scholarly journals DEVELOPMENT OF THE FABRICATION METHOD FOR STATIC RAM RADIATION HARDENED SILICON-ON-SAPPHIRE MICROCIRCUITS

Author(s):  
Yu.A. Kabalnov ◽  
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Author(s):  
C. O. Jung ◽  
S. J. Krause ◽  
S.R. Wilson

Silicon-on-insulator (SOI) structures have excellent potential for future use in radiation hardened and high speed integrated circuits. For device fabrication in SOI material a high quality superficial Si layer above a buried oxide layer is required. Recently, Celler et al. reported that post-implantation annealing of oxygen implanted SOI at very high temperatures would eliminate virtually all defects and precipiates in the superficial Si layer. In this work we are reporting on the effect of three different post implantation annealing cycles on the structure of oxygen implanted SOI samples which were implanted under the same conditions.


2016 ◽  
Vol 18 (1) ◽  
pp. 76-86
Author(s):  
N.N. Prokopenko ◽  
N.V. Butyrlagin ◽  
A.V. Bugakova ◽  
A.A. Ignashin

Author(s):  
Jamey Moss ◽  
Sam Subramanian ◽  
Vince Soorholtz ◽  
Michael Thomas ◽  
Mark Gerber ◽  
...  

Abstract Several hundred units were subjected to autoclave stress as part of the qualification of a new fast static RAM. Many units failed after autoclave stress, and these parts recovered after conventional depotting using nitric acid and a hot plate. Based on the recovery of the units, the failures were determined to be fuse-related because the nitric acid cleared the fuse cavities during depotting. Chemical analysis after thermally extracting the die from the package revealed an antimony-rich material in failing fuse cavities. Source of the antimony was linked to antimony trioxide added to the plastic package as a fire retardant. However, it was unclear whether the antimony-rich material caused the failure or if it was an artifact of thermal depotting. A new approach that did not thermally or chemically alter the fuse cavities was employed to identify the failing fuses. This approach used a combination of back-side grinding, dimpling, and back-side microprobing. The antimony-rich material found in the fuse cavity was confirmed using SEM and TEM-based EDS analysis, and it is believed to be a major contributing factor to fuse failures. However, it is unclear whether the short was caused by the antimony-rich material or by a reaction between that material and residual aluminum (oxide) left in the fuse cavity after the laser blows.


2020 ◽  
Vol 96 (3s) ◽  
pp. 169-174
Author(s):  
Ю.М. Герасимов ◽  
Н.Г. Григорьев ◽  
А.В. Кобыляцкий ◽  
Я.Я. Петричкович

Рассматриваются архитектурные, схемотехнические и конструктивно-топологические особенности асинхронного радиационно стойкого ОЗУ 1657РУ2У емкостью 16 Мбит с организацией (1Мx16)/(2Mx8), изготавливаемого по коммерческой КМОП-технологии объемного кремния уровня 130 нм. СБИС ОЗУ нечувствительна к эффекту «защелкивания», имеет повышенные дозовую стойкость и сбоеустойчивость при воздействии отдельных ядерных частиц (ОЯЧ), протонов и нейтронов (ТЧ). The paper highlights architectural, schematic and topological features of the radiation hardened 16 Mbit CMOS SRAM with configurable organization 1Mx16/2Mx8, which is immune to latch-up and with improved total dose and heavy particles tolerance.


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