Journal
Keyword(s):  
Flow Rate ◽  
Applied Voltage ◽  
Gas Flow ◽  
Microwave Plasma ◽  
Plasma Jet ◽  
Gas Temperature ◽  
Gas Flow Rate ◽  
Argon Gas ◽  
Jet Length ◽  
Maximum Value

In this paper, a construction microwave induced plasma jet(MIPJ) system was used to produce a non-thermal plasma jet at atmospheric pressure, at standard frequency of 2.45 GHz and microwave power of 800 W. The working gas Argon (Ar) was supplied to flow through the torch with adjustable flow rate using flow meter regulator. The influence of the MIPJ parameters such as applied voltage and argon gas flow rate on macroscopic microwave plasma parameters were studied. The macroscopic parameters results show increasing of microwave plasma jet length with increasing of applied voltage, argon gas flow rate where the plasma jet length exceed 12 cm as maximum value. While the increasing of argon gas flow rate will cause increasing into the argon gas temperature, where argon gas temperature the exceed 350 ? as maximum value and study the effect of gas flow rate on the optical properties

Investigation of a Plasma Jet Generated by High Voltage Discharge at Atmospheric Pressure

2011 ◽  
Vol 383-390 ◽  
pp. 5907-5911 ◽  
Author(s):  
Xue Chen Li ◽  
Ning Yuan ◽  
Peng Ying Jia
Keyword(s):  
Flow Rate ◽  
High Voltage ◽  
Discharge Current ◽  
Applied Voltage ◽  
Atmospheric Pressure ◽  
Gas Flow ◽  
Plasma Plume ◽  
Gas Temperature ◽  
Gas Flow Rate ◽  
Uniform Plasma

Appling a high voltage to the dielectric barrier discharge device in a coaxial geometry in flowing argon, a uniform plasma plume is generated at one atmospheric pressure. The waveforms of discharge current and the applied voltage are investigated and results indicate that both the intensity and duration width of the discharge current pulse increase with increasing the applied voltage. The gas temperature of the plasma plume is investigated by using an infrared thermometer. The gas temperature of the plasma plume are functions of gas flow rate, peak value and the frequency of the applied voltage. Results show that the gas temperature increases with increasing the applied voltage or its frequency, while it decreases with increasing the gas flow rate. A qualitative explanation is given for the variance of gas temperature as functions of the experimental parameters by analyzing the waveforms of the discharge current and the applied voltage.

Studying of Plasma- Polymerized Pyrrole at Variable Gas Flow Rates Via Plasma Jet

2021 ◽  
Vol 19 (48) ◽  
pp. 44-51
Author(s):  
Saba Jawad Kadhem
Keyword(s):  
Flow Rate ◽  
Atmospheric Pressure ◽  
Gas Flow ◽  
Flow Characteristics ◽  
Atmospheric Pressure Plasma ◽  
Optical Emission ◽  
Plasma Jet ◽  
Nonequilibrium Plasma ◽  
Nano Particles ◽  
Vis Spectroscopy

     In this manuscript has investigated the synthesis of plasma-polymerized pyrrole (C4H5N) nano-particles prepared by the proposed atmospheric pressure nonequilibrium plasma jet through the parametric studies, particularly gas flow rate (0.5, 1 and 1.5 L/min). The plasma jet which used operates with alternating voltage 7.5kv and frequency 28kHz. The plasma-flow characteristics were investigated based on optical emission spectroscopy (OES). UV-Vis spectroscopy was used to characterize the  oxidization  state for polypyrrole. The major absorption appears around 464.1, 449.7 and 435.3  nm at the three flow rate of argon gas. The chemical composition and structural properties of the contained samples which synthesized at 0.5 L/min as a argon flow rate were analyzed by scanning electron microscopy (SEM), Fourier transformation infrared spectroscopy (FTIR), Raman spectroscopy and X-ray diffraction (XRD). SEM point to a uniform distribution of polypyrrole (PPY) nanoparticles matrix. XRD technique showed a semicrystalline pattern for PPY)thin film. It is expected, that the high-quality plasma polymer grown by atmospheric pressure plasma jet method contributes to serving as conducting materials.

The effect of methane gas flow rate on the streamer propagation in an atmospheric-pressure methane-air plasma jet

2018 ◽  
Vol 25 (9) ◽  
pp. 093508 ◽  
Author(s):  
Jinsong Kang ◽  
Muyang Qian ◽  
Gui Li ◽  
Sanqiu Liu ◽  
Chunsheng Ren ◽  
...  
Keyword(s):  
Flow Rate ◽  
Atmospheric Pressure ◽  
Gas Flow ◽  
Plasma Jet ◽  
Air Plasma ◽  
Gas Flow Rate ◽  
Methane Gas ◽  
Streamer Propagation

scholarly journals Atmospheric Pressure Microwave Plasma Jet for Organic Thin Film Deposition

Polymers ◽  
2020 ◽  
Vol 12 (2) ◽  
pp. 354 ◽  
Author(s):  
Mehrnoush Narimisa ◽  
František Krčma ◽  
Yuliia Onyshchenko ◽  
Zdenka Kozáková ◽  
Rino Morent ◽  
...  
Keyword(s):  
Flow Rate ◽  
Atmospheric Pressure ◽  
Gas Flow ◽  
Microwave Plasma ◽  
Plasma Jet ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Organic Thin Film ◽  
Gas Flow Rate ◽  
Homogeneous Surface

In this work, the potential of a microwave (MW)-induced atmospheric pressure plasma jet (APPJ) in film deposition of styrene and methyl methacrylate (MMA) precursors is investigated. Plasma properties during the deposition and resultant coating characteristics are studied. Optical emission spectroscopy (OES) results indicate a higher degree of monomer dissociation in the APPJ with increasing power and a carrier gas flow rate of up to 250 standard cubic centimeters per minute (sccm). Computational fluid dynamic (CFD) simulations demonstrate non-uniform monomer distribution near the substrate and the dependency of the deposition area on the monomer-containing gas flow rate. A non-homogeneous surface morphology and topography of the deposited coatings is also observed using atomic force microscopy (AFM) and SEM. Coating chemical analysis and wettability are studied by XPS and water contact angle (WCA), respectively. A lower monomer flow rate was found to result in a higher C–O/C–C ratio and a higher wettability of the deposited coatings.

scholarly journals Heterogeneous Bonding of PMMA and Double-Sided Polished Silicon Wafers through H2O Plasma Treatment for Microfluidic Devices

Coatings ◽  
2021 ◽  
Vol 11 (5) ◽  
pp. 580
Author(s):  
Chao-Ching Chiang ◽  
Philip Nathaniel Immanuel ◽  
Yi-Hsiung Chiu ◽  
Song-Jeng Huang
Keyword(s):  
Plasma Treatment ◽  
Flow Rate ◽  
Gas Flow ◽  
Treatment Time ◽  
Optical Emission ◽  
Microfluidic Devices ◽  
Oh Radicals ◽  
Gas Flow Rate ◽  
Oh Groups ◽  
Plasma Treatment Time

In this work we report on a rapid, easy-to-operate, lossless, room temperature heterogeneous H2O plasma treatment process for the bonding of poly(methyl methacrylate) (PMMA) and double-sided polished (DSP) silicon substrates by for utilization in sandwich structured microfluidic devices. The heterogeneous bonding of the sandwich structure produced by the H2O plasma is analyzed, and the effect of heterogeneous bonding of free radicals and high charge electrons (e−) in the formed plasma which causes a passivation phenomenon during the bonding process investigated. The PMMA and silicon surface treatments were performed at a constant radio frequency (RF) power and H2O flow rate. Changing plasma treatment time and powers for both processes were investigated during the experiments. The gas flow rate was controlled to cause ionization of plasma and the dissociation of water vapor from hydrogen (H) atoms and hydroxyl (OH) bonds, as confirmed by optical emission spectroscopy (OES). The OES results show the relative intensity peaks emitted by the OH radicals, H and oxygen (O). The free energy is proportional to the plasma treatment power and gas flow rate with H bonds forming between the adsorbed H2O and OH groups. The gas density generated saturated bonds at the interface, and the discharge energy that strengthened the OH-e− bonds. This method provides an ideal heterogeneous bonding technique which can be used to manufacture new types of microfluidic devices.

Facile growth of centimeter-sized single-crystal graphene on copper foil at atmospheric pressure

2015 ◽  
Vol 3 (15) ◽  
pp. 3530-3535 ◽  
Author(s):  
Jing Li ◽  
Xuan-Yun Wang ◽  
Xing-Rui Liu ◽  
Zhi Jin ◽  
Dong Wang ◽  
...  
Keyword(s):  
Single Crystal ◽  
Flow Rate ◽  
Atmospheric Pressure ◽  
Copper Foil ◽  
Gas Flow ◽  
Gas Flow Rate ◽  
Single Crystalline ◽  
Slowing Down ◽  
Cu Foil

By mildly oxidizing Cu foil and slowing down the gas flow rate, centimeter-sized single-crystalline graphene was grown on Cu at atmospheric pressure.

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