Investigation of the Electronic Structure of the UD-4 Defect in 4H-SiC by Optical Techniques

2006 ◽  
Vol 527-529 ◽  
pp. 461-464 ◽  
Author(s):  
Aurelie Thuaire ◽  
Anne Henry ◽  
Björn Magnusson ◽  
Peder Bergman ◽  
W.M. Chen ◽  
...  
Keyword(s):  
Silicon Carbide ◽  
Electronic Structure ◽  
Low Temperature ◽  
Deep Level ◽  
Temperature Dependent ◽  
Deep Level Defect ◽  
Time Resolved ◽  
Optical And Electronic Properties ◽  
Time Resolved Photoluminescence ◽  
Temperature Dependent Photoluminescence

A detailed investigation of the optical and electronic properties of the deep-level defect UD-4 is reported. This defect has recently been observed in 4H semi-insulating silicon carbide, but has hardly been studied yet. Both low temperature and temperature-dependent photoluminescence were collected from the defect. Zeeman spectroscopy measurements were performed as well as time-resolved photoluminescence.

scholarly journals The thermal stability of FAPbBr3 nanocrystals from temperature-dependent photoluminescence and first-principles calculations

RSC Advances ◽  
2020 ◽  
Vol 10 (72) ◽  
pp. 44373-44381
Author(s):  
Xiaozhe Wang ◽  
Qi Wang ◽  
Zhijun Chai ◽  
Wenzhi Wu
Keyword(s):  
First Principles ◽  
First Principle ◽  
First Principles Calculations ◽  
Temperature Dependent ◽  
Time Resolved ◽  
First Principle Calculations ◽  
Steady State Time ◽  
Time Resolved Photoluminescence ◽  
Thermal Stability Of ◽  
Temperature Dependent Photoluminescence

The thermal properties of FAPbBr3 perovskite nanocrystals (PNCs) is investigated by use of temperature-dependent steady-state/time-resolved photoluminescence and first-principle calculations.

scholarly journals Temperature-dependent photoluminescence properties of porous fluorescent SiC

2019 ◽  
Vol 9 (1) ◽  
Author(s):  
Weifang Lu ◽  
Abebe T. Tarekegne ◽  
Yiyu Ou ◽  
Satoshi Kamiyama ◽  
Haiyan Ou
Keyword(s):  
Surface Passivation ◽  
Surface States ◽  
Atomic Layer ◽  
Emission Peak ◽  
Photoelectron Spectra ◽  
Porous Structures ◽  
Temperature Dependent ◽  
Time Resolved ◽  
Pl Emission ◽  
Temperature Dependent Photoluminescence

Abstract A comprehensive study of surface passivation effect on porous fluorescent silicon carbide (SiC) was carried out to elucidate the luminescence properties by temperature dependent photoluminescence (PL) measurement. The porous structures were prepared using an anodic oxidation etching method and passivated by atomic layer deposited (ALD) Al2O3 films. An impressive enhancement of PL intensity was observed in porous SiC with ALD Al2O3, especially at low temperatures. At temperatures below 150 K, two prominent PL emission peaks located at 517 nm and 650 nm were observed. The broad emission peak at 517 nm was attributed to originate from the surface states in the porous structures, which was supported by X-ray photoelectron spectra characterization. The emission peak at 650 nm is due to donor-acceptor-pairs (DAP) recombination via nitrogen donors and boron-related double D-centers in fluorescent SiC substrates. The results of the present work suggest that the ALD Al2O3 films can effectively suppress the non-radiative recombination for the porous structures on fluorescent SiC. In addition, we provide the evidence based on the low-temperature time-resolved PL that the mechanism behind the PL emission in porous structures is mainly related to the transitions via surface states.

scholarly journals Photoluminescence excitation spectroscopy of GaN thin layers as a function of temperature

1997 ◽  
Vol 2 ◽  
Author(s):  
C. Guénaud ◽  
E. Deleporte ◽  
M. Voos ◽  
C. Delalande ◽  
B. Beaumont ◽  
...  
Keyword(s):  
Optical Properties ◽  
Low Temperature ◽  
Thin Layers ◽  
Photoluminescence Excitation ◽  
Temperature Dependent ◽  
Electron Hole ◽  
Yellow Band ◽  
Neutral Donor ◽  
Photoluminescence Line ◽  
Temperature Dependent Photoluminescence

We report on photoluminescence and photoluminescence excitation experiments performed on hexagonal GaN layers grown on a Sapphire substrate. Information about extrinsic and intrinsic optical properties have been obtained. We show that, at low temperature, the fundamental A excitons are preferentially involved in the relaxation towards the neutral donor bound exciton photoluminescence line, while electron-hole pairs rather participate in the relaxation towards D0−A0 emission and the yellow band. The relaxation from the A exciton towards the yellow band and D0−A0 emission is made easier by temperature. The band structure of the GaN layers has been determined from temperature dependent photoluminescence excitation spectroscopy: A and C excitons and A continuum band gap have been identified up to 210K.

Instrumentation for Reliably Determining Porous Silicon Photoluminescence Responses to Gaseous Analyte Vapors

2016 ◽  
Vol 70 (12) ◽  
pp. 1974-1980 ◽  
Author(s):  
Justin M. Reynard ◽  
Nathan S. Van Gorder ◽  
Caley A. Richardson ◽  
Richie D. Eriacho ◽  
Frank V. Bright
Keyword(s):  
Porous Silicon ◽  
Vapor Concentration ◽  
Photoluminescence Intensity ◽  
Spectral Measurements ◽  
Temperature Dependent ◽  
Time Resolved ◽  
Hyper Spectral ◽  
New Instrumentation ◽  
Time Resolved Photoluminescence ◽  
New System

We report new instrumentation for rapidly and reliably measuring the temperature-dependent photoluminescence response from porous silicon as a function of analyte vapor concentration. The new system maintains the porous silicon under inert conditions and it allows on-the-fly steady-state and time-resolved photoluminescence intensity and hyper-spectral measurements between 293 K and 450 K. The new system yields reliable data at least 100-fold faster in comparison to previous instrument platforms.

Laser Power and Temperature Dependent Photoluminescence Characteristics of Annealed GaInNAs/GaAs Quantum Well

2003 ◽  
Vol 799 ◽  
Author(s):  
Ng Tien Khee ◽  
Yoon Soon Fatt ◽  
Fan Weijun
Keyword(s):  
Activation Energy ◽  
Low Temperature ◽  
Quantum Well ◽  
Laser Power ◽  
Laser Excitation ◽  
Excitation Intensity ◽  
Temperature Curve ◽  
Temperature Dependent ◽  
Localization Center ◽  
Temperature Dependent Photoluminescence

ABSTRACTPhotoluminescence (PL) of annealed GaInNAs quantum well (QW) with varying temperature and laser excitation intensity is measured to understand the low temperature PL properties of annealed 6 nm GaInNAs QW. The measurements show that localization effect still exist in the QW even after annealing. This effect is characterized by an activation energy of 11 meV below the e1 state, which is obtained from fitting the integrated PL intensity vs. temperature curve with a single-activation-energy (SAE) model. This center is suggested to be related to the main localization center below the e1 state that could be resulted by N or In compositional fluctuation even after annealing.

Nitrogen function of aluminum-nitride codoped ZnO films deposited using cosputter system

2009 ◽  
Vol 24 (7) ◽  
pp. 2252-2258 ◽  
Author(s):  
Li-Wen Lai ◽  
Jheng-Tai Yan ◽  
Chia-Hsun Chen ◽  
Li-Ren Lou ◽  
Ching-Ting Lee
Keyword(s):  
Low Temperature ◽  
Oxygen Vacancies ◽  
Carrier Lifetime ◽  
Nitrogen Atmosphere ◽  
Zno Films ◽  
Deposition Condition ◽  
Time Resolved ◽  
Sapphire Substrates ◽  
Crystallographic Structures ◽  
Time Resolved Photoluminescence

AlN codoped ZnO films were deposited on sapphire substrates at low temperature using a cosputter system under various N2/(N2 + Ar) flow ratios. To investigate the nitrogen function, the ratio of nitrogen ambient was varied during cosputtering. AlN codoped ZnO films with various crystallographic structures and bonding configurations were measured. With an adequate nitrogen atmosphere deposition condition and postannealing temperature at 450 °C, the p-type conductive behaviors of AlN codoped ZnO films were achieved due to the formation of Zn–N bonds. According to the low-temperature photoluminescence spectra, the binding energy (EA) of 0.16 eV for N acceptors can be calculated. Using time-resolved photoluminescence measurement, the carrier lifetime in AlN codoped ZnO films increases due to the reduction of oxygen vacancies caused by the occupation of adequate nitrogen atoms.

scholarly journals Study Study on photoluminescence properties of porous GaP material

2018 ◽  
Vol 34 (1) ◽  
Author(s):  
Pham Thi Thuy ◽  
Bui Xuan Vuong
Keyword(s):  
Solid State ◽  
Electrochemical Etching ◽  
Green Emission ◽  
Functional Materials ◽  
Bulk Sample ◽  
Electrochemical Anodization ◽  
Photoluminescence Intensity ◽  
Temperature Dependent ◽  
Time Resolved ◽  
Time Resolved Photoluminescence

This paper reports on the photoluminescence of porous GaPprepared by electrochemical anodization of (111)-oriented bulk material.Porous and bulk GaP exhibits green and red photoluminescence, respectively when excited by the 355-nm laser. The photoluminescence intensity of porous GaP is much stronger than that of the bulk sample. Temperature-dependent time-resolved photoluminescence shows that the green emission gradually decreases when the temperature increases and the photoluminescence full width at haft maximum (FWHM) slightly narrow with decreasing temperature. These results assigned to the contribution of lattice vibrations. Raman scattering measurement is carried out to confirm the size decreasing of the porous GaP material. Keywords PorousGaP, photoluminescence, time-resolved photoluminescence, electrochemical etching References 1. L. T. Canham, Appl. Phys.Lett. 57, 1046 (1990).2. K. Grigoras, Jpn. J. Appl. Phys. 39, 378 (2000)3. H. Koyama, J. Appl. Electrochem. 36, 999 (2006)4. H. A. Hadi, International Letters of Chemistry, Physics and Astronomy, 17(2), 142-152 (2014).5. S. Setzu, P. Ferrand, and R. Romestain, Mater.Sci. Eng, 34, 69-70 (2000).6. S. E. Letant and M. J. Sailor, Adv. Mater, 355, 12 (2000).7. M. T. Kelly, J. K. M. Chun, and A. B. Bocarsly, Nature, 382, 214 (1996).8. G. Di Francia, V. La Ferrara, L. Quercia, and G. Faglia, J. Porous Mater, 7, 287 (2000).9. J. Drott, K. Lindstrom, L. Rosengren, and T. Laurell, J. Micromech. Microeng, 7, 14 (1997).10. B. P. Azeredo, Y. W. Lin, A. Avagyan, M. Sivaguru, K. Hsu, P. Ferreira, Advanced Functional Materials, 26, 2929-2939 (2016).11. A. Anedda, A. Serpi, V. A. Karavanskii, I. M. Tiginyanu, and V. M. Ichizli, Appl. Phys.Lett, 67, 3316 (1995).12. A. I. Belogorokhov, V. A. Karavanskii, A. N. Obraztsov and V. Yu. Timoshenko, JETP Lett. 60, 274 (1994).13. K. Tomioka, S. Adachi, J. App. Phys, 98, 073511 (2005).14. M. A. Stevens-Kalceff, I. M. Tiginyanu, S. Langa, H. Foll and H. L. Hartnagel, J. App. Phys, 89,2560 (2001).15. A. V. Zoteev, P. K. Kashkarov, A. N. Obraztsov and V. Y. Timoshenko, Semiconductors, 30, 775 (1996).16. A. A. Lebedev, V. Y. Rud and Y. V. Rud, Tech. Phys. Lett, 22, 754 (1996).17. H. Richter, Z. P. Wang, and L. Ley, Solid State Commum, 39, 625 (1981).18. L. H. Campbell and P. M.Fauchet, Solid State Commum, 58, 739 (1986).19. V. V. Ursaki, N. N. Syrbu, S. Albu, V. V. Zalamai, I. M. Tiginyanu, and R. W. Boyd, Semicond. Sci. Technl, 20, 745- 748 (2005)20. R. W. Tjerkstra, Electrochemical and Solid-State Letters,9 (5), C81-C84 (2006)

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