scholarly journals Structural, Wetting and Magnetic Properties of Sputtered Fe70Pd30 Thin Film with Nanostructured Surface Induced by Dealloying Process

Nanomaterials ◽  
2021 ◽  
Vol 11 (2) ◽  
pp. 282
Author(s):  
Gabriele Barrera ◽  
Federica Celegato ◽  
Matteo Cialone ◽  
Marco Coïsson ◽  
Paola Rizzi ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetic Properties ◽  
Magnetic Measurements ◽  
Film Surface ◽  
Direct Consequence ◽  
X Ray Diffraction ◽  
Sem Images ◽  
Sputtering Deposition ◽  
Research Fields

FePd alloys in the thin film form represent a multipurpose and versatile material with relevant chemical and physical properties studied in different research fields. Moreover, the ability to manipulate and fine-tune the film surface with nanometric scale precision represents a degree of freedom useful to adapt these thin film properties to the demands of different desired applications. In this manuscript, Fe70Pd30 (at. %) thin films are prepared with a thickness of 50 and 200 nm by means of the widely used co-sputtering deposition technique. Subsequently, selective removal of the iron element from the alloy and the consequent surface diffusion of the palladium was induced by a dealloying treatment under free corrosion conditions in hydrochloric acid. The size and shape of the grains of the as-deposited thin films determine the dissolution rate of the iron element with a direct consequence not only on the surface morphology and the stoichiometry of the alloy but also on the wetting and magnetic properties of the sample. X-ray diffraction, Scanning Electron Microscopy (SEM) images, contact angle and magnetic measurements have been performed to provide a thorough characterisation of the fundamental properties of these nanostructured bimetallic thin films.

scholarly journals Structural and Magnetic Properties of FePd Thin Film Synthesized by Electrodeposition Method

Materials ◽  
2020 ◽  
Vol 13 (6) ◽  
pp. 1454
Author(s):  
Gabriele Barrera ◽  
Federico Scaglione ◽  
Matteo Cialone ◽  
Federica Celegato ◽  
Marco Coïsson ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetic Properties ◽  
Deposition Time ◽  
Magnetic Measurements ◽  
X Ray Diffraction ◽  
X Ray ◽  
Fundamental Properties ◽  
Magnetic Features ◽  
Application Fields

Bimetallic nanomaterials in the form of thin film constituted by magnetic and noble elements show promising properties in different application fields such as catalysts and magnetic driven applications. In order to tailor the chemical and physical properties of these alloys to meet the applications requirements, it is of great importance scientific interest to study the interplay between properties and morphology, surface properties, microstructure, spatial confinement and magnetic features. In this manuscript, FePd thin films are prepared by electrodeposition which is a versatile and widely used technique. Compositional, morphological, surface and magnetic properties are described as a function of deposition time (i.e., film thickness). Chemical etching in hydrochloric acid was used to enhance the surface roughness and help decoupling crystalline grains with direct consequences on to the magnetic properties. X-ray diffraction, SEM/AFM images, contact angle and magnetic measurements have been carried out with the aim of providing a comprehensive characterisation of the fundamental properties of these bimetallic thin films.

Optical Properties of Nano-CuInSi Thin Films Prepared by Multilayer Synthesized Method

2011 ◽  
Vol 403-408 ◽  
pp. 1094-1098
Author(s):  
Jian Sheng Xie ◽  
Ping Luan ◽  
Jin Hua Li
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Film Surface ◽  
X Ray Diffraction ◽  
Sem Images ◽  
X Ray ◽  
N2 Atmosphere ◽  
Double Beam ◽  
Absorption Studies ◽  
Different Temperatures

Thin Nano-CuInSi films have been prepared by multilayer synthesized method using magnetron sputtering technology, and followed by annealing in N2 atmosphere at different temperatures. The structures of CuInSi films were detected by X-ray diffraction(XRD); X-ray diffraction studies of the annealed films indicate the presence of CuInSi, the peak of main crystal phase is at 2θ=42.450°; the morphology of the film surface was studied by SEM. The SEM images show that the crystalline of the film prepared by multilayer synthesized method was granulated. The transmittance (T) spectra of the films were measured by Shimadzu UV-2450 double beam spectrophotometer. The calculated absorption coefficient is larger than 105 cm−1 when the wavelength is shorter than 750 nm. The band gap has been estimated from the optical absorption studies and found to be about 1.47 eV, but changes with purity of CuInSi. CuInSi thin film is a potential absorber layer material applied in solar cells and photoelectric automatic control.

Fine Tuning Magnetic Properties of FePt:C Thin Films by FePt UnderLayers

2013 ◽  
Vol 313-314 ◽  
pp. 254-257
Author(s):  
Ling Fang Jin ◽  
Hong Zhuang
Keyword(s):  
Thin Film ◽  
Electron Microscopy ◽  
Thin Films ◽  
Magnetic Properties ◽  
Fine Tuning ◽  
Nanocomposite Films ◽  
Nanocomposite Thin Film ◽  
X Ray Diffraction ◽  
X Ray ◽  
Transmission Electron

Nonepitaxially grown FePt (x)/FePt:C thin films were synthesized, where FePt (x) (x=2, 5, 8, 11, 14 nm) layers were served as underlayers and FePt:C layer was nanocomposite with thickness of 5 nm. The effect of FePt underlayer on the ordering, orientation and magnetic properties of FePt:C thin films has been investigated by adjusting FePt underlayer thicknesses from 2 nm to 14 nm. X-ray diffraction (XRD), together with transmission electron microscopy (TEM) confirmed that the desired L10 phase was formed and films were (001) textured with FePt underlayer thickness decreased less 5 nm. For 5 nm FePt:C nanocomposite thin film with 2 nm FePt underlayer, the coercivity was 8.2 KOe and the correlation length of FePt:C nanocomposite film was 67 nm. These results reveal that the better orientation and magnetic properties for FePt:C nanocomposite films can be tuned by decreasing FePt underlayer thickness.

scholarly journals Strain depth profiles in thin films extracted from in-plane X-ray diffraction

2021 ◽  
Vol 54 (1) ◽  
Author(s):  
Claudia Cancellieri ◽  
Daniel Ariosa ◽  
Aleksandr V. Druzhinin ◽  
Yeliz Unutulmazsoy ◽  
Antonia Neels ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Film Thickness ◽  
Depth Profile ◽  
Film Surface ◽  
Inverse Laplace Transform ◽  
X Ray Diffraction ◽  
X Ray ◽  
Stress Gradients ◽  
Dependent Strain

Thin films generally contain depth-dependent residual stress gradients, which influence their functional properties and stability in harsh environments. An understanding of these stress gradients and their influence is crucial for many applications. Standard methods for thin-film stress determination only provide average strain values, thus disregarding possible variation in strain/stress across the film thickness. This work introduces a new method to derive depth-dependent strain profiles in thin films with thicknesses in the submicrometre range by laboratory-based in-plane grazing X-ray diffraction, as applied to magnetron-sputtering-grown polycrystalline Cu thin films with different thicknesses. By performing in-plane grazing diffraction analysis at different incidence angles, the in-plane lattice constant depth profile of the thin film can be resolved through a dedicated robust data processing procedure. Owing to the underlying intrinsic difficulties related to the inverse Laplace transform of discrete experimental data sets, four complementary procedures are presented to reliably extract the strain depth profile of the films from the diffraction data. Surprisingly, the strain depth profile is not monotonic and possesses a complex shape: highly compressive close to the substrate interface, more tensile within the film and relaxed close to the film surface. The same strain profile is obtained by the four different data evaluation methods, confirming the validity of the derived depth-dependent strain profiles as a function of the film thickness. Comparison of the obtained results with the average in-plane stresses independently derived by the standard stress analysis method in the out-of-plane diffraction geometry validates the solidity of the proposed method.

Microstructure and Magnetic Properties of CoFeHfO Rich Nanocrystalline Thin Films Application for High Frequency

2007 ◽  
Vol 558-559 ◽  
pp. 975-978
Author(s):  
L.V. Tho ◽  
K.E. Lee ◽  
Cheol Gi Kim ◽  
Chong Oh Kim ◽  
W.S. Cho
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetic Properties ◽  
Rf Sputtering ◽  
Xrd Analysis ◽  
X Ray Diffraction ◽  
Soft Magnetic ◽  
Electrical And Magnetic Properties ◽  
Transmission Electron ◽  
Nanocrystalline Thin Films

Nanocrystalline CoFeHfO thin films have been fabricated by RF sputtering method. Co52Fe23Hf10O15 thin film is observed, exhibit good magnetic properties with magnetic coercivity (Hc) of 0.18 Oe; anisotropy fild (Hk) of 49 Oe; saturation magnetization (4лMs) of 21 kG, and electrical resistivity (ρ) of 300 01cm. The frequency response of permeability of the film is excellent. The effect of microstructure on the electrical and magnetic properties of thin film was studied using X-ray diffraction (XRD) analysis and conventional transmission electron microscopy (TEM). The results showed that excellent soft magnetic properties were associated with granular nannoscale grains of α-CoFe and α-Co(Fe) phases.

Crystallographic and Magnetic Properties of CoCrPt Thin Films Investigated Using Single-Crystal Perpendicular Magnetic Thin Film Samples

2002 ◽  
Vol 721 ◽  
Author(s):  
Masaaki Futamoto ◽  
Kouta Terayama ◽  
Katsuaki Sato ◽  
Nobuyuki Inaba ◽  
Yoshiyuki Hirayama
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetic Properties ◽  
Single Crystal ◽  
Film Plane ◽  
Magnetic Thin Film ◽  
X Ray Diffraction ◽  
Easy Magnetization ◽  
Transmission Electron ◽  
Magnetization Axis

AbstractConditions to prepare good single-crystal CoCrPt magnetic thin film with the easy magnetization axis perpendicular to the film plane were investigated using oxide single-crystal substrates, Al2O3(0001), LaAlO3(0001), mica(0001), SrTiO3(111), and MgO(111). The best CoCrPt(0001) single-crystal thin film was obtained on an Al2O3(0001) substrate employing a non-magnetic CoCrRu underlayer. The crystallographic quality of single-crystal thin film was investigated using X-ray diffraction and high-resolution transmission electron microscopy. Some intrinsic magnetic properties (Hk, Ku) were determined for the single-crystal CoCrxPty thin films for a compositional range of x=17-20at% and y=0-17at%.

Effect of Substrate Strain and Interface on Magnetic Properties of EuTiO3 Thin Film

2012 ◽  
Vol 1454 ◽  
pp. 149-159
Author(s):  
Katsuhisa Tanaka ◽  
Koji Fujita ◽  
Yuya Maruyama ◽  
Yoshiro Kususe ◽  
Hideo Murakami ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetic Properties ◽  
Film Surface ◽  
Lattice Parameter ◽  
Experimental Result ◽  
Ferromagnetic Behavior ◽  
Spin Configuration ◽  
Strongly Coupled ◽  
Lattice Volume

ABSTRACTBulk EuTiO3 is known as a compound in which spin and soft phonon mode is strongly coupled. Recent theoretical study suggests that application of stress or formation of strain leads to a drastic change in magnetic and dielectric properties of EuTiO3 and that so-called multiferroic properties emerge under such a situation. In the present study, effect of strain induced by a substrate, on which EuTiO3 thin film is deposited, on the magnetic properties of the film has been experimentally examined. By using a pulsed laser deposition method, EuTiO3 thin film has been deposited on different kinds of substrate, i.e., LaAlO3, SrTiO3, and DyScO3; the lattice parameter of these compounds is smaller than, just the same as, and larger than that of EuTiO3, respectively. X-ray diffraction analysis confirms that the strain induced in the plane of as-deposited EuTiO3 thin films on different substrates is coincident with the lattice parameter of the substrate compounds. Also, all the as-deposited EuTiO3 thin films manifest elongation of lattice in a direction perpendicular to the film surface. Temperature dependence of magnetization indicates that all the thin films exhibit ferromagnetic behavior at low temperatures. The magnetization at 2 K under a magnetic field of 100 Oe is the highest for EuTiO3 on DyScO3 and the lowest for EuTiO3 on LaAlO3. The experimental result is coincident with the first-principles calculations which predict that ferromagnetic spin configuration becomes more stable as the lattice volume of EuTiO3is increased.

Synthesis and Characterization of TiO2 Thin Film by Self-Assembly Method

2011 ◽  
Vol 148-149 ◽  
pp. 1500-1503
Author(s):  
Wen Ning Mu ◽  
Shuang Zhi Shi
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Self Assembly ◽  
Film Surface ◽  
Molar Ratio ◽  
Layer By Layer ◽  
Sem Images ◽  
Thin Film Surface ◽  
Assembly Method ◽  
Average Size

TiO2 thin films were deposited on SAM-coated silicon substrate by layer-by-layer self-assembly method. The influence of various parameters was investigated to optimize the conditions and the results show that with increasing deposition temperature and deposition time, and decreasing molar ratio of HCl to TiO22+, the content of TiO22+ in the reaction solution decreases. The as-deposited thin films were fully amorphous from the result of XRD, also were homogeneous and continuous produced at 80 °C for120 min as presented in SEM images, and the average size of particles on the thin film surface is approximately 33 nm.

Modulus and Internal Friction of W-Doped VO2 Thin Films

2011 ◽  
Vol 130-134 ◽  
pp. 3343-3346 ◽  
Author(s):  
H.Q. Li ◽  
X.X. He ◽  
T. Liu ◽  
Z.H. Nie ◽  
X.Q. Lv
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Phase Transition ◽  
Internal Friction ◽  
Transition Temperatures ◽  
X Ray Diffraction ◽  
Sputtering Deposition ◽  
X Ray ◽  
Metal Phase Transition ◽  
Deposition Techniques

The thin films of W-doped VO2were synthesized onto Mo substrates using reactive DC and RF magnetic co-sputtering deposition techniques. The effects of W dopant on the semiconductor to metal phase transition of bare VO2were investigated with measuring X-ray diffraction (XRD) , QJ31Wheatstone Bridge and the internal friction and modulus vs temperature. The transition temperatures of VO2thin film from monoclinic semiconductor to tetragonal metal are decreased from 68°C to 40°C with the curves of resistance vs temperature and modulus vs temperature. In addition to, the size of grains W-doped VO2is more than that of un-doped VO2, but more smoother.

scholarly journals Effect of Zr content on the structure and morphology of CrZrN thin films prepared by reactive DC magnetron co-sputtering method

2021 ◽  
Vol 2145 (1) ◽  
pp. 012030
Author(s):  
Adisorn Buranawong ◽  
Nirun Witit-Anun
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Film Structure ◽  
Zirconium Nitride ◽  
X Ray Diffraction ◽  
Sem Images ◽  
X Ray ◽  
Substrate Heating ◽  
Structure And Morphology ◽  
Microstructure Morphology

Abstract In this research, nanostructured chromium zirconium nitride (CrZrN) thin film has been deposited on Si(100) substrates by reactive DC magnetron co-sputtering method without in situ substrate heating and post-deposition annealing. The effects of Zr content on thin film structure and morphology were investigated. The Zr content in the films were varied by applied the sputtering current of Zr target (Izr) in the range of 300 to 900 mA, whereas the current of Cr target was kept at 300 mA. The crystal structure, microstructure, morphology, thickness, and chemical composition were characterized by glancing angle X-ray diffraction (GA-XRD), field emission scanning electron microscopy (FE-SEM), and energy-dispersive X-ray spectroscopy (EDS) techniques, respectively. The results showed that the increase of Izr not only increased the deposition rate, but also increased the Zr content of the as-deposited film ranging from 3.9 to 26.5 at%. The as-deposited thin films were formed as a (Cr,Zr)N solid solution, with fcc structure in (111) and (200) plane, where Cr atoms were replaced by Zr atoms in the CrN lattice. The 2θ diffraction peaks were shifted to the lower value as increase of Zr content which was obtained by increased Izr. The nanocrystalline CrZrN structure with crystal sizes smaller than 10 nm structure were calculated for as-deposited thin films. The lattice parameters increased from 4.187 to 4.381 Å, whereas the crystal size decreased from 8.3 to 6.4 nm. The FE-SEM images of all the CrZrN films exhibited compact columnar with dense morphology as a function of Zr content. Moreover, the thickness of the CrZrN thin films was increased of 302 – 421 nm.

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