Atmospheric Pressure Plasma Systems and Applications

2022 ◽  
pp. 49-62
Author(s):  
Necdet Aslan

Atmospheric-pressure plasmas have a wide variety of potential industrial applications. They are used in extractive metallurgy; metal recovery; novel nanomaterial synthesis; refractory and wear-resistant coatings deposition; chemical synthesis; energy conversion; industrial, medical, and nuclear waste destruction; engine combustion enhancement; and exhaust gas pollutants clean up. Atmospheric plasmas are produced by applying DC or AC high voltage between two electrodes designed as cylindrical in shape for jets and planar for the dielectric barrier discharge systems. This review presents an overview of the use of atmospheric-pressure plasma devices and industrial processes carried out in several of these areas.

Polymers ◽  
2020 ◽  
Vol 12 (5) ◽  
pp. 1028 ◽  
Author(s):  
Thalita M. C. Nishime ◽  
Robert Wagner ◽  
Konstantin G. Kostov

In the last decade atmospheric pressure plasma jets (APPJs) have been routinely employed for surface processing of polymers due to their capability of generating very reactive chemistry at near-ambient temperature conditions. Usually, the plasma jet modification effect spans over a limited area (typically a few cm²), therefore, for industrial applications, where treatment of large and irregular surfaces is needed, jet and/or sample manipulations are required. More specifically, for treating hollow objects, like pipes and containers, the plasma jet must be introduced inside of them. In this case, a normal jet incidence to treated surface is difficult if not impossible to maintain. In this paper, a plasma jet produced at the end of a long flexible plastic tube was used to treat polyethylene terephthalate (PET) samples with different incidence angles and using different process parameters. Decreasing the angle formed between the plasma plume and the substrate leads to increase in the modified area as detected by surface wettability analysis. The same trend was confirmed by the distribution of reactive oxygen species (ROS), expanding on starch-iodine-agar plates, where a greater area was covered when the APPJ was tilted. Additionally, UV-VUV irradiation profiles obtained from the plasma jet spreading on the surface confirms such behavior.


2005 ◽  
Vol 77 (2) ◽  
pp. 487-495 ◽  
Author(s):  
A. Chirokov ◽  
A. Gutsol ◽  
A. Fridman

The dielectric barrier discharge (DBD) has a number of industrial applications and has been a subject of research for many years. Many studies have been carried out to understand the underlying DBD physics. Despite the fact that much progress has been made, some important issues are still far from being clear. In this work, we summarize the basics of DBD physics and introduce innovative concepts of discharge behavior that were discovered recently.


PIERS Online ◽  
2010 ◽  
Vol 6 (7) ◽  
pp. 636-639
Author(s):  
Toshiyuki Nakamiya ◽  
Fumiaki Mitsugi ◽  
Shota Suyama ◽  
Tomoaki Ikegami ◽  
Yoshito Sonoda ◽  
...  

Materials ◽  
2020 ◽  
Vol 13 (13) ◽  
pp. 2931
Author(s):  
Soumya Banerjee ◽  
Ek Adhikari ◽  
Pitambar Sapkota ◽  
Amal Sebastian ◽  
Sylwia Ptasinska

Atmospheric pressure plasma (APP) deposition techniques are useful today because of their simplicity and their time and cost savings, particularly for growth of oxide films. Among the oxide materials, titanium dioxide (TiO2) has a wide range of applications in electronics, solar cells, and photocatalysis, which has made it an extremely popular research topic for decades. Here, we provide an overview of non-thermal APP deposition techniques for TiO2 thin film, some historical background, and some very recent findings and developments. First, we define non-thermal plasma, and then we describe the advantages of APP deposition. In addition, we explain the importance of TiO2 and then describe briefly the three deposition techniques used to date. We also compare the structural, electronic, and optical properties of TiO2 films deposited by different APP methods. Lastly, we examine the status of current research related to the effects of such deposition parameters as plasma power, feed gas, bias voltage, gas flow rate, and substrate temperature on the deposition rate, crystal phase, and other film properties. The examples given cover the most common APP deposition techniques for TiO2 growth to understand their advantages for specific applications. In addition, we discuss the important challenges that APP deposition is facing in this rapidly growing field.


2018 ◽  
Vol 677 (1) ◽  
pp. 135-142
Author(s):  
Dong Ha Kim ◽  
Choon-Sang Park ◽  
Eun Young Jung ◽  
Bhum Jae Shin ◽  
Jae Young Kim ◽  
...  

Author(s):  
Thisara Sandanuwan ◽  
Nayanathara Hendeniya ◽  
D.A.S. Amarasinghe ◽  
Dinesh Attygalle ◽  
Sampath Weragoda

Author(s):  
Kenneth A. Cornell ◽  
Amanda White ◽  
Adam Croteau ◽  
Jessica Carlson ◽  
Zeke Kennedy ◽  
...  

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