Effect of Acid Etching on Surface Chemistry and Microstructure of HA and CMP Grit-Blasted Ti Surface

2006 ◽  
Vol 309-311 ◽  
pp. 391-394
Author(s):  
A.W. Haryadi ◽  
Chang Kuk You ◽  
Shin Yoon Kim ◽  
Eui Kyun Park ◽  
Kyo Han Kim ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Surface Chemistry ◽  
Dental Implants ◽  
Acid Concentration ◽  
Etching Rate ◽  
Acid Etching ◽  
Etching Time ◽  
Etching Solution ◽  
Grit Blasting

Grit blasting using bioactive HA and biodegradable CMP followed by acid etching has been done. HNO3 and H3PO4 were used for the etching solution by controlling the concentration and etching time to know the effect on the surface chemistry and morphology of the Ti implant. Characterization of samples was done by using SEM, EDX and surface profilometer. The contents of residues on Ti surface decreased with increasing acid concentration and etching time. It was observed that the acidic etching rate of HA grits on Ti surface was faster than that of CMP grits. And HNO3 etched more rapidly the HA and CMP grits on Ti surface, compared to H3PO4. Therefore, the surface roughness of dental implants can be controlled by having appropriate combination of acid concentration and etching time.

Study on sapphire microstructure processing technology based on wet etching

2017 ◽  
Vol 31 (07) ◽  
pp. 1741004 ◽  
Author(s):  
Ying-Qi Shang ◽  
Hong Qi ◽  
Yun-Long Ma ◽  
Ya-Lin Wu ◽  
Yan Zhang ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Process Parameters ◽  
Etching Rate ◽  
Wet Etching ◽  
Processing Technology ◽  
Light Extraction Efficiency ◽  
Etching Time ◽  
Etching Solution ◽  
Sapphire Surface ◽  
Optical Pressure

Aiming at the problem that sapphire surface roughness is quite large after wet etching in sapphire microstructure processing technology, we optimize the wet etching process parameters, study on the influences of concentration and temperature of etching solution and etching time on the sapphire surface roughness and etching rate, choose different process parameters for the experiment and test and analyze the sapphire results after wet etching. Aiming at test results, we also optimize the process parameters and do experiment. Experimental results show that, after optimizing the parameters of etching solution, surface roughness of etched sapphire is 0.39 nm, effectively with reduced surface roughness, improved light extraction efficiency and meeting the production requirements of high-precision optical pressure sensor.

scholarly journals Morphological and Chemical Characterization of Titanium and Zirconia Dental Implants with Different Macro- and Micro-Structure

2020 ◽  
Vol 10 (21) ◽  
pp. 7520
Author(s):  
Maria Menini ◽  
Francesco Pera ◽  
Francesco Bagnasco ◽  
Francesca Delucchi ◽  
Elisa Morganti ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Dental Implants ◽  
Chemical Characterization ◽  
Sample Surface ◽  
Titanium Implants ◽  
Good Care ◽  
Micro Structure ◽  
Chemical Residues ◽  
Micro Structures

Background: The aim of this study was to evaluate the macro- and micro-structure and the chemical composition of the surface of 5 different commercially available dental implants. Roughness values were also calculated. Materials and Methods: 1 zirconia implant (NobelPearl of Nobel Biocare) and 4 titanium implants, Syra (Sweden&Martina), Prama (Sweden&Martina), T3 (Biomet 3i), and Shard (Mech&Human), were analyzed through SEM-EDX analysis and quantitative evaluation of surface roughness (1 sample), and XPS chemical analysis (1 sample). Surface roughness was quantitatively assessed using the stereo-SEM method (SSEM). The following area roughness parameters were calculated, according to ISO25178: Sa, Sz, and Sdr. Results: From the SEM observations, all the implants analyzed presented modern well-developed micro-structures as the result of the specific process of double acid etching alone or combined with other additional treatments. Roughness values were generally greater at the level of the implant body and lower at the collar. The chemical characterization of the implant surfaces exhibited excellent results for all of the implants and indicated good care in the production processes. Conclusions: All the samples were well-conceived in terms of topography and surface roughness, and clean in terms of chemical residues.

Relative Effect of Sand Blasting and Acid Etching on the Surface Roughness of Pure Titanium and Titanium Alloy for Dental Implants

2014 ◽  
Vol 1043 ◽  
pp. 145-148
Author(s):  
Yashkta Shivalingam Nadar ◽  
Muralithran Govindan Kutty ◽  
Abdul Razak Abdul Aziz
Keyword(s):  
Surface Roughness ◽  
Titanium Alloy ◽  
Oxide Layer ◽  
Dental Implants ◽  
Titanium Oxide ◽  
Pure Titanium ◽  
Relative Effect ◽  
Acid Etching ◽  
Sand Blasting ◽  
Relative Contribution

The objective of this study is to investigate the effect of sandblasting and acid etching on the surface roughness and morphology of pure titanium and titanium alloy to compare their relative contribution. Both of these samples were first sandblasted and then acid etched using HCL and H2SO4for different duration and temperature. The results of this study indicated that the roughness value for pure titanium increased after acid etching while the opposite occurred for the titanium alloy. It is suggested that the decrease is due to significant over etching of the protective titanium oxide layer on the alloy.

Chemical Etching of Dental Implant Material

2015 ◽  
Vol 812 ◽  
pp. 201-206
Author(s):  
Lilla Nádai ◽  
Bálint Katona ◽  
Eszter Bognár
Keyword(s):  
Electron Microscopy ◽  
Surface Roughness ◽  
Dental Implant ◽  
Chemical Etching ◽  
Single Step ◽  
Acid Etching ◽  
Etching Time ◽  
Distilled Water ◽  
Parameter Setting ◽  
Grade 5

In this article we dealt with the development of a new method of chemical etching on dental implant materials, Grade 2 and Grade 5 titanium. Certain process creates reproducible homogenous and microrough surface, furthermore improves the reproducibility and productivity for industry appliance. During the research we modified the surface roughness of 2 mm thick samples in a single step of acid etching with a mixture of HF, HNO3and distilled water varying the etching time (15-600 seconds). After the surface treatment we obtained the changes of mass and the surface roughness on both sides of every sample. The resulting surface was examined with stereo-and electron microscopy. Based on our results we can determine a parameter setting where the homogenous and microrough surface is reproducible.

Surface Modification of Ti Dental Implants by Grit-Blasting and Micro-Arc Oxidation

2008 ◽  
Vol 47-50 ◽  
pp. 467-470 ◽  
Author(s):  
Yeon Wook Kim
Keyword(s):  
Surface Roughness ◽  
Dental Implants ◽  
High Surface ◽  
Titanium Implants ◽  
Osteoblastic Cell ◽  
Implant Surface ◽  
Oxidation Treatment ◽  
Grit Blasting ◽  
Micro Arc Oxidation ◽  
Titanium Dental Implants

The osseointegration capability of titanium dental implants is related to their chemical composition and surface roughness. In this study, the combination of grit-blasting and micro-arc oxidation had been used for producing the improved implant surfaces. The ceramic particles were projected to titanium dental implants through a nozzle at high velocity by means of compressed air to get high surface roughness. Then the surface of titanium implants was modified by micro-arc oxidation treatment. The current density, frequency and duty were 50-300 mA/cm2, 100 Hz, and 50%, respectively. A porous TiO2 layer was formed on the surface after the oxidation treatment. The surface structure of oxidized implants exhibited nanometer-sized pores with an average diameter of 0.2 µm. The TiO2 passive layer of the implant surface can attribute to the excellent biocompatibility. The high roughness (Ra=0.182 µm) formed by grit-blasting maximizes the interlocking between mineralized bone and the surface of the implant. Surface roughness in the manometer range formed by micro-arc oxidation treatment would play an important role in the adsorption of proteins, adhesion of osteoblastic cell and thus the rate of osseointegration.

scholarly journals Effect of tetramethylammonium hydroxide/isopropyl alcohol wet etching on geometry and surface roughness of silicon nanowires fabricated by AFM lithography

2016 ◽  
Vol 7 ◽  
pp. 1461-1470 ◽  
Author(s):  
Siti Noorhaniah Yusoh ◽  
Khatijah Aisha Yaacob
Keyword(s):  
Surface Roughness ◽  
Silicon Nanowires ◽  
Isopropyl Alcohol ◽  
Etching Rate ◽  
Wet Etching ◽  
Tetramethylammonium Hydroxide ◽  
Etching Time ◽  
Etching Depth ◽  
Force Microscopy ◽  
Afm Lithography

The optimization of etchant parameters in wet etching plays an important role in the fabrication of semiconductor devices. Wet etching of tetramethylammonium hydroxide (TMAH)/isopropyl alcohol (IPA) on silicon nanowires fabricated by AFM lithography is studied herein. TMAH (25 wt %) with different IPA concentrations (0, 10, 20, and 30 vol %) and etching time durations (30, 40, and 50 s) were investigated. The relationships between etching depth and width, and etching rate and surface roughness of silicon nanowires were characterized in detail using atomic force microscopy (AFM). The obtained results indicate that increased IPA concentration in TMAH produced greater width of the silicon nanowires with a smooth surface. It was also observed that the use of a longer etching time causes more unmasked silicon layers to be removed. Importantly, throughout this study, wet etching with optimized parameters can be applied in the design of the devices with excellent performance for many applications.

scholarly journals Surface Modification of Dental Implants - A Review

2021 ◽  
Vol 10 (17) ◽  
pp. 1246-1250
Author(s):  
Shamaa Anjum ◽  
Arvina Rajasekar
Keyword(s):  
Surface Roughness ◽  
Surface Modification ◽  
Dental Implants ◽  
Surface Engineering ◽  
Surface Modifications ◽  
Calcium Phosphate Coating ◽  
Acid Etching ◽  
Success Rates ◽  
Implant Surface ◽  
Osteoblast Activity

The use of dental implants for the replacement of missing teeth has increased in the last 30 years. The success rates for implant placement depend on a series of both biological and clinical steps which starts with primary stability that is being provided by the amount, quality and the distribution of bone within the proposed implant site. The most important factor in implant osseointegration is surface roughness, which shows increased osteoblast activity at 1 to 100 μm of the surface roughness when compared to a smooth surface. Rough surfaces have excellent osseointegration than smooth surfaces, but the results of research have been diverse, and it is evident that multiple treatments provide good results. The surfaces of a dental implant have been modified in several ways to improve its biocompatibility and speed up osseointegration. Literature says that any surface modification provides a good surface for osseointegration of the implant when the surface roughness is about 0.44 ~ 8.68 μm. It is also said that acid etching and coating are the most preferred methods for creating good roughness of the implant surface. From animal studies, it is known that implant surface modifications provided by biomolecular coating seemed to enhance the osseointegration by promoting peri-implant bone formation in the early stages of healing. It also seemed to improve histomorphometric analysis and biomechanical testing results. This article reviews the surface modifications of dental implants for the achievement of better success rates. Various methods are used to modify the topography or the chemistry of the implant surfaces which includes acid etching, anodic oxidation, blasting, treatment with fluoride, and calcium phosphate coating. These modifications provide a faster and a stronger osseointegration.1 Recently, hydrophilic properties added to the roughened surfaces or some osteogenic peptides coated on the surfaces shows higher biocompatibility and have induced faster osseointegration compared to the existing modified surfaces. With development in surface engineering techniques, new information on the properties, behaviour, and the reaction of various materials could be discovered which in turn allows the discovery of new materials, modification techniques and design of bio implants for the future. KEY WORDS Dental Implants, Surface Modifications, Biocompatibility, Surface Topography

scholarly journals Texture-Etched SnO2Glasses Applied to Silicon Thin-Film Solar Cells

2014 ◽  
Vol 2014 ◽  
pp. 1-9 ◽  
Author(s):  
Bing-Rui Wu ◽  
Sin-Liang Ou ◽  
Shih-Yung Lo ◽  
Hsin-Yuan Mao ◽  
Jhen-Yu Yang ◽  
...  
Keyword(s):  
Thin Film ◽  
Surface Roughness ◽  
Solar Cells ◽  
Light Scattering ◽  
Etching Rate ◽  
Etching Process ◽  
Thin Film Solar Cells ◽  
Etching Time ◽  
Silicon Thin Film ◽  
Mixture Ratio

Transparent electrodes of tin dioxide (SnO2) on glasses were further wet-etched in the diluted HCl:Cr solution to obtain larger surface roughness and better light-scattering characteristic for thin-film solar cell applications. The process parameters in terms of HCl/Cr mixture ratio, etching temperature, and etching time have been investigated. After etching process, the surface roughness, transmission haze, and sheet resistance of SnO2glasses were measured. It was found that the etching rate was increased with the additions in etchant concentration of Cr and etching temperature. The optimum texture-etching parameters were 0.15 wt.% Cr in 49% HCl, temperature of 90°C, and time of 30 sec. Moreover, silicon thin-film solar cells with the p-i-n structure were fabricated on the textured SnO2glasses using hot-wire chemical vapor deposition. By optimizing the texture-etching process, the cell efficiency was increased from 4.04% to 4.39%, resulting from the increment of short-circuit current density from 14.14 to 15.58 mA/cm2. This improvement in cell performances can be ascribed to the light-scattering effect induced by surface texturization of SnO2.

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