Effects of Deposition Time on the Structure and Properties of AZO Thin Films Deposited on Quartz Glass by Magnetron Sputtering

2019 ◽  
Vol 807 ◽  
pp. 63-67
Author(s):  
Jing Kang Ba ◽  
Yun Zhang ◽  
Xiao Jing Wang
Keyword(s):  
Magnetron Sputtering ◽  
Quartz Glass ◽  
Deposition Time ◽  
Diffraction Peak ◽  
Visible Light Region ◽  
Structure And Properties ◽  
Light Region ◽  
Average Transmittance ◽  
Mean Grain Size ◽  
The Mean

The AZO films deposited on quartz glass by magnetron sputtering with different deposition time various from 30min to 120min.All of the obtained samples had a (002) diffraction peak range from 34.31 to 34.52°, while the mean grain size increased from 30.1nm (30min) to 56.1nm (120min) respectively. The XPS survey indicated the photoelectron peaks of Zn ,O and C elements occured. The optimal transmittance of the films reduced obviously from about 92% to 78% near 550nm with deposition time increased from 30min to 120min. And the average transmittance of AZO films prepared at 30, 60 and 90min was about 85% in the visible light region.

Effects of Deposition Temperatures on ZnO:Al Films Deposited on Polymer Substrates by RF Magnetron Sputtering

2011 ◽  
Vol 415-417 ◽  
pp. 1871-1874
Author(s):  
Xiao Jing Wang ◽  
De Jun Li ◽  
Huan Qi Tao ◽  
Jun Wang
Keyword(s):  
Magnetron Sputtering ◽  
Visible Region ◽  
Rf Magnetron Sputtering ◽  
Structure And Properties ◽  
Scanning Electronic Microscopy ◽  
Electronic Microscopy ◽  
Polymer Substrates ◽  
X Ray ◽  
Average Transmittance ◽  
Uv Visible

Aluminium doped ZnO (ZnO:Al) films were deposited on polymer substrates by RF magnetron sputtering. The effects of deposition temperatures on structure and properties of films were investigated by X-ray diffractometery, Scanning electronic microscopy, UV-visible spectrophotometer, as well as Four-point Probes System. The results revealed that moderate deposition temperature was helpful to improve the crystal quality and optoelectronic properties of ZnO:Al films. The lowest resistivity of 9.5×10-3Ω•cm and the average transmittance of 76% in the visible region was obtained for the film deposited from ZnO:2wt% Al2O3 target at 75°C.

Deposition and Characterization of Mg Doped CuCrO2 Films by DC Magnetron Sputtering

2014 ◽  
Vol 609-610 ◽  
pp. 255-259
Author(s):  
Su Zhen Wu ◽  
Zan Hong Deng ◽  
Wei Wei Dong ◽  
Jing Zhen Shao ◽  
Xiao Dong Fang
Keyword(s):  
Magnetron Sputtering ◽  
Quartz Glass ◽  
Single Phase ◽  
Nitrogen Atmosphere ◽  
X Ray Diffraction ◽  
Dc Magnetron Sputtering ◽  
Si Substrates ◽  
Light Region ◽  
Mg Doped

Single-phase delafossite type Mg-doped copper-chromium oxide thin films were prepared on c-sapphire, quartz glass and n-Si substrates by direct current (DC) magnetron sputtering using a CuCr0.97Mg0.03O2 (CCMO) ceramic target, followed by post annealing at 800 °C in a nitrogen atmosphere. X-ray diffraction (XRD) revealed that the film deposited on c-plane sapphire was highly c-axis oriented, while the films on quartz glass and Si only showed weak (0 1 2) peak. The transparencies of the films on c-sapphire and quartz glass were over 60 % in the visible light region and the direct bandgap of both films were estimated to be 3.16 eV. The in-plane resistivities were 0.24 Ωcm and 7.68 Ωcm for the crystallized films on c-sapphire and quartz glass, respectively. The electrical property of the formed CCMO/n-Si junction was found to be rectifying with a ratio of ~15 at ±2 V.

scholarly journals Preparation of high-entropy carbides by different sintering techniques

2021 ◽  
Vol 56 (19) ◽  
pp. 11237-11247 ◽  
Author(s):  
Johannes Pötschke ◽  
Manisha Dahal ◽  
Mathias Herrmann ◽  
Anne Vornberger ◽  
Björn Matthey ◽  
...  
Keyword(s):  
Grain Size ◽  
Single Phase ◽  
X Ray Diffraction ◽  
Vacuum Sintering ◽  
X Ray ◽  
High Entropy ◽  
Mean Grain Size ◽  
The Mean ◽  
Gas Pressure Sintering ◽  
Hardness Values

AbstractDense (Hf, Ta, Nb, Ti, V)C- and (Ta, Nb, Ti, V, W)C-based high-entropy carbides (HEC) were produced by three different sintering techniques: gas pressure sintering/sinter–HIP at 1900 °C and 100 bar Ar, vacuum sintering at 2250 °C and 0.001 bar as well as SPS/FAST at 2000 °C and 60 MPa pressure. The relative density varied from 97.9 to 100%, with SPS producing 100% dense samples with both compositions. Grain size measurements showed that the substitution of Hf with W leads to an increase in the mean grain size of 5–10 times the size of the (Hf, Ta, Nb, Ti, V,)C samples. Vacuum-sintered samples showed uniform grain size distribution regardless of composition. EDS mapping revealed the formation of a solid solution with no intermetallic phases or element clustering. X-ray diffraction analysis showed the structure of mostly single-phase cubic high-entropy carbides. Hardness measurements revealed that (Hf, Ta, Nb, Ti, V)C samples possess higher hardness values than (Ta, Nb, Ti, V, W)C samples.

scholarly journals Low-reflective wire-grid polariser sheet in the visible region fabricated by a nanoprinting process

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Ryohei Hokari ◽  
Kyohei Takakuwa ◽  
Hirohisa Kato ◽  
Akitaka Yamamoto ◽  
Yusuke Yamaguchi ◽  
...  
Keyword(s):  
Silver Nanoparticle ◽  
Visible Region ◽  
Sintered Body ◽  
Visible Light Region ◽  
Uneven Surface ◽  
Optical Elements ◽  
Wire Grid ◽  
Light Region ◽  
Sophisticated Equipment ◽  
Nanoparticle Ink

AbstractFor the construction of next-generation optical products and systems, the evolution of polariser sheets is a necessary requirement. To this end, a low-reflective wire-grid polariser (WGP) sheet for the visible light region is demonstrated, the nanowires of which consist of a sintered body of silver nanoparticle ink. The nanowires are formed by a nanoprinting process using a thermal nanoimprint method and ink filling. This process makes it easier to achieve multiple wafer-scale productions without using sophisticated equipment compared to conventional WGP nanofabrication techniques, which typically employ lithography and elaborate etching processes. The optical characteristics are controlled by the shape of the printed nanowires. A WGP sheet with a luminous degree of polarisation of 99.0%, a total luminous transmittance of 13.6%, and a luminous reflectance of 3.6% is produced. Its low reflectance is achieved through the uneven surface derived from the sintered body of the nanoparticle ink, and the shape of the bottom of the nanowire is derived from the tip shape of the mould structure. Furthermore, the printed WGP sheet has the durability required for the manufacturing of curved products, including sunglasses. The optical structures made of nanoparticle ink using this nanoprinting process have the potential to significantly contribute to the development of fine-structured optical elements with unprecedented functionality.

Sputtering pressure dependence of hydrogen-sensing effect of palladium films

2009 ◽  
Vol 24 (6) ◽  
pp. 1919-1927 ◽  
Author(s):  
Chung Wo Ong ◽  
Yu Ming Tang
Keyword(s):  
Electrical Resistivity ◽  
Magnetron Sputtering ◽  
Mean Free Path ◽  
Induced Response ◽  
Resistivity Ratio ◽  
Hydrogen Sensing ◽  
The Mean ◽  
Sputtering Pressure ◽  
Specific Volumes ◽  
Hydride Phases

The electrical resistivity ρ of palladium (Pd) films prepared by using magnetron sputtering at different pressures φ ranging from 2 to 15 mTorr showed very different hydrogen (H)-induced response. This reaction is because the mean free path of the particles in vacuum changes substantially with φ, such that the structure of the deposits is altered accordingly. A film prepared at a moderate φ value of 6 mTorr has a moderate strength. After a few hydrogenation-dehydrogenation cycles, some cracks are generated because of the great difference in the specific volumes of the metal and hydride phases. Breathing of the cracks in subsequent switching cycles occurred, which led to the response gain of ρ, defined as the resistivity ratio of the dehydrogenated-to-hydrogenated states during a cycle, to increase to 17. This result demonstrates the attractiveness of using the Pd films in H2 detection application. The H-induced resistive response of the films prepared at other φ values was found to be much smaller.

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