Thermochromic Properties of Vanadium Oxide Films Prepared by R-HIPIMS Using Closed-Loop Controlled with Plasma Emission Monitoring
Keyword(s):
X Ray
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The vanadium dioxide films were deposited by reactive high-power impulse magnetron sputtering for different plasma emission intensity at the substrate temperature of 310 °C. The setpoint of plasma emission intensity was controlled by a PID controller with plasma-emission-monitoring. The vanadium dioxide films characteristics were measured by optical spectrophotometer, X-ray diffraction and electrical source meter.
2019 ◽
Vol 45
(2)
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pp. 1661-1669
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1992 ◽
Vol 31
(Part 1, No. 9A)
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pp. 2760-2761
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Keyword(s):
1992 ◽
Vol 139
(7)
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pp. 2004-2007
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