Determination of Impact Ionization Coefficients Measured from 4H Silicon Carbide Avalanche Photodiodes

2007 ◽  
Vol 556-557 ◽  
pp. 339-342 ◽  
Author(s):  
W.S. Loh ◽  
C. Mark Johnson ◽  
J.S. Ng ◽  
Peter M. Sandvik ◽  
Steve Arthur ◽  
...  
Keyword(s):  
Impact Ionization ◽  
Avalanche Photodiodes ◽  
Submicron Devices ◽  
Illuminating Light ◽  
Factor Data ◽  
Ionization Coefficients ◽  
P Type ◽  
Dark Currents ◽  
The Impact

Hole initiated avalanche multiplication characteristics of 4H-SiC avalanche photodiodes have been studied. The diodes had n+-n-p SiC epitaxial layers grown on a p-type substrate. These 1 mm2 devices had very low dark currents and exhibited sharp breakdown at voltages of approximately 500V. The diodes multiplication characteristics appeared to be identical when the wavelength of the illuminating light from the top varied from 288 to 325nm, implying that almost pure hole initiated multiplication was occurring. The multiplication factor data were modelled using a local multiplication model with impact ionization coefficients of 4H-SiC reported by various authors. The impact ionization coefficients extracted from submicron devices by Ng et al. were found to give accurate predictions for multiplication factors within the uncertainties of the doping levels. This result suggests that their ionization coefficients can be applied to thicker bulk 4H-SiC structures.

Mean multiplication gain and excess noise factor of GaN and Al0.45Ga0.55N avalanche photodiodes

2020 ◽  
Vol 92 (1) ◽  
pp. 10301
Author(s):  
Tat Lung Wesley Ooi ◽  
Pei Ling Cheang ◽  
Ah Heng You ◽  
Yee Kit Chan
Keyword(s):  
Electric Field ◽  
Impact Ionization ◽  
Avalanche Photodiodes ◽  
Monte Carlo Model ◽  
Noise Factor ◽  
Excess Noise ◽  
Excess Noise Factor ◽  
Multiplication Gain ◽  
Ionization Coefficients ◽  
The Impact

In this work, Monte Carlo model is developed to investigate the avalanche characteristics of GaN and Al0.45Ga0.55N avalanche photodiodes (APDs) using random ionization path lengths incorporating dead space effect. The simulation includes the impact ionization coefficients, multiplication gain and excess noise factor for electron- and hole-initiated multiplication with a range of thin multiplication widths. The impact ionization coefficient for GaN is higher than that of Al0.45Ga0.55N. For GaN, electron dominates the impact ionization at high electric field while hole dominate at low electric field whereas Al0.45Ga0.55N has hole dominate the impact ionization at higher field while electron dominate the lower field. In GaN APDs, electron-initiated multiplication is leading the multiplication gain at thinner multiplication widths while hole-initiated multiplication leads for longer widths. However for Al0.45Ga0.55N APDs, hole-initiated multiplication leads the multiplication gain for all multiplication widths simulated. The excess noise of electron-initiated multiplication in GaN APDs increases as multiplication widths increases while the excess noise decreases as the multiplication widths increases for hole-initiated multiplication. As for Al0.45Ga0.55N APDs, the excess noise for hole-initiated multiplication increases when multiplication width increases while the electron-initiated multiplication increases with the same gradient at all multiplication widths.

DARK CURRENTS AND IMPACT IONIZATION COEFFICIENTS IN THE InP-InGaAsP DOUBLE HETEROSTRUCTURES

2006 ◽  
Vol 20 (29) ◽  
pp. 4929-4936
Author(s):  
M. OZER ◽  
M. AHMETOGLU ◽  
N. APRAILOV
Keyword(s):  
Electric Fields ◽  
Impact Ionization ◽  
Reverse Current ◽  
Tunneling Current ◽  
Double Heterostructures ◽  
Wide Range ◽  
Direct Energy ◽  
Ionization Coefficients ◽  
Dark Currents ◽  
The Impact

The dependence of reverse-biased leakage current on both voltage and temperature for InP - In x Ga 1-x As y P 1-y DH (double heterostructures) has been analyzed. We find that at the whole of the temperature range and at a wide range of reverse bias voltages, the reverse current varies exponentially with applied voltage, indicating that the band-to-band tunneling current mechanism prevails. An agreement is obtained between theory and experimental results. The tunneling current becomes substantial at peak junction electric fields as low as 105 V/m due to the small direct energy gaps and small effective masses of the structures tested. The process of breakdown in the investigated structures was of the avalanche type. The impact ionization coefficients in In x Ga 1-x As y P 1-y have been experimentally determined for composition x=0.68.

Experimental Determination of the Impact Ionization Coefficients in Irradiated Silicon

2011 ◽  
Vol 58 (4) ◽  
pp. 2091-2096 ◽  
Author(s):  
Andrea Cristofoli ◽  
Pierpaolo Palestri ◽  
Mario Paolo Giordani ◽  
Vladimir Cindro ◽  
Gian-Franco Dalla Betta ◽  
...  
Keyword(s):  
Experimental Determination ◽  
Impact Ionization ◽  
Ionization Coefficients ◽  
The Impact

Temperature Dependence of Hole Impact Ionization Coefficient in 4H-SiC Photodiodes

2009 ◽  
Vol 615-617 ◽  
pp. 311-314 ◽  
Author(s):  
W.S. Loh ◽  
J.P.R. David ◽  
B.K. Ng ◽  
Stanislav I. Soloviev ◽  
Peter M. Sandvik ◽  
...  
Keyword(s):  
Phonon Scattering ◽  
Impact Ionization ◽  
Positive Temperature Coefficient ◽  
Positive Temperature ◽  
Different Temperatures ◽  
Ionization Coefficients ◽  
Increasing Temperature ◽  
The Impact ◽  
Good Agreement ◽  
Ionization Rates

Hole initiated multiplication characteristics of 4H-SiC Separate Absorption and Multiplication Avalanche Photodiodes (SAM-APDs) with a n- multiplication layer of 2.7 µm were obtained using 325nm excitation at temperatures ranging from 300 to 450K. The breakdown voltages increased by 200mV/K over the investigated temperature range, which indicates a positive temperature coefficient. Local ionization coefficients, including the extracted temperature dependencies, were derived in the form of the Chynoweth expression and were used to predict the hole multiplication characteristics at different temperatures. Good agreement was obtained between the measured and the modeled multiplication using these ionization coefficients. The impact ionization coefficients decreased with increasing temperature, corresponding to an increase in breakdown voltage. This result agrees well with the multiplication characteristics and can be attributed to phonon scattering enhanced carrier cooling which has suppressed the ionization process at high temperatures. Hence, a much higher electric field is required to achieve the same ionization rates.

scholarly journals Estimates of Impact Ionization Coefficients in Superlattice-Based Mid-Wavelength Infrared Avalanche Photodiodes

2003 ◽  
Vol 799 ◽  
Author(s):  
C. H. Grein ◽  
K. Abu El-Rub ◽  
M. E. Flatté ◽  
H. Ehrenreich
Keyword(s):  
Valence Band ◽  
Impact Ionization ◽  
Energy Gap ◽  
Avalanche Photodiodes ◽  
Threshold Energy ◽  
Type Ii ◽  
Band Engineering ◽  
Type Ii Superlattice ◽  
Low Threshold ◽  
Ionization Coefficients

ABSTRACTWe describe band engineering strategies to either enhance or suppress electron-initiated impact ionization relative to hole-initiated impact ionization in type II superlattice mid-wavelength infrared avalanche photodiodes. The strategy to enhance electron-initiated impact ionization involves placing a high density of states at approximately one energy gap above the bottom of the conduction band and simultaneously removing valence band states from the vicinity of one energy gap below the top of the valence band. This gives the electrons a low threshold energy and the holes a high one. The opposite strategy enhances hole-initiated impact ionization. Estimates of the electron (α) and hole (β) impact ionization coefficients predict that α/β>>1 in the first type of superlattice and α/β<<1 in the second type.

Experimental Determination of Impact Ionization Coefficients Along 〈1120〉 in 4H-SiC

2020 ◽  
Vol 67 (9) ◽  
pp. 3740-3744
Author(s):  
Dionysios Stefanakis ◽  
Xilun Chi ◽  
Takuya Maeda ◽  
Mitsuaki Kaneko ◽  
Tsunenobu Kimoto
Keyword(s):  
Experimental Determination ◽  
Impact Ionization ◽  
Ionization Coefficients
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