scholarly journals Phase Change Ge-Rich Ge–Sb–Te/Sb2Te3 Core-Shell Nanowires by Metal Organic Chemical Vapor Deposition

Nanomaterials ◽  
2021 ◽  
Vol 11 (12) ◽  
pp. 3358
Author(s):  
Arun Kumar ◽  
Raimondo Cecchini ◽  
Claudia Wiemer ◽  
Valentina Mussi ◽  
Sara De Simone ◽  
...  

Ge-rich Ge–Sb–Te compounds are attractive materials for future phase change memories due to their greater crystallization temperature as it provides a wide range of applications. Herein, we report the self-assembled Ge-rich Ge–Sb–Te/Sb2Te3 core-shell nanowires grown by metal-organic chemical vapor deposition. The core Ge-rich Ge–Sb–Te nanowires were self-assembled through the vapor–liquid–solid mechanism, catalyzed by Au nanoparticles on Si (100) and SiO2/Si substrates; conformal overgrowth of the Sb2Te3 shell was subsequently performed at room temperature to realize the core-shell heterostructures. Both Ge-rich Ge–Sb–Te core and Ge-rich Ge–Sb–Te/Sb2Te3 core-shell nanowires were extensively characterized by means of scanning electron microscopy, high resolution transmission electron microscopy, X-ray diffraction, Raman microspectroscopy, and electron energy loss spectroscopy to analyze the surface morphology, crystalline structure, vibrational properties, and elemental composition.

2016 ◽  
Vol 27 (27) ◽  
pp. 275601 ◽  
Author(s):  
Xianghai Ji ◽  
Xiaoguang Yang ◽  
Wenna Du ◽  
Huayong Pan ◽  
Shuai Luo ◽  
...  

Nano Letters ◽  
2019 ◽  
Vol 19 (6) ◽  
pp. 3782-3788 ◽  
Author(s):  
Han Gao ◽  
Wen Sun ◽  
Qiang Sun ◽  
Hark Hoe Tan ◽  
Chennupati Jagadish ◽  
...  

2021 ◽  
Vol 66 (1) ◽  
pp. 49-56
Author(s):  
Quyen Do Le ◽  
Duc Nguyen Anh

Recently, novel physical properties originating from quantum confinement endow the twodimensional (2D) transition metal dichalcogenides, such as MoS2, or WSe2 to attract a great deal of attention. However, the synthesis of 2D-TMDC has to be still limited, in which the precursors are almost based on high vapor pressure inorganic materials, that produce a smallscale film, and it is mainly performed only on conventional Si\SiO2 substrate. In this work, we successfully synthesize the atomic thickness of 2D-MoS2 films by using metal-organic chemical vapor deposition (MOCVD) on several kinds of substrate, namely silicon (Si), silicon dioxide (SiO2), graphite foil, or fluorine-doped tin oxide (FTO). The morphology of samples is observed by field emission scanning electron microscopy (FE-SEM), and scanning transmission electron microscopy (STEM). The lattice vibrational and optical properties are investigated by Raman and photoluminescence (PL) spectroscopies, respectively. With the same MOCVD growing condition, as-obtained samples exhibit the hexagonal configuration (2H phase), whereas the surface morphology and the thickness show a discrepancy, depending on the substrates.


2000 ◽  
Vol 616 ◽  
Author(s):  
Jeong-Hoon Park ◽  
Woon-Jo Cho ◽  
Kug-Sun Hong

AbstractTiO2 thin films were deposited by metal-organic chemical vapor deposition (MOCVD) method using titanium tetraisopropoxide(TTIP). A drastic change in structural aspect and its property occurred when the deposition temperature increased above 400°C. Deposition kinetics was proved to transit from reaction controlled regime into diffusion controlled regime above about 400°C in Arrehnius plot. In X-ray diffraction (XRD)and infrared reflectance spectra, it was observed that the crystallinity was decreased significantly around 400°C. The surface microstructure has changed explicitly from dense structure with larger grains to porous one with smaller grains observed by scanning electron microscopy and transmission electron microscopy. Electrical resistance of the films jumped by 2 orders of magnitude, which is measured by the 4-point probe method. The refractive index calculated by Swanepoel's method has decreased from 2.45 to 2.28 at 630nm. The porous microstructure of films deposited at above 400°C was thought to be responsible for the significant decrease in electrical conductivity and refractive index of the films.


2005 ◽  
Vol 19 (01n03) ◽  
pp. 423-425
Author(s):  
JIANMING ZENG ◽  
IRENE RUSAKOVA ◽  
ZHONGJIA TANG ◽  
XIN ZHANG ◽  
DALBER SANCHEZ ◽  
...  

High-quality YBa2Cu3O7-x ( YBCO ) thick films with thickness over 4.0μm were deposited by photo-assisted metal-organic chemical vapor deposition (PhA-MOCVD) technique with high growth rates. Microstructures of YBCO thick films have been systematically investigated by scanning electron microscopy, high-resolution transmission electron microscopy, and selected area electron diffraction techniques. The fabricated YBCO thick films are very dense and single-crystal like with no visible grain boundaries or voids. The high quality of the prepared YBCO thick films was confirmed further by the results of X-ray diffraction analyses and Jc measurements. Thus, these thick YBCO films prepared by PhA-MOCVD technique have promising application potential in fields such as coated conductors.


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