Research on (Ti,Al)N Films Deposited by FCVA
2012 ◽
Vol 557-559
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pp. 1893-1896
Keyword(s):
X Ray
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Abstract:(Ti, Al)N films were deposited on high-speed steel (HSS) by filtered cathodic vacuum arc (FCVA) technique under a nitrogen atmosphere. X-ray diffraction was used to characterize the structure of the films .The micro-hardness was tested. The result shows that the crystal structure and mechanical properties of (Ti,Al)N films are strongly dependent on the nitrogen partial pressure. The structure of (Ti,Al)N films is composed of Ti2N phase, TiN phase and TixAly phase. The hardness increases to a maximum at the nitrogen partial pressure of 8•0×10-2Pa, then decreases with increasing nitrogen partial pressure.
2010 ◽
Vol 204
(21-22)
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pp. 3552-3558
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2005 ◽
Vol 190
(2-3)
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pp. 238-243
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Keyword(s):
2013 ◽
Vol 791-793
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pp. 407-410
Keyword(s):
1998 ◽
Vol 13
(8)
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pp. 2117-2122
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Keyword(s):
2005 ◽
Vol 22
(6)
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pp. 407-417
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2006 ◽
Vol 530-531
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pp. 48-52
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Keyword(s):
2008 ◽
Vol 373-374
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pp. 130-133
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