Quality of Soybean Paste (Doenjang) Prepared with Sweet Tangle, Sea Mustard and Anchovy Powder

Soybean pulp is a byproduct of tofu processing and soy milk. The nutrients contained in soybean dregs are still significantly high, especially protein and fiber. So far, processing of soybean pulp into food is still limited. Tuber has many benefits for the body, and has a high nutritional content and can be used as a food substitution. One of the tubers that can be processed as a substitute is purple sweet potato. The natural fiber of oligosaccharides or anti-nutrition substances stored in purple sweet potatoes is a valuable commodity for processed food products, such as brownies. This study aims to determine the quality, physicochemical and organoleptic properties produced by brownies. The study was organised using a completely randomized design (CRD) with a comparison treatment of soybean pulp paste and purple sweet potato paste including (1) 60%, 50%, 40% and (2) 40%, 50%, 60%. Each treatment was repeated three times. The study was conducted at the Pangkep State Agricultural Polytechnic Biochemistry Laboratory (PPNP) of South Sulawesi. The results of the study obtained the best quality of brownies on physicochemical properties in treatment D (A3B3), by the concentration of 40% soybean paste paste and 60% purple sweet potato paste for water content (25.76%), ash (1.01%), fat (14.56%), carbohydrate (43.32%), and protein (18.95%). The best growth power test for the physical quality of brownies is in treatment D (A3B3) with a concentration of 40% soybean pulp paste treatment and 60% purple sweet potato paste (6.4 cm). The best panelist's level of preference test was in treatment D (A3B3) with a concentration of 40% soybean paste paste treatment and purple sweet potato paste 60% for color (4.28%), aroma (3.95%), flavor (4.47% ) and texture (4.42%).

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Annotation: Class Size and the Quality of Educational Outcomes

Journal of Child Psychology and Psychiatry ◽

10.1017/s0021963098002819 ◽

1998 ◽

Vol 39 (6) ◽

pp. 797-804 ◽

Cited By ~ 8

Author(s):

Neville Bennett

Keyword(s):

Educational Outcomes ◽

Class Size

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Immunoferritin localization of intracellular antigens in positively stained frozen sections

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s042482010008170x ◽

1978 ◽

Vol 36 (2) ◽

pp. 168-169

Author(s):

K. T. Tokuyasu

Keyword(s):

Surface Tension ◽

Water Surface ◽

Thin Layers ◽

The Other ◽

Positive Staining ◽

Frozen Sections ◽

The Past ◽

Ultrathin Frozen Sections ◽

Definition Of

During the past investigations of immunoferritin localization of intracellular antigens in ultrathin frozen sections, we found that the degree of negative staining required to delineate u1trastructural details was often too dense for the recognition of ferritin particles. The quality of positive staining of ultrathin frozen sections, on the other hand, has generally been far inferior to that attainable in conventional plastic embedded sections, particularly in the definition of membranes. As we discussed before, a main cause of this difficulty seemed to be the vulnerability of frozen sections to the damaging effects of air-water surface tension at the time of drying of the sections.Indeed, we found that the quality of positive staining is greatly improved when positively stained frozen sections are protected against the effects of surface tension by embedding them in thin layers of mechanically stable materials at the time of drying (unpublished).

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Lithography below 100 nm

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100074367 ◽

1983 ◽

Vol 41 ◽

pp. 96-99

Author(s):

L. D. Jackel

Keyword(s):

Spatial Distribution ◽

Electron Beam ◽

Electron Scattering ◽

Electron Beam Lithography ◽

Substrate Material ◽

Local Electron ◽

Electron Dose ◽

Positive Resist ◽

Exposure Process

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.

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