Reliability Tests of Au-Metallized Ni-Based Ohmic Contacts to 4H-n-SiC with and without Nanocomposite Diffusion Barriers
2010 ◽
Vol 645-648
◽
pp. 737-740
◽
Keyword(s):
The reliability of Ni2Si/n-SiC ohmic contacts with Au overlayer either without or with Ta-Si-N diffusion barrier was investigated after long-time aging in air at 400oC and rapid thermal annealing in Ar up to 800oC. It is shown that aging of the Au/Ni2Si/n-SiC contacts in air at 400oC resulted in complete degradation due to both oxygen penetration and interdiffusion/reaction processes. In contrast, only a small change in properties was detected on the contacts annealed in Ar at 800°C. The stability of both electrical and structural properties of Au/TaSiN/Ni2Si/n-SiC thermally stressed contacts at different conditions points out their superior thermal stability.
Long-Time Thermal Stability Comparison of Alloyed and Non-Alloyed Ohmic Contacts for InP-Based HEMTs
2017 ◽
Vol 214
(11)
◽
pp. 1700411
◽
2018 ◽
Vol 1115
◽
pp. 032068
2007 ◽
Vol 36
(12)
◽
pp. 1662-1668
◽
Keyword(s):