Microstructural and Magnetic Properties of C/FePt/Ti Films by Facing Sputtering
2012 ◽
Vol 557-559
◽
pp. 1787-1790
C/FePt/Ti nano-thin films were prepared by DC facing-target magnetron sputtering system onto glass substrates at room temperature and subsequently in situ annealed for 500 °C 30 min in vacuum. The influence of C capping layer on microstructural and magnetic properties of the FePt films were investigated in detail. Atomic force microscopy (AFM) images indicate that C can effectively isolate the particles, refine particle, and distribute; however, the particle size distribution is uneven for too much C. The easy magnetic axial orientation is changed with the C layer thickness.