scholarly journals ITO/SiO2/ITO Structure on a Sapphire Substrate Using the Oxidation of Ultra-Thin Si Films as an Insulating Layer for One-Glass-Solution Capacitive Touch-Screen Panels

Coatings ◽  
2020 ◽  
Vol 10 (2) ◽  
pp. 134 ◽  
Author(s):  
Shin Yong Joo ◽  
Chadrasekhar Loka ◽  
Young Woong Jo ◽  
Maddipatla Reddyprakash ◽  
Sung Whan Moon ◽  
...  
Keyword(s):  
Low Temperature ◽  
Sapphire Substrate ◽  
Indium Tin Oxide ◽  
Photoelectron Spectroscopy ◽  
Touch Screen ◽  
Sio2 Film ◽  
Silicon Films ◽  
Low Temperature Oxidation ◽  
Temperature Oxidation ◽  
Si Films

The SiO2 generated by low-temperature oxidation of ultra-thin metallic silicon (thickness = 50 nm) film was evaluated for implementation in one-glass-solution capacitive touch-screen panels (OGS-TSPs) on sapphire-based substrates. Our results show that the silicon films oxidized at 823 K exhibited the highest visible transmittance about 91% at 550 nm, compared to ~72% transmittance of the as-deposited silicon films which were deposited at room temperature. Additionally, the annealed films exhibited a more uniform, dense, and smooth surface microstructure than that of the as-deposited Si films. X-ray photoelectron spectroscopy (XPS) results revealed that the low-temperature oxidation of Si films at 823 K yielded SiO2. Furthermore, when the insulating SiO2 film obtained by low-temperature oxidation was sandwiched between two indium tin oxide (ITO) layers (ITO/SiO2/ITO) on a sapphire substrate, the SiO2 film resulted in the dielectric strength of approximately 3 MV/cm. In addition, the highest optical transmittance obtained by the ITO/SiO2/ITO films is about 88.3%. The change in capacitance of the ITO/SiO2/ITO structure was approximately 3.2 pF, which indicates the possibility of implementation in capacitive touch-screen panel devices.

Low Temperature Oxidation of Cu-Base Leadframe and Cu/Emc Interface Adhesion

1996 ◽  
Vol 445 ◽  
Author(s):  
Soon-Jin Cho ◽  
Kyung-Wook Paik
Keyword(s):  
Low Temperature ◽  
Photoelectron Spectroscopy ◽  
Early Stage ◽  
Kinetic Studies ◽  
Oxide Thickness ◽  
Low Temperature Oxidation ◽  
Copper Oxidation ◽  
Temperature Oxidation ◽  
Pull Strength ◽  
20 Nm

AbstractLow temperature oxidation of a Cu-base leadframe has been investigated to understand the effect of Cu oxidation on the adhesion between Cu-base leadframes (Cu L/F) and epoxy molding compounds (EMC). From the kinetic studies on the oxidation, oxide growth was found to follow the parabolic rate law in the temperature range of 150 °C to 300 °C and the activation energy for the oxidation was 17.0 kcal/mol. X-ray photoelectron spectroscopy (XPS) studies confirmed that the oxide film consisted of Cu2O, CuO, and NiO. It was shown that the early stage of oxidation improved the adhesion strength. Furthermore the optimum copper oxide thickness required for the maximum pull strength ranged between 20 nm and 30 nm. The high pull strength was presumably due to the increase of surface wettability and mechanical interlocking effects resulting from copper oxidation.

Low Temperature Oxidation Processing with High Purity Ozone

1996 ◽  
Vol 429 ◽  
Author(s):  
A. Kurokawa ◽  
S. Ichimura ◽  
H. J. Kang ◽  
D. W. Moon
Keyword(s):  
Low Temperature ◽  
Thermal Oxidation ◽  
High Purity ◽  
Photoelectron Spectroscopy ◽  
Oxide Formation ◽  
Low Temperature Oxidation ◽  
Temperature Oxidation ◽  
X Ray

AbstractTo lower the temperature of oxide-passivation processing the high- purity ozone (more than 98 mole %) was used instead of usual thermal oxidation. Initial oxide formation on a Si(111) surface with high-purity ozone is investigated by X-ray photoelectron spectroscopy (XPS). From the comparison of the suboxides formed with ozone and oxygen exposures, it is clear that ozone forms less suboxide than oxygen. The oxidation with ozone also proceeds on the hydrogen passivated surface which oxygen molecules do not oxidize.

scholarly journals Influence of Co-Precipitation Agent on the Structure, Texture and Catalytic Activity of Au-CeO2 Catalysts in Low-Temperature Oxidation of Benzyl Alcohol

Catalysts ◽  
2021 ◽  
Vol 11 (5) ◽  
pp. 641
Author(s):  
Lukasz Wolski ◽  
Grzegorz Nowaczyk ◽  
Stefan Jurga ◽  
Maria Ziolek
Keyword(s):  
Gold Nanoparticles ◽  
Catalytic Activity ◽  
Low Temperature ◽  
Benzyl Alcohol ◽  
Low Temperature Oxidation ◽  
Temperature Oxidation ◽  
Oxidation Of Benzyl Alcohol ◽  
Key Factor ◽  
Au Particle Size ◽  
Co Precipitation

The aim of the study was to establish the influence of a co-precipitation agent (i.e., NaOH–immediate precipitation; hexamethylenetetramine/urea–gradual precipitation and growth of nanostructures) on the properties and catalytic activity of as-synthesized Au-CeO2 nanocomposites. All catalysts were fully characterized with the use of XRD, nitrogen physisorption, ICP-OES, SEM, HR-TEM, UV-vis, XPS, and tested in low-temperature oxidation of benzyl alcohol as a model oxidation reaction. The results obtained in this study indicated that the type of co-precipitation agent has a significant impact on the growth of gold species. Immediate co-precipitation of Au-CeO2 nanostructures with the use of NaOH allowed obtainment of considerably smaller and more homogeneous in size gold nanoparticles than those formed by gradual co-precipitation and growth of Au-CeO2 nanostructures in the presence of hexamethylenetetramine or urea. In the catalytic tests, it was established that the key factor promoting high activity in low-temperature oxidation of benzyl alcohol was size of gold nanoparticles. The highest conversion of the alcohol was observed for the catalyst containing the smallest Au particle size (i.e., Au-CeO2 nanocomposite prepared with the use of NaOH as a co-precipitation agent).

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