Investigation of the Microstructure, Optical and Electrical Properties of In-Ga-Zn Oxide Thin Film Using the Sol-Gel Method

2012 ◽  
Vol 531 ◽  
pp. 93-96
Author(s):  
Qian Li ◽  
Xi Feng Li

The effects of after-annealed temperature on the microstructure, optical and electrical properties of solution processed amorphous indium gallium zinc oxide (a-IGZO) thin films were investigated in this article. The X-ray diffraction results confirmed that all the films were an amorphous structure. A transmittance of more than 90% in the visible wavelength region was obtained. the a-IGZO thin films reached the lowest electrical resistivity of 9.44×104Ω•cm with the after-annealed temperature of 300°C.

2019 ◽  

Transparent conducting oxide (TCO) thin films are materials of significance for their applications in optoelectronics and sun powered cells. Fluorine-doped tin oxide (FTO) is an elective material in the advancement of TCO films. This paper reports the impact of fluorine doping on structural, optical and electrical properties of tin oxide thin films for solar cells application. The sol-gel was prepared from anhydrous stannous chloride, SnCl2 as an originator, 2-methoxyethanol as a solvent, di-ethanolamine as a preservative and ammonium fluoride as the dopant source. FTO precursor solution was formulated to obtain 0, 5, 10, 15 and 20 % doping concentration and deposited on glass substrates by means of spin coater at the rate of 2000 rpm for 40 seconds. After pre-heated at 200 oC, the samples were annealed at 600 oC for 2 h. The structural, optical and electrical characteristics of prepared films were characterized using X-ray diffraction (XRD) analysis, UV-visible spectroscopy and electrical measurement. X-ray diffraction (XRD) investigation of the films demonstrated that the films were polycrystalline in nature with tetragonal-cassiterite structure with most extraordinary pinnacle having a grain size of 17.01 nm. Doping with fluorine decreases the crystallite size. There was increment in the absorbance of the film with increasing wavelength and the transmittance was basically reduced with increasing fluorine doping in the visible region. The energy band gaps were in the range of 4.106-4.121 eV. The sheet resistance were observed to decrease as the doping percentage of fluorine increased with exception at higher doping of 15 and 20 %. In view of these outcomes, FTO thin films prepared could have useful application in transparent conducting oxide electrode in solar cell.


2005 ◽  
Vol 19 (01n03) ◽  
pp. 671-673
Author(s):  
PENG XIAO ◽  
WANLU WANG

The Fe 3+- TiO 2 thin films obtained through sol-gel method were characterized by x-ray diffraction, AFM and Raman spectroscopy. It was found that TiO 2 films consisted of nanometer particles. The experimental results shows that the nanometer TiO 2 thin films doped with Fe 3+ were greatly improved in the activity aspect. This may be ascribed to change their structure and electrical properties after doping with Fe 3+. The results were discussed theoretically in detail.


2014 ◽  
Vol 2014 ◽  
pp. 1-4 ◽  
Author(s):  
Peijie Lin ◽  
Sile Lin ◽  
Shuying Cheng ◽  
Jing Ma ◽  
Yunfeng Lai ◽  
...  

Ag-doped In2S3(In2S3:Ag) thin films have been deposited onto glass substrates by a thermal evaporation method. Ag concentration is varied from 0 at.% to 4.78 at.%. The structural, optical, and electrical properties are characterized using X-ray diffraction (XRD), spectrophotometer, and Hall measurement system, respectively. The XRD analysis confirms the existence of In2S3and AgIn5S8phases. With the increase of the Ag concentration, the band gap of the films is decreased gradually from 2.82 eV to 2.69 eV and the resistivity drastically is decreased from ~103to5.478×10-2 Ω·cm.


2013 ◽  
Vol 20 (06) ◽  
pp. 1350058 ◽  
Author(s):  
R. E. ORNELAS-ACOSTA ◽  
S. SHAJI ◽  
D. AVELLANEDA ◽  
G. A. CASTILLO ◽  
T. K. DAS ROY ◽  
...  

In this work, we report the formation of In 6 Se 7 thin films by laser irradiation of In / Se layered structure. Indium layer was deposited on glass substrates by thermal evaporation on which selenium thin film was grown by chemical bath deposition from an aqueous solution containing 10 ml of sodium selenosulphate (0.1 M), 1.0 ml acetic acid (25%) and 70 ml distilled water during 5 min. The In / Se coated glass substrates were irradiated using a 532 nm continuous laser for 3–5 min. Structure, morphology, optical and electrical properties of the irradiated thin films were analyzed using various techniques. X-ray diffraction analysis showed that the irradiated thin films were In 6 Se 7 of monoclinic structure. X-ray photoelectron spectroscopic study on the laser irradiated samples provided uniform relative composition of In and Se in the thin films formed after laser irradiation. The morphology, optical and electrical properties of the irradiated samples were investigated. The optical band gap of the In 6 Se 7 thin films was 2.2 eV and also, the thin films were photoconductive.


2020 ◽  
Author(s):  
Monali Mishra ◽  
Smrutirekha Swain ◽  
Sukalyan Dash ◽  
Somdutta Mukherjee

Abstract In this work, GaFeO 3 thin films are deposited on Pt/Si substrates using sol-gel spin coating technique. The effect of these films on different properties such as: structural, optical and electrical properties are investigated. X- ray diffraction (XRD) confirms that GaFeO 3 has orthorhombic Pc2 1 n symmetry. Scanning electron microscopy reveals the uniform distribution of sol and crack free nature of the films. The optical absorption spectrum was recorded using DRS UV-Vis which showed the thin films are absorbed in the visible region. We have also performed experimentally which determines the flat band potential using Mott-Schottky equation. The width of the space charge region and charge carrier concentration of the thin films is also calculated. The dielectric properties of the thin films are also studied in this paper. This work opens up the possibility for the polycrystalline GaFeO 3 thin films to be used as phototelectrodes.


2021 ◽  
Author(s):  
Fatemeh Davari ◽  
Mohammad Reza Fadavieslam

Abstract In this study, the pure and Cu doped CdO thin films with various doping concentrations (0 to 5 at.%) were deposited on soda-lime glass substrates, using the chemical spray pyrolysis technique. The effects of Cu doping on the structural, optical, and electrical properties of thin films were, then, investigated. The films were characterized through X-ray diffraction (XRD), field emission scanning electron microscopy equipped with an energy dispersive x-ray analyzer (FESEM-EDX), atomic force microscopy (AFM), ultraviolet-visible spectroscopy, and electrical resistance; van der Pauw techniques were also used to measure the Hall effect. X-ray diffraction studies showed that the thin films were polycrystalline only with cadmium oxide phase with the cubic face-centered crystal structure and the preferred orientations were along (111), (200), (220), (311), and (311) planes. The FE-SEM and AFM images also showed that with an increase in Cu doping levels, the grain size and surface roughness of the thin films decreased from 472 to 38 nm and from 163 to 54 nm, respectively. The expected element compositions were confirmed by EDX. The optical bandgap of the thin films ranged from 2.42 to 2.56 eV, and as Cu dopant increased, so, too, the optical bandgap. As the Cu doping concentration increased from 0 to 5 (at.%), the electrical resistivity and Seebeck coefficient were found to increase from 3.74⋅10− 4 to 8.77⋅10− 3 Ω.cm and 8.28⋅10− 6 to 2.52⋅10− 5 v/k (at 100 Co temperature difference), respectively; the carrier concentration and carrier mobility were also found to decrease from 3.24⋅1020 to 1.76⋅1020 cm− 3 and from 55.5 to 4.05 cm2/v.s, respectively. The Hall effect and thermoelectric studies revealed that the films exhibited an n-type conductivity.


2021 ◽  
pp. 1-15
Author(s):  
R. Nouadji ◽  
A. Attaf ◽  
A. Derbali ◽  
A. Bouhdjer ◽  
H. Saidi ◽  
...  

In this work, we investigated the effect of the thickness on structural, morphological, optical, and electrical properties of In2O3 thin films synthesized via by sol–gel spin coating technique. The prepared samples were characterized by various techniques including X-ray diffraction (XRD), scanning electron microscope (SEM), energy-dispersive X-ray (EDX) spectra, UV-Vis-NIR spectrophotometer as well as the electrical measurements via the four-probe technique. The XRD analysis reveals that the films have a cubic crystalline structure, with (222) preferential orientation. The crystallite size values of the films were varied from 14 to 27 nm. The (SEM) images indicated that the homogenous and smooth surface with better adherent to the substrate surface. The EDX spectrum reveals the presence of In and O element necessary for In2O3 films for film formation. Excess of oxygen is observed due to the substrate contribution. The transmittance results exhibit that the films are highly transparent, more than 75% in the visible range from 400 nm to 800 nm is measured. The estimated band gap energy is found to increase with increasing film thickness (3.37–3.7 eV). The electrical resistivity of the In2O3 thin films substantially decreases with the increasing film thickness from 1.48×10 - 4 to 1.3×10 - 3 Ω.cm.


2013 ◽  
Vol 652-654 ◽  
pp. 519-522
Author(s):  
Jun Chen ◽  
Yue Hui Hu ◽  
Hong Hao Hu ◽  
Yi Chuan Chen

Transparent thin films of Sn-doped ZnO (ZnO:Sn) were deposited onto silica glass substrates by the sol–gel method. The effect of different Sn doping on the crystallinity, structural, optical and electrical properties of ZnO:Sn thin films were investigated by XRD, SEM, UV-VIS spectrophotometer and four-point probe method respectively. Among all of ZnO:Sn thin films in this paper, Sn-doped with 2 at.% exhibited the best properties, the surface demonstrate an accumulative crystallization and hexagonal structure, with a high-preferential c-axis orientation, namely an average transmittance of 90% and the resistivity of 19.6 Ω·cm.


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